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公开(公告)号：US5898127A
公开(公告)日：1999-04-27
申请号：US853129
申请日：1997-05-08
CPC分类号： H05K9/0015 , H05K5/06 , Y10S277/92
摘要： A cover fitted about the periphery of an opening in a chamber wall is provided with a channel having therein both high frequency sealing elements which prevent escape of electromagnetic radiation, and a vacuum sealing element. The HF sealing elements are spaced apart by less than 1/4 of the minimum wavelength .lambda. to be shielded against, and are preferably held in the channel by a profiled element which also holds the vacuum sealing element. Alternatively, the channel may be provided in the chamber wall, or the sealing elements may he held in place without any channel.
摘要翻译： 围绕室壁中的开口的周边装配的盖设置有其中具有防止电磁辐射逸出的高频密封元件的通道和真空密封元件。 HF密封元件间隔开小于+ E，最小波长λ1/ 4 + EE的屏蔽隔离，并且优选地通过也保持真空密封元件的异型元件保持在通道中。 或者，通道可以设置在室壁中，或者密封元件可以在没有任何通道的情况下保持就位。
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公开(公告)号：US5968328A
公开(公告)日：1999-10-19
申请号：US988811
申请日：1997-12-11
CPC分类号： H01J37/3405 , C23C14/35 , C23C14/568
摘要： In an apparatus for the sputter deposition of thin electrically insulating layers on substrates (33, 33', . . . ) there is provided in an evacuable chamber which is connected to a treatment gas source, a first pair of tubular magnetron cathodes (5, 5' or 31) and at least one additional pair of magnetron cathodes (6, 6' or 25, 26 or 30, 32), a medium frequency generator (10) connected in series with a transformer (9), where the two secondary winding outputs (11, 12) of said transformer are each connected with the cathodes of a second pair (6, 6' or 25, 26 or 30, 32) and where direct current can be fed into the supply lines for the first cathode pair (31) via a center tap (15) of the transformer (9) and a network (17 or 13, 14).
摘要翻译： 在用于在衬底（33,33'...）上溅射沉积薄电绝缘层的设备中，设置在可抽气室中，该可抽出室连接到处理气体源，第一对管状磁控阴极（5， 5“或31”）和至少一个额外的一对磁控阴极（6,6'或25,26或30,32），与变压器（9）串联连接的中频发生器（10），其中两个次级 所述变压器的绕组输出端（11,12）各自与第二对（6,6'或25,26或30,32）的阴极连接，并且其中可将直流电流馈送到用于第一阴极对的电源线 （31）经由变压器（9）的中心抽头（15）和网络（17或13,14）。
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公开(公告)号：US5192894A
公开(公告)日：1993-03-09
申请号：US807278
申请日：1991-12-13
申请人： Gotz Teschner
发明人： Gotz Teschner
CPC分类号： H01J37/34 , H01J37/3444 , H02H7/00 , H01J2237/0206
摘要： The invention relates to a circuit configuration for the suppression of arcs in a plasma wherein to the plasma path (5, 7, 8) a voltage (11) is applied. The instantaneous value of the voltage of the plasma path (5, 7, 8) is compared with a mean value of the voltage which has been determined over a given period of time. If the difference between the instantaneous value and mean value exceeds a given amount, the plasma path (5, 7, 8) is isolated from the voltage (11).
摘要翻译： 本发明涉及一种用于抑制等离子体中的电弧的电路结构，其中对等离子体路径（5,7,8）施加电压（11）。 将等离子体路径（5,7,8）的电压的瞬时值与在给定时间段内确定的电压的平均值进行比较。 如果瞬时值和平均值之间的差超过给定量，则等离子体路径（5,7,8）与电压（11）隔离。
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4.发明授权Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated 失效在真空室中具有坩埚的真空涂布装置，用于保持待蒸发的材料
公开(公告)号：US5888305A
公开(公告)日：1999-03-30
申请号：US741669
申请日：1996-10-31
CPC分类号： H01J37/3405 , C23C14/32 , H01J37/3053 , H01J2237/3137
摘要： A vacuum chamber contains a crucible (4) and an electron beam source (5) for evaporating material in the crucible. A substrate holder (6) holds substrates (7) above the crucible (4) with a process space therebetween. A magnetron cathode (11, 12) is located in each of two compartments (9, 10) located on either side of the process space. An aperture (21, 22) connects each compartment to the process space; each cathode (11, 12) carries a target (13, 14) facing away from the respective aperture (21, 22). The cathodes are connected to a medium frequency RF power supply (16), and process gas is supplied to the compartments by lines (17, 18).
摘要翻译： 真空室包含用于蒸发坩埚中的材料的坩埚（4）和电子束源（5）。 衬底保持器（6）在坩埚（4）上方具有处理空间的基板（7）。 磁控管阴极（11,12）位于位于处理空间两侧的两个隔间（9,10）的每一个中。 孔（21,22）将每个隔室连接到处理空间; 每个阴极（11,12）承载着面向远离相应孔（21,22）的靶（13,14）。 阴极连接到中频RF电源（16），并且处理气体通过管线（17,18）供应到隔间。
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公开(公告)号：US5807470A
公开(公告)日：1998-09-15
申请号：US690835
申请日：1996-08-01
CPC分类号： H01J37/3444 , H01J37/34 , H05H1/46
摘要： An alternating-current source (2) is connected to two cathodes (6,7) which cooperate electrically with targets which are sputtered in a gas discharge while a process gas is introduced in a vacuum chamber (15). A network formed of a transformer (3) and additional coils (5, 12, 13) and condensers (4, 8, 9, 10, 11) acts as a filter to assure a stable coating process.
摘要翻译： 交流电源（2）连接到两个阴极（6,7），阴极（6,7）与在气体放电中溅射的靶物电合作，同时将工艺气体引入真空室（15）。 由变压器（3）和附加线圈（5,12,13）和冷凝器（4,8,9,10,11）构成的网络用作过滤器以确保稳定的涂覆过程。
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公开(公告)号：US5718815A
公开(公告)日：1998-02-17
申请号：US711885
申请日：1996-09-12
CPC分类号： H01J37/32458 , H01J37/34 , H01J37/3408 , H01J37/3426 , H01J2237/0206
摘要： A vacuum chamber includes a central compartment (1) in which a diode cathode (6) carrying an electrically conductive sputtering target (7) is located, and two outer compartments (11, 12) in which magnetron cathodes (13, 14) carrying target 15, 16) are located, the magnetron cathodes (13, 14) being connected to respective poles (20, 21) of an AC power source. The outer compartments (11, 12) are separated from the central compartment by walls having openings (33, 34) which flank a space (28) between the sputtering target (6) and the substrate (3). Process gas lines 24, 25) are arranged to introduce process gas into this space (3).
摘要翻译： 真空室包括中央隔室（1），其中位于载有导电溅射靶（7）的二极管阴极（6）和两个外部隔室（11,12）中，其中磁控管阴极（13,14）承载目标 15,16），磁控阴极（13,14）连接到交流电源的相应极（20,21）。 外隔室（11,12）通过具有在溅射靶（6）和衬底（3）之间的空间（28）侧面的开口（33,34）的壁与中央隔室分离。 处理气体管线24,25被布置成将处理气体引入该空间（3）中。
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公开(公告)号：US5281321A
公开(公告)日：1994-01-25
申请号：US023477
申请日：1993-02-25
申请人： Johann Sturmer , Gotz Teschner
发明人： Johann Sturmer , Gotz Teschner
CPC分类号： H05H1/36
摘要： The invention relates to a device for the suppression of arcs in gas discharge arrangements having two cathodes (6, 7) and one anode (4) supplied from an electric energy source (10). Between the electrical terminals of this electric energy source (10) and the cathode (6, 7) is provided a circuit configuration having two switching elements (15, 25) which upon the occurrence of arcs are through-switched.
摘要翻译： 本发明涉及一种用于抑制气体放电装置中的电弧的装置，其具有从电能源（10）提供的两个阴极（6,7）和一个阳极（4）。 在该电能源（10）的电端子和阴极（6,7）之间设置有具有两个开关元件（15,25）的电路结构，在电弧发生时通过交换。
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公开(公告)号：US6096174A
公开(公告)日：2000-08-01
申请号：US990953
申请日：1997-12-15
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34 , H01L21/316 , H01L21/318 , C23C14/32 , C23C14/54
CPC分类号： H01J37/3444 , C23C14/3464 , C23C14/352 , H01J37/3408 , H01L21/31604 , H01L21/318
摘要： An apparatus is provided for coating a substrate (24) with thin layers from targets (12, 13) between which a gas discharge plasma is sustained in order to produce the ions necessary for the bombardment of the targets (12, 13) connected to alternating current. The process chamber (6) contains a gas under a specific partial pressure. The targets (12, 13) are connected to a power source in such a circuit so that they alternately form the cathode and anode of the gas discharge. The reversal of the current direction is performed through an H bridge (4) formed of four switches (16 to 19), the conductor (14) connecting the H bridge (4) to a first power source (3) being connected through a branch line (21) to a second power source which can be connected by a switch (20) to ground. All switches (19 to 20) are operated by a control circuit in a regular and variable mode, the ion energy being controlled by the level of the potential difference between the cathode and the coating and the number of ions through the duration of this potential
摘要翻译： 提供了一种用于从其上维持气体放电等离子体的目标（12,13）的薄层涂覆基底（24）的装置，以产生用于轰击连接到交替的靶（12,13）所必需的离子 当前。 处理室（6）含有特定分压下的气体。 目标（12,13）在这种电路中连接到电源，使得它们交替地形成气体放电的阴极和阳极。 通过由四个开关（16至19）形成的H桥（4）进行电流方向的反转，将H桥（4）连接到第一电源（3）的导体（14）通过分支 线路（21）连接到能够通过开关（20）连接到地的第二电源。 所有的开关（19到20）由一个常规和可变模式的控制电路操作，离子能量由阴极和涂层之间的电位差水平控制，并且在该电位的持续时间内离子的数量
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9.发明授权Method and apparatus for coating substrates in a vacuum chamber, with a system for the detection and suppression of undesirable arcing 失效用于在真空室中涂覆基材的方法和装置，具有用于检测和抑制不期望的电弧放电的系统
公开(公告)号：US5698082A
公开(公告)日：1997-12-16
申请号：US746437
申请日：1996-11-08
申请人： Gotz Teschner , Jurgen Bruch
发明人： Gotz Teschner , Jurgen Bruch
CPC分类号： H01J37/3444 , H01J37/34 , H01J2237/0206
摘要： In an apparatus for coating substrates, having sputtering cathodes (4, 5) disposed in a vacuum chamber (1), sputtering targets (6, 7), a medium-frequency generator (9) connected to the cathodes (4, 5), and a system (16) for detecting and suppressing undesired arcing, a cycle of the medium-frequency signal of the medium-frequency generator (9) is divided into a plurality of time segments, the electrical values of current and voltage for a predetermined time segment being determined so as to form a measured value signal and being entered into a ground-free meter island (16). The meter island (16) is tied as a remote station into a circular network (9, 16, 17, 18, 19, 11) whose master station is situated in the control unit (11) present in the generator (9). The blocking of the generator (9) when an arc occurs takes place through a line (19) connecting the meter island (16) to the generator (9). The parameters of the arc surveillance and the detection of measured values are preset through the network (17, 18, 19) by means of software.
摘要翻译： 在用于涂布基板的设备中，具有设置在真空室（1）中的溅射阴极（4,5），溅射靶（6,7），连接到阴极（4,5）的中频发生器（9） 以及用于检测和抑制不期望的电弧的系统（16），中频发生器（9）的中频信号的周期被划分为多个时间段，电流和电压的电值在预定时间 被确定为形成测量值信号并被输入无地面计量岛（16）。 仪表岛（16）作为远程站被连接到其主站位于存在于发电机（9）中的控制单元（11）中的圆形网络（9,16,17,18,19.11）中。 当发生电弧时发电机（9）的阻塞通过将仪表岛（16）连接到发电机（9）的线（19）发生。 通过软件通过网络（17,18,19）预设电弧监视的参数和测量值的检测。
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10.发明授权Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition 失效用于通过等离子体辅助气相沉积在卷筒上涂布卷材的装置
公开(公告)号：US5993622A
公开(公告)日：1999-11-30
申请号：US740318
申请日：1996-10-28
CPC分类号： H01J37/3277 , C23C14/02 , C23C14/024 , C23C14/562 , H01J37/3405
摘要： A crucible (4) in a vacuum chamber (3) holds material to be evaporated, such as a metal or metal oxide or a mixture of a metal and a metal oxide, and a coating roll (6) guides a film web (8) a certain distance away from the material to be evaporated. A chamber (9, 10) is provided on each side of the coating roll (6) which carries the film web (8) past the crucible (4), a magnetron cathode (11, 12) connected to a medium-frequency source (19) being provided in each chamber. Each of the two chambers (9, 10) is connected by its own channel (13, 14) to a coating zone (20) directly between the coating roll (6) and the crucible (4), and each chamber (9, 10) is connected by a pressure line (21, 22) to a source (23, 24) of process gas.
摘要翻译： 在真空室（3）中的坩埚（4）保持待蒸发的材料，例如金属或金属氧化物或金属和金属氧化物的混合物，并且涂布辊（6）引导膜幅（8） 距离要蒸发的材料一定距离。 在涂布辊（6）的每一侧上设有一个室（9,10），该涂布辊（6）承载膜片（8）经过坩埚（4）;磁控管阴极（11,12），连接到中频源 19）设置在每个室中。 两个室（9,10）中的每一个通过其自身的通道（13,14）连接到涂布辊（6）和坩埚（4）之间的涂覆区域（20），并且每个室（9,10 ）通过压力管线（21,22）连接到处理气体的源（23,24）。
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