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    Biosensor containing a biochemical substance immobilized on a layer of olefinic-unsaturated, epoxy functional cross-linked polysiloxane
    1.
    发明授权
    Biosensor containing a biochemical substance immobilized on a layer of olefinic-unsaturated, epoxy functional cross-linked polysiloxane 失效
    生物传感器含有固定在烯属不饱和环氧官能交联聚硅氧烷层上的生化物质

    公开(公告)号：US5407818A

    公开(公告)日：1995-04-18

    申请号：US35030

    申请日：1993-03-22

    申请人： Wolfgang von Gentzkow ,  Hans-Dieter Feucht ,  Helmut Formanek ,  Gerhard Wanner

    发明人： Wolfgang von Gentzkow ,  Hans-Dieter Feucht ,  Helmut Formanek ,  Gerhard Wanner

    IPC分类号： C08G77/38 ,  C07K17/08 ,  C12M1/40 ,  C12N11/08 ,  C12Q1/00 ,  G01N27/327 ,  G01N27/414 ,  C12M11/08 ,  C08G77/04 ,  G01N27/26

    CPC分类号： C12Q1/002

    摘要： A biosensor is prepared having a selective detection system containing a biochemical substance such as an enzyme immobilized on an olefinic-unsaturated, epoxyfunctional polysiloxane. Prior to immobilization of the biochemical substance, the polysiloxane is applied as a layer to a carrier and cross-linked by treatment with high-energy radiation. A biochemical substance is reacted with epoxy groups of the cross-linked polysiloxane. Any non-reacted epoxy groups are reacted with a compound containing an amino group, a carboxyl group or an amino group and a carboxyl group to stabilize. After cross-linking and before reacting of the biochemical substance, the cross-linked polysiloxane can be hydrophilized by reacting some of the epoxy groups with a hydrophilic compound containing a reactive group.

    摘要翻译： 制备具有选择性检测系统的生物传感器，其包含固定在烯属不饱和环氧官能团聚硅氧烷上的生物化学物质如酶。 在固化生化物质之前，将聚硅氧烷作为层施加到载体上并通过用高能辐射处理进行交联。 生化物质与交联聚硅氧烷的环氧基反应。 任何未反应的环氧基与含有氨基，羧基或氨基和羧基的化合物反应以稳定。 交联后，在生物化学物质反应之前，交联聚硅氧烷可通过一些环氧基与含有反应性基团的亲水性化合物反应而亲水化。

    Electron-beam-sensitive resist material for microstructures in electronics
    2.
    发明授权
    Electron-beam-sensitive resist material for microstructures in electronics 失效
    电子束微结构的电子束敏感抗蚀剂材料

    公开(公告)号：US4837125A

    公开(公告)日：1989-06-06

    申请号：US17982

    申请日：1987-02-24

    申请人： Erwin Knapek ,  Helmut Formanek

    发明人： Erwin Knapek ,  Helmut Formanek

    IPC分类号： G03C1/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

    CPC分类号： G03F7/039 ,  Y10S430/114 ,  Y10S430/126

    摘要： An electron-beam-sensitive resist material is provided that includes film having high-polymers and includes dopings. The material is made into a solution that is added to the substrate so that the resist material can be produced on the semiconductive or piezoelectric substrates by drying. The doping additives of the resist material can include: halogens, halogen compounds, peroxides, kaotropic salts and xanthates. The resist material is used for the production of electron-beam-written microstructures with high structural resolution and, in comparison to the known methods, eliminates the error-affected developing process.

    摘要翻译： 提供了一种电子束敏感的抗蚀剂材料，其包括具有高聚合物的膜并且包括掺杂物。 将该材料制成添加到基底中的溶液，使得抗蚀剂材料可以通过干燥在半导体或压电基底上产生。 抗蚀剂材料的掺杂添加剂可以包括：卤素，卤素化合物，过氧化物，高岭土盐和黄原酸盐。 抗蚀剂材料用于生产具有高结构分辨率的电子束书写微结构，并且与已知方法相比，消除了错误影响的显影过程。

    Method and apparatus for producing electron beam diffraction patterns
    6.
    发明授权
    Method and apparatus for producing electron beam diffraction patterns 失效
    用于生成电子束衍射图案的方法和装置

    公开(公告)号：US4376891A

    公开(公告)日：1983-03-15

    申请号：US329076

    申请日：1981-12-09

    申请人： Gunter Rauscher ,  Helmut Formanek

    发明人： Gunter Rauscher ,  Helmut Formanek

    IPC分类号： H01J37/295 ,  G01N23/00

    CPC分类号： H01J37/295 ,  Y10S505/871

    摘要： A method is disclosed of producing electron beam diffraction patterns, in which the object to be examined is one which is liable to be altered substantially by an electron beam when that beam is accelerated by a predetermined voltage to the energy density necessary for the production of an image. The object is irradiated by an electron beam and the electrons of the electron beam, diffracted by the object, are imaged using an integrating image apparatus or an integrating image material, for example a photographic layer. One or more regions of the object corresponding in size to the cross section of the electron beam are irradiated intermittently using an electron beam accelerated by the pre-determined voltage, the electron beam having an electron density which is lower than the electron density at which the object is substantially altered. Irradiation is carried out for such a period of time that the electron density of the electron beam, integrated during this time, is at least equal to the electron density necessary to produce an image.

    摘要翻译： 公开了一种制造电子束衍射图案的方法，其中被检查物体是当该光束被预定电压加速到生产所需要的能量密度时基本上被电子束改变的方法 图片。 物体被电子束照射，并且由物体衍射的电子束的电子使用积分图像装置或积分图像材料，例如照相层成像。 使用由预定电压加速的电子束间歇地照射与电子束的截面大小对应的物体的一个或多个区域，电子束的电子密度低于电子密度， 物体实质上改变了。 进行照射这样的时间，使得在该时间内积分的电子束的电子密度至少等于产生图像所需的电子密度。