-
公开(公告)号:US08647554B2
公开(公告)日:2014-02-11
申请号:US12835009
申请日:2010-07-13
申请人: Christopher Ellis Jones , Niyaz Khusnatdinov , Stephen C. Johnson , Philip D. Schumaker , Pankaj B. Lad
发明人: Christopher Ellis Jones , Niyaz Khusnatdinov , Stephen C. Johnson , Philip D. Schumaker , Pankaj B. Lad
IPC分类号: B27N3/18
CPC分类号: G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/5825 , B29C2043/5891 , B82Y10/00 , B82Y40/00
摘要: In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.
摘要翻译: 在纳米压印光刻中,重要的是检测在衬底上形成的残留层的厚度不均匀性。 补偿这种不均匀性,使得可以形成均匀的残留层。 通过计算校正的液滴图案来进行补偿。
-
公开(公告)号:US20090200710A1
公开(公告)日:2009-08-13
申请号:US12367079
申请日:2009-02-06
申请人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号: B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译: 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体,而剩余的可聚合材料固化。
-
公开(公告)号:US08641958B2
公开(公告)日:2014-02-04
申请号:US13743772
申请日:2013-01-17
申请人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号: B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译: 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体,而剩余的可聚合材料固化。
-
公开(公告)号:US08361371B2
公开(公告)日:2013-01-29
申请号:US12367079
申请日:2009-02-06
申请人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
CPC分类号: B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
摘要翻译: 位于能量源和压印光刻模板之间的装置可以阻挡能量暴露于分配在基底上的可聚合材料的部分。 被能量阻挡的可聚合材料的一部分可以保持流体,而剩余的可聚合材料固化。
-
公开(公告)号:US20130241109A1
公开(公告)日:2013-09-19
申请号:US13743772
申请日:2013-01-17
申请人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
发明人: Niyaz Khusnatdinov , Christopher Ellis Jones , Joseph G. Perez , Dwayne L. LaBrake , Ian Matthew McMackin
IPC分类号: B29C59/02
CPC分类号: B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2022
摘要: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
-
公开(公告)号:US20120189780A1
公开(公告)日:2012-07-26
申请号:US13429903
申请日:2012-03-26
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00
摘要: Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.
摘要翻译: 描述了在基板上制造图案化表面的方法。 通常,图案化表面由厚度小于约5nm的残余层限定。
-
公开(公告)号:US20120070572A1
公开(公告)日:2012-03-22
申请号:US13228298
申请日:2011-09-08
IPC分类号: B05D5/10 , C23C16/448
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00
摘要: Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.
摘要翻译: 描述了在压印光刻工艺期间使用蒸气递送系统以实现粘合促进剂材料的传递的系统和方法。
-
公开(公告)号:US07665196B2
公开(公告)日:2010-02-23
申请号:US11986788
申请日:2007-11-26
CPC分类号: H03H9/14538 , H03H3/08 , H05K3/048 , Y10T29/42 , Y10T29/435 , Y10T29/49005 , Y10T29/49007 , Y10T29/4913 , Y10T29/49155 , Y10T29/49156
摘要: Provided is a method of manufacturing a multi-frequency surface acoustic wave (SAW) device on a common piezoelectric substrate. The method features varying the resonant frequency of waveguide elements of the SAW device using a single etch step. The etch step removes a sub-portion of multiple layers of conductive film disposed on the substrate.
摘要翻译: 提供了在公共压电基板上制造多频表面声波(SAW)器件的方法。 该方法使用单个蚀刻步骤改变SAW器件的波导元件的谐振频率。 蚀刻步骤去除设置在衬底上的多层导电膜的子部分。
-
公开(公告)号:US20090148619A1
公开(公告)日:2009-06-11
申请号:US12328498
申请日:2008-12-04
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00
摘要: Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.
摘要翻译: 描述了在基板上制造图案化表面的方法。 通常,图案化表面由厚度小于约5nm的残余层限定。
-
公开(公告)号:US20080222864A1
公开(公告)日:2008-09-18
申请号:US11986788
申请日:2007-11-26
CPC分类号: H03H9/14538 , H03H3/08 , H05K3/048 , Y10T29/42 , Y10T29/435 , Y10T29/49005 , Y10T29/49007 , Y10T29/4913 , Y10T29/49155 , Y10T29/49156
摘要: Provided is a method of manufacturing a multi-frequency surface acoustic wave (SAW) device on a common piezoelectric substrate. The method features varying the resonant frequency of waveguide elements of the SAW device using a single etch step. The etch step removes a sub-portion of multiple layers of conductive film disposed on the substrate.
摘要翻译: 提供了在公共压电基板上制造多频表面声波(SAW)器件的方法。 该方法使用单个蚀刻步骤改变SAW器件的波导元件的谐振频率。 蚀刻步骤去除设置在衬底上的多层导电膜的子部分。
-
-
-
-
-
-
-
-
-