LED chip
    3.
    发明授权
    LED chip 有权
    LED芯片

    公开(公告)号:US08530923B2

    公开(公告)日:2013-09-10

    申请号:US12922830

    申请日:2009-04-28

    IPC分类号: H01L33/38

    摘要: A light-emitting diode chip (1) with a semiconductor layer sequence (2) is described, which is contacted electrically by contacts (5) via a current spreading layer (3). The contacts (5) cover around 1%-8% of the surface of the semiconductor layer sequence (2). The contacts (5) consist for example of separate contact points (51), which are arranged at the nodes of a regular grid (52) with a grid constant of 12 μm. The current spreading layer (3) contains for example indium-tin oxide, indium-zinc oxide or zinc oxide and has a thickness in the range from 15 nm to 60 nm.

    摘要翻译: 描述了具有半导体层序列(2)的发光二极管芯片(1),其经由电流扩展层(3)由触点(5)电接触。 触点(5)覆盖半导体层序列(2)的表面的约1%-8%。 触点(5)例如由单独的接触点(51)组成,它们布置在栅格常数为12μm的规则网格(52)的节点处。 电流扩展层(3)包含例如氧化铟锡,氧化铟锌或氧化锌,其厚度在15nm至60nm的范围内。

    Led Chip
    4.
    发明申请
    Led Chip 有权
    LED芯片

    公开(公告)号:US20110114988A1

    公开(公告)日:2011-05-19

    申请号:US12922830

    申请日:2009-04-28

    IPC分类号: H01L33/38

    摘要: A light-emitting diode chip (1) with a semiconductor layer sequence (2) is described, which is contacted electrically by contacts (5) via a current spreading layer (3). The contacts (5) cover around 1%-8% of the surface of the semiconductor layer sequence (2). The contacts (5) consist for example of separate contact points (51), which are arranged at the nodes of a regular grid (52) with a grid constant of 12 μm. The current spreading layer (3) contains for example indium-tin oxide, indium-zinc oxide or zinc oxide and has a thickness in the range from 15 nm to 60 nm.

    摘要翻译: 描述了具有半导体层序列(2)的发光二极管芯片(1),其经由电流扩展层(3)由触点(5)电接触。 触点(5)覆盖半导体层序列(2)的表面的约1%-8%。 触点(5)例如分开接触点(51),它们布置在格子常数为12μm的规则网格(52)的节点处。 电流扩展层(3)包含例如氧化铟锡,氧化铟锌或氧化锌,其厚度在15nm至60nm的范围内。

    Thin-layer light-emitting diode chip and method for the production thereof
    6.
    发明申请
    Thin-layer light-emitting diode chip and method for the production thereof 审中-公开
    薄层发光二极管芯片及其制造方法

    公开(公告)号:US20060237734A1

    公开(公告)日:2006-10-26

    申请号:US10567935

    申请日:2004-08-19

    IPC分类号: H01L33/00

    摘要: A thin-layer LED chip (5) is claimed, comprising an epitaxial layer sequence (6) that is disposed on a carrier element (2) and contains an electromagnetic-radiation-generating active region (8), and a reflective layer (3) that is disposed on a principal surface of the epitaxial layer sequence (6) facing toward the carrier element (2) and reflects at least a portion of the electromagnetic radiation generated in the epitaxial layer sequence (6) back thereinto, in which a structured layer (1) containing a glass material is applied to a radiation extraction surface (7) of the epitaxial layer sequence (6) facing away from said carrier element (2) and has a structure that includes mutually adjacent protuberances (5) that taper in the direction away from the radiation extraction surface (7) and have a lateral grid size that is smaller than one wavelength of an electromagnetic radiation emitted from the epitaxial layer sequence (6). The structured layer (1) is advantageously applied as spin-on glass and structured by grayscale lithography.

    摘要翻译: 要求保护薄层LED芯片(5),其包括设置在载体元件(2)上并包含电磁辐射生成有源区(8)的外延层序列(6)和反射层 ),其设置在面向载体元件(2)的外延层序列(6)的主表面上,并将在外延层序列(6)中产生的电磁辐射的至少一部分反射回到其中,其中结构化 将包含玻璃材料的层(1)施加到外延层序列(6)的远离所述载体元件(2)的辐射提取表面(7)上,并且具有包括彼此相邻的突起(5)的结构, 离开辐射提取表面(7)的方向并且具有小于从外延层序列(6)发射的电磁辐射的一个波长的横向网格尺寸。 结构化层(1)有利地作为旋涂玻璃施加,并通过灰度平版印刷法构成。

    Radiation-emitting semiconductor component and method for the production thereof
    8.
    发明授权
    Radiation-emitting semiconductor component and method for the production thereof 有权
    辐射发射半导体元件及其制造方法

    公开(公告)号:US07592636B2

    公开(公告)日:2009-09-22

    申请号:US10529625

    申请日:2003-09-23

    IPC分类号: H01L21/00 H01L23/495

    摘要: A radiation-emitting semiconductor component having a radiation-transmissive substrate (1), on the underside of which a radiation-generating layer (2) is arranged, in which the substrate (1) has inclined side areas (3), in which the refractive index of the substrate (1) is greater than the refractive index of the radiation-generating layer, in which the difference in refractive index results in an unilluminated substrate region (4), into which no photons are coupled directly from the radiation-generating layer, and in which the substrate (1) has essentially perpendicular side areas (5) in the unilluminated region. The component has the advantage that it can be produced with a better area yield from a wafer.

    摘要翻译: 一种具有辐射透射性衬底(1)的辐射发射半导体部件,其底部布置有辐射产生层(2),其中衬底(1)具有倾斜的侧面区域(3),其中 衬底(1)的折射率大于辐射产生层的折射率,其中折射率差导致未发射的衬底区域(4),其中没有光子直接从辐射产生层 层,并且其中衬底(1)在未发光区域中具有基本上垂直的侧面区域(5)。 该组件的优点是可以从晶片获得更好的面积产率。