Flat panel display device with polycrystalline silicon thin film transistor
    2.
    发明授权
    Flat panel display device with polycrystalline silicon thin film transistor 有权
    具有多晶硅薄膜晶体管的平板显示装置

    公开(公告)号:US08049220B2

    公开(公告)日:2011-11-01

    申请号:US11942460

    申请日:2007-11-19

    IPC分类号: H01L27/14

    摘要: The present invention relates to a flat panel display device comprising a polycrystalline silicon thin film transistor and provides a flat panel display device having improved characteristics by having a different number of grain boundaries included in polycrystalline silicon thin film formed in active channel regions of a driving circuit portion and active channel regions of pixel portion. This may be achieved by having a different number of grain boundaries included in the polycrystalline silicon thin film formed in active channel regions of a switching thin film transistor and a driving thin film transistor formed in the pixel portion, and by having a different number of grain boundaries included in polycrystalline silicon thin film formed in active channel regions of a thin film transistor for driving the pixel portion for each red, green and blue of the pixel portion. Further, this may be achieved by having a different number of grain boundaries included in polycrystalline silicon formed in active channel regions of an NMOS thin film transistor and a PMOS thin film transistor for forming CMOS transistor used in flat panel display device, thereby constructing a thin film transistor to obtain the improved characteristics for each transistor.

    摘要翻译: 本发明涉及一种包括多晶硅薄膜晶体管的平板显示装置,通过在驱动电路的有源沟道区域中形成的多晶硅薄膜中包含不同数量的晶界,提供具有改进特性的平板显示装置 像素部分和有源沟道区域。 这可以通过在形成在像素部分中的开关薄膜晶体管和驱动薄膜晶体管的有源沟道区域中形成的多晶硅薄膜中包含不同数量的晶界,并且通过具有不同数量的晶粒来实现 包括在形成在用于驱动像素部分的每个红,绿和蓝的像素部分的薄膜晶体管的有源沟道区域中的多晶硅薄膜中的边界。 此外,这可以通过在NMOS薄膜晶体管的有源沟道区域中形成的多晶硅中包含不同数量的晶界和用于形成用于平板显示器件的CMOS晶体管的PMOS薄膜晶体管来实现,从而构造薄的 以获得每个晶体管的改进特性。

    Organic light emitting display
    3.
    发明申请
    Organic light emitting display 审中-公开
    有机发光显示器

    公开(公告)号:US20110220879A1

    公开(公告)日:2011-09-15

    申请号:US12926767

    申请日:2010-12-08

    IPC分类号: H01L51/50

    CPC分类号: H01L27/3258

    摘要: An organic light emitting display (OLED) including a thin film transistor (TFT) including a gate electrode, an active layer, and source and drain electrodes, the active layer being insulated from the gate electrode and including an oxide semiconductor and the source and drain electrodes being insulated from the gate electrode and contacting the active layer; a first insulation layer covering the TFT; a second insulation layer on the first insulation layer, the second insulation layer being formed of amorphous silicon without doping; a pixel electrode on the second insulation layer; a third insulation layer on the second insulation layer, the third insulation layer covering an edge of the pixel electrode; an organic light emitting layer on the pixel electrode; and a facing electrode on the organic light emitting layer and the third insulation layer.

    摘要翻译: 一种有机发光显示器(OLED),包括具有栅电极,有源层以及源电极和漏电极的薄膜晶体管(TFT),所述有源层与所述栅电极绝缘并且包括氧化物半导体以及所述源极和漏极 电极与栅电极绝缘并接触有源层; 覆盖TFT的第一绝缘层; 在所述第一绝缘层上的第二绝缘层,所述第二绝缘层由无掺杂的非晶硅形成; 第二绝缘层上的像素电极; 在所述第二绝缘层上的第三绝缘层,所述第三绝缘层覆盖所述像素电极的边缘; 像素电极上的有机发光层; 以及有机发光层和第三绝缘层上的面对电极。

    METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DEVICE HAVING PHOTO DIODE
    4.
    发明申请
    METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DEVICE HAVING PHOTO DIODE 有权
    制造具有照相二极管的有机发光器件的方法

    公开(公告)号:US20090011528A1

    公开(公告)日:2009-01-08

    申请号:US12098653

    申请日:2008-04-07

    IPC分类号: H01L51/56

    CPC分类号: H01L27/1214 H01L27/3269

    摘要: A method for manufacturing an organic light emitting device including a photo diode and a transistor includes forming a first semiconductor layer and a second semiconductor layer on separate portions of a buffer layer formed on the substrate; forming a gate metal layer on the first semiconductor layer, the gate metal layer covering a central region of the first semiconductor layer; forming a high-concentration P doping region and a high-concentration N doping region in the first semiconductor layer by injecting impurities into regions of the first semiconductor layer not covered by the gate metal layer to form the photodiode; forming a source and drain region and a channel region in the second semiconductor layer; and removing the gate metal layer from the central region of the first semiconductor layer by etching and simultaneously forming a gate electrode by etching, the gate electrode being insulated from the channel region of the second semiconductor layer, to form the transistor.

    摘要翻译: 一种制造包括光电二极管和晶体管的有机发光器件的方法,包括在形成在衬底上的缓冲层的分离部分上形成第一半导体层和第二半导体层; 在所述第一半导体层上形成栅极金属层,所述栅极金属层覆盖所述第一半导体层的中心区域; 通过在不被栅极金属层覆盖的第一半导体层的区域中注入杂质来形成第一半导体层中的高浓度P掺杂区域和高浓度N掺杂区域以形成光电二极管; 在所述第二半导体层中形成源极和漏极区域和沟道区域; 并且通过蚀刻从第一半导体层的中心区域去除栅极金属层,并通过蚀刻同时形成栅电极,栅电极与第二半导体层的沟道区域绝缘,以形成晶体管。

    Double gate thin-film transistor and OLED display apparatus including the same
    8.
    发明授权
    Double gate thin-film transistor and OLED display apparatus including the same 有权
    双栅极薄膜晶体管和包括其的OLED显示装置

    公开(公告)号:US08395157B2

    公开(公告)日:2013-03-12

    申请号:US13155329

    申请日:2011-06-07

    IPC分类号: H01L29/04 H01L29/10 H01L21/00

    摘要: A double gate thin-film transistor (TFT), and an organic light-emitting diode (OLED) display apparatus including the double gate TFT, includes a double gate thin-film transistor (TFT) including: a first gate electrode on a substrate; an active layer on the first gate electrode; source and drain electrodes on the active layer; a planarization layer on the substrate and the source and drain electrodes, and having an opening corresponding to the active layer; and a second gate electrode in the opening.

    摘要翻译: 包括双栅极TFT的双栅极薄膜晶体管(TFT)和有机发光二极管(OLED)显示装置包括双栅极薄膜晶体管(TFT),其包括:基板上的第一栅电极; 在第一栅电极上的有源层; 有源层上的源极和漏极; 所述基板上的平坦化层和所述源极和漏极,并且具有对应于所述有源层的开口; 和第二栅电极。

    Mask Pattern, Method of Fabricating Thin Film Transistor, and Method of Fabricating Organic Light Emitting Display Device Using the Same
    9.
    发明申请
    Mask Pattern, Method of Fabricating Thin Film Transistor, and Method of Fabricating Organic Light Emitting Display Device Using the Same 有权
    掩膜图案,薄膜晶体管的制造方法以及使用其的制造有机发光显示装置的方法

    公开(公告)号:US20110159647A1

    公开(公告)日:2011-06-30

    申请号:US13013261

    申请日:2011-01-25

    申请人: Hye-Hyang Park

    发明人: Hye-Hyang Park

    IPC分类号: H01L21/336

    摘要: A method of fabricating a polycrystalline silicon thin film for a thin film transistor (TFT), a mask pattern used for the method, and a method of fabricating a flat panel display device using the method and the mask pattern. In one embodiment, a mask pattern includes a plurality of regions, each of the regions having at least one of one or more transparent portions or one or more non-transparent portions. A total area of the one or more transparent portions and the one or more non-transparent portions in one of the regions is substantially equal to a total area of the one or more transparent portions and the one or more non-transparent portions in at least one other of the regions. A total area of the transparent portions in the mask pattern is different from a total area of the non-transparent portions in the mask pattern.

    摘要翻译: 一种制造用于薄膜晶体管(TFT)的多晶硅薄膜的方法,用于该方法的掩模图案,以及使用该方法和掩模图案制造平板显示装置的方法。 在一个实施例中,掩模图案包括多个区域,每个区域具有一个或多个透明部分或一个或多个非透明部分中的至少一个。 其中一个区域中的一个或多个透明部分和一个或多个非透明部分的总面积基本上等于至少一个或多个透明部分和至少一个或多个非透明部分的总面积 另一个地区。 掩模图案中的透明部分的总面积与掩模图案中的不透明部分的总面积不同。