公开(公告)号：US20130276984A1

公开(公告)日：2013-10-24

申请号：US13575709

申请日：2011-01-27

申请人： Frank Papa ,  Roel Tietema ,  Anthonie Kaland

发明人： Frank Papa ,  Roel Tietema ,  Anthonie Kaland

IPC分类号： C23C16/02

CPC分类号： C23C16/0245 ,  C23C14/022 ,  C23C14/352 ,  H01J37/3405 ,  H01J37/3438 ,  H01J37/3444 ,  H01J37/3467 ,  H01J2237/332 ,  H01J2237/334

摘要： A coating apparatus having a vacuum chamber, a plurality of cathodes arranged therein and also a HIPIMS power source, characterized in that in addition to at least one coating cathode which can be operated with the HIPIMS power source a plurality of etching cathodes is provided which are smaller in area in comparison to the coating cathode, with the etching cathodes being connectable in a predetermined or predeterminable sequence to the HIPIMS power source.

摘要翻译： 一种具有真空室，多个阴极布置在其中以及HIPIMS电源的涂覆设备，其特征在于，除了能够与HIPIMS电源一起操作的至少一个涂层阴极之外，还提供了多个蚀刻阴极， 与涂层阴极相比，面积更小，其中蚀刻阴极可以以预定或可预定的顺序连接到HIPIMS电源。

公开(公告)号：US20140262748A1

公开(公告)日：2014-09-18

申请号：US14233118

申请日：2012-07-16

申请人： Roel Tietema ,  Frank Papa

发明人： Roel Tietema ,  Frank Papa

IPC分类号： H01J37/34 ,  C23C14/35

CPC分类号： H01J37/3405 ,  C23C14/35 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3467

摘要： An apparatus for the pretreatment and/or for the coating of an article in a vacuum chamber having at least one cathode arranged therein having at least one HIPIMS power source and also having a device which generates a tunnel-like magnetic field in front of the surface of the cathode, is characterized in that the device is designed in order to generate the tunnel-like magnetic field in front of a portion of the surface of the cathode and in that the device is displaceable relative to the cathode to allow the magnetic field to act in front of at least one further portion of the surface of the cathode. The device can consist of permanent magnets, which are displaced relative to the cathode, or of magnetic field generating coils, which can be movably arranged or stationary.

摘要翻译： 一种用于在真空室中预处理和/或涂覆物品的装置，其具有布置在其中的至少一个阴极，其具有至少一个HIPIMS电源，并且还具有在表面前方产生隧道状磁场的装置 阴极的特征在于，该器件被设计成在阴极表面的一部分前面产生隧道状磁场，并且该器件可相对于阴极移位，以允许磁场 在阴极的表面的至少另外一部分的前方起作用。 该装置可以由相对于阴极移位的永磁体或可以可移动地布置或静止的磁场产生线圈组成。

公开(公告)号：US20120253431A1

公开(公告)日：2012-10-04

申请号：US13074084

申请日：2011-03-29

申请人： Jennifer Papa ,  Frank Papa ,  Diane Papa

发明人： Jennifer Papa ,  Frank Papa ,  Diane Papa

IPC分类号： A61N5/06

CPC分类号： A61N5/0618 ,  A61N5/0622 ,  A61N2005/0651 ,  A61N2005/0653 ,  A61N2005/0662

摘要： A hemispatial neglect clipboard, the clipboard comprising: a board, the board comprising a front-side, and a back-side, a right edge and a left edge; a clip attached to generally the top of the board; at least one light located near either the right edge or left edge of the board; an on/off switch located on the front-side of the board; a power supply in signal communication with the on/off switch and the at least one light.

摘要翻译： 一种半空间疏忽剪贴板，所述剪贴板包括：板，所述板包括前侧，以及后侧，右边缘和左边缘; 通常夹在板的顶部的夹子; 位于板的右边缘或左边缘附近的至少一个光; 位于电路板正面的开/关开关; 与开/关开关和至少一个光信号通信的电源。

公开(公告)号：US20100140083A1

公开(公告)日：2010-06-10

申请号：US12445565

申请日：2007-10-26

申请人： Roel Tietema ,  Frank Papa ,  Geert Sesink ,  Rene Thomasita

发明人： Roel Tietema ,  Frank Papa ,  Geert Sesink ,  Rene Thomasita

IPC分类号： C23C14/54 ,  C23C14/35

CPC分类号： H01J37/3405 ,  H01J37/3299 ,  H01J37/3444 ,  H01J37/3485

摘要： A dual magnetron sputtering power supply for use with a magnetron sputtering apparatus having at least first and second sputtering cathodes for operation in the dual magnetron sputtering mode, there being a means for supplying a flow of reactive gas to each of said first (1) and second (4) cathodes via first (12) and second (14) flow control valves each associated with a respective one of said first and second cathodes and each adapted to control a flow of reactive gas to the respectively associated cathode, the power supply having, for each of said first and second cathodes a means for deriving a feed-back signal relating to the voltage prevailing at that cathode, a control circuit for controlling the flow of reactive gas to the respectively associated cathode by controlling the respective flow control valve and adapted to adjust the respective flow control valve to obtain a voltage feedback signal from the respective cathode corresponding to a set point value set for that cathode. Also claimed is a magnetron sputtering apparatus in combination with such a power supply.

摘要翻译： 一种双磁控溅射电源，其用于具有至少第一和第二溅射阴极的磁控溅射装置，用于在双磁控溅射模式下操作，存在用于将反应性气体流供应到所述第一（1）和 第二（4）阴极经由第一（12）和第二（14）个流量控制阀，每个与所述第一和第二阴极中的相应一个相关联，并且每个阴极适于控制到分别相关联的阴极的反应气体的流动，所述电源具有 对于所述第一和第二阴极中的每一个，用于导出与在该阴极处存在的电压相关的反馈信号的装置，用于通过控制相应的流量控制阀来控制反应气体流向相应的阴极的控制电路，以及 适于调节相应的流量控制阀以从相应阴极获得对应于为该阴极设定的设定值的电压反馈信号。 还要求保护的是与这种电源组合的磁控溅射装置。

公开(公告)号：US20130056348A1

公开(公告)日：2013-03-07

申请号：US13599977

申请日：2012-08-30

申请人： Frank PAPA ,  Roel TIETEMA

发明人： Frank PAPA ,  Roel TIETEMA

IPC分类号： C23C14/35

CPC分类号： C23C14/352 ,  C23C14/0021 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/0676 ,  C23C14/14 ,  C23C14/22 ,  H01J37/3405 ,  H01J37/3452

摘要： A vacuum coating apparatus and method comprising a vacuum chamber, at least one pair of opposing cathodes, a power supply adapted to supply an AC voltage to said opposing cathodes to operate them in a dual magnetron sputtering mode, wherein at least one further cathode for PVD coating is provided in said vacuum chamber, characterized in that the at least one further cathode is a magnetron cathode and a further power supply is provided in the form of a pulsed power supply or a DC power supply is provided which is connectable to the magnetron cathode or arc cathode.

摘要翻译： 一种真空镀膜装置和方法，包括真空室，至少一对相对的阴极，适于向所述相对阴极提供AC电压以在双重磁控溅射模式下操作它们的电源，其中至少一个用于PVD的另外的阴极 在所述真空室中提供涂层，其特征在于，所述至少一个另外的阴极是磁控管阴极，并且以脉冲电源的形式提供另外的电源，或者提供可连接到磁控管阴极的DC电源 或电弧阴极。