Abstract:
A manufacturing monitoring system and related methods for determining the efficiency of a production plant, of an assembly or process line, or of the components of the assembly or process line. Data relating to the efficiency of the plant, production line, or components of the production line are gathered, such as one or more of unit output values, downtime occurrences, downtime duration, downtime incident codes, downtime categorization, action items, minutes ran, hours scheduled, capable rate, actual output, idle time, total time and waste analysis values. The gathered data is stored and production efficiencies are calculated based upon the gathered data. The results are communicated, such as by the Internet or intranet, to computers, databases, servers or terminals. Related methods are also disclosed.
Abstract:
Parallel flow chemical processing systems, such as parallel flow chemical reaction systems are disclosed. These systems are adapted to simultaneously and independently vary temperature between separate flow channels, preferably by employing separate, individual heating elements in thermal communication with each of four or more parallel flow reactors. The flow reactors are preferably isolated from each other using a thermal isolation system comprising fluid-based heat exchange. In preferred embodiments, the axial heat flux can be fixedly or controllably varied.
Abstract:
Systems and methods for preparing inorganic-organic interfaces using transition metal coordination complexes and self-assembled monolayers as organic surfaces. In one embodiment, a silicon wafer supports a polycrystalline gold layer, optionally using an intermediate adhesionlayer such as Cr. The surface is reacted with the thiophene end of organic molecular species comprising a thiophene moiety to prepare self assembling monomers (SAMs). The functionalized end of the SAM is then reacted with metal-bearing species such as tetrakis(dimethylamido)titanium, Ti[N(CH3)2]4, (TDMAT) to provide a titanium nitride layer.
Abstract:
Systems and methods for preparing inorganic-organic interfaces using organo-transition metal complexes and self-assembled monolayers as organic surfaces. In one embodiment, a silicon wafer is cleaned and reacted with stabilized pirhana etch to provide an oxide surface. The surface is reacted with the trichlorosilyl end of alkyltrichlorosilanes to prepare self assembling monomers (SAMs). The alkyltrichlorosilanes have the general formula R1-R—SiCl3, where R1 is —OH, —NH2, —COOH, —SH, COOCH3, —CN, and R is a conjugated hydrocarbon, such as (CH2)n where n is in the range of 3 to 18. The functionalized end of the SAM can optionally modified chemically as appropriate, and is then reacted with metal-bearing species such as tetrakis(dimethylamido)titanium, Ti[N(CH3)2]4, (TDMAT) to provide a titanium nitride layer.