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公开(公告)号：US20060091330A1
公开(公告)日：2006-05-04
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Koren , Hoite Pieter Tolsma , Hubertus Johannes Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US20050189502A1
公开(公告)日：2005-09-01
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US20060081791A1
公开(公告)日：2006-04-20
申请号：US11294475
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US20060081790A1
公开(公告)日：2006-04-20
申请号：US11294473
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US20060081792A1
公开(公告)日：2006-04-20
申请号：US11294559
申请日：2005-12-06
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US20070176128A1
公开(公告)日：2007-08-02
申请号：US11643772
申请日：2006-12-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US20060086910A1
公开(公告)日：2006-04-27
申请号：US11294367
申请日：2005-12-06
申请人： Franciscus Maria Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y. Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
发明人： Franciscus Maria Van Bilsen , Jacobus Burghoorn , Richard Franciscus Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y. Koren , Hoite Theodoor Tolsma , Hubertus Gertrudus Simons , Johny Schuurhuis , Sicco Schets , Brian Bok Lee , Allan Dunbar
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US07329888B2
公开(公告)日：2008-02-12
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US20110128520A1
公开(公告)日：2011-06-02
申请号：US12977541
申请日：2010-12-23
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US07880880B2
公开(公告)日：2011-02-01
申请号：US11294367
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G01B11/00 , H01L23/544 , H01L21/76 , G01D5/36
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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