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36 条记录 (耗时 0.041 秒)

    Apparatus to vary dimensions of a substrate during nano-scale manufacturing
    6.
    发明授权
    Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
    用于在纳米级制造期间改变衬底尺寸的装置

    公开(公告)号：US07170589B2

    公开(公告)日：2007-01-30

    申请号：US11142839

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan K Nimmakayala ,  Mario J. Meissl ,  Sidlgata V. Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan K Nimmakayala ,  Mario J. Meissl ,  Sidlgata V. Sreenivasan

    IPC分类号： G03B27/58 ,  G03B27/42

    CPC分类号： G03F7/0002 ,  B82Y10/00

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    Magnification correction employing out-of-plane distortion of a substrate
    8.
    发明授权
    Magnification correction employing out-of-plane distortion of a substrate 有权
    使用基板的平面外失真的放大率校正

    公开(公告)号：US07323130B2

    公开(公告)日：2008-01-29

    申请号：US10735110

    申请日：2003-12-12

    申请人： Pawan K. Nimmakayala ,  Sidlgata V. Sreenivasan ,  Byung-Jin Choi ,  Anshuman Cherala

    发明人： Pawan K. Nimmakayala ,  Sidlgata V. Sreenivasan ,  Byung-Jin Choi ,  Anshuman Cherala

    IPC分类号： B29C41/02 ,  B29C41/48 ,  B29C41/50 ,  B29C53/02

    CPC分类号： B82Y10/00 ,  B29C59/02 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00

    摘要： The present invention is directed to a method of controlling dimensional relations between an original pattern present in a mold and a recorded pattern formed in a layer of a substrate. In this manner, the size of the recorded pattern may appear to be magnified and/or reduced, when compared to the original pattern. To that end, the method comprises defining a region on the layer in which to produce the recorded pattern. The substrate is bent to produce a contoured surface in the region. Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern. The contoured surface and the mold are provided to have similar radii of curvatures. The varied pattern is then recorded in the layer. These and other embodiments of the present invention are discussed more fully below.

    摘要翻译： 本发明涉及一种控制存在于模具中的原始图案与形成在基底层中的记录图案之间的尺寸关系的方法。 以这种方式，与原始图案相比，记录图案的尺寸可能看起来被放大和/或缩小。 为此，该方法包括定义在其上产生记录图案的层上的区域。 该基底被弯曲以在该区域中产生轮廓表面。 通过弯曲模具产生原始图案的尺寸变化，限定了不同的图案。 轮廓表面和模具被提供以具有相似的曲率半径。 然后将不同的图案记录在图层中。 下面将更全面地讨论本发明的这些和其它实施例。