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公开(公告)号：US20150364685A1
公开(公告)日：2015-12-17
申请号：US13985194
申请日：2012-02-24
申请人： John DeFranco , Mike Miller , Fox Holt
发明人： John DeFranco , Mike Miller , Fox Holt
CPC分类号： H01L51/0018 , G03F7/0046 , G03F7/095 , G03F7/11 , G03F7/203 , G03F7/405 , H01L23/50 , H01L51/0016 , H01L51/0017 , H01L51/0541 , H01L51/0545 , H01L51/0558 , H01L51/102 , H01L51/5012 , H01L51/5206 , H01L51/5221 , H01L51/56 , H01L2924/0002 , H01L2924/00
摘要： A method for forming a device includes providing a substrate; depositing a single fluorinated photo-patternable layer over the substrate; forming a first and a second active layer over the substrate; and applying the photo-patternable layer to form a first pattern within the first active layer and a second, different pattern within the second active layer. Particular examples disclosed in the present disclosure can be employed to form thin film electronics devices, including OLED devices and TFTs with a reduced number of photolithographic steps.
摘要翻译： 一种形成器件的方法包括：提供衬底; 在衬底上沉积单个氟化光可图案层; 在所述衬底上形成第一和第二有源层; 以及施加所述光可图案层以在所述第一有源层内形成第一图案，以及在所述第二有源层内形成第二不同图案。 本公开中公开的具体实例可用于形成薄膜电子器件，包括具有减少数量的光刻步骤的OLED器件和TFT。
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2.发明申请ORTHOGONAL SOLVENTS AND COMPATIBLE PHOTORESISTS FOR THE PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES 审中-公开有机电子设备的光刻胶图案的正交溶剂和兼容光电公开(公告)号：US20140127625A1
公开(公告)日：2014-05-08
申请号：US14113408
申请日：2012-04-24
IPC分类号： G03F7/038
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/09
摘要： The present invention provides improved solvents and photoresists for the photolithographic patterning of organic electronic devices, systems comprising combinations of these solvents and photoresists, and methods for using these systems of solvents and photoresists to pattern various organic electronic materials.
摘要翻译： 本发明提供用于有机电子器件的光刻图案的改进的溶剂和光致抗蚀剂，包括这些溶剂和光致抗蚀剂的组合的系统，以及使用这些溶剂和光致抗蚀剂系统来模拟各种有机电子材料的方法。
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公开(公告)号：US09274905B1
公开(公告)日：2016-03-01
申请号：US12688547
申请日：2010-01-15
CPC分类号： G06F11/2023 , G06F1/32 , G06F1/3287 , G06F1/329 , G06F11/2025 , G06F11/2028 , G06F11/2046 , G06F11/2289 , Y02D10/171 , Y02D10/24
摘要： A computer system has a managing server for managing one or more managed nodes. The managed nodes have media encoded with test executables executable on their respective nodes. The test executables can check configuration data for the node and/or check whether external resources are accessible from the node. The managing server issues commands to run the test executables and collects test results returned by the test executables.
摘要翻译： 计算机系统具有用于管理一个或多个受管节点的管理服务器。 受管节点具有可在其各自节点上执行的测试可执行文件编码的媒体。 测试执行程序可以检查节点的配置数据和/或检查外部资源是否可从节点访问。 管理服务器发出命令来运行测试可执行文件并收集测试可执行文件返回的测试结果。
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公开(公告)号：US20130236999A1
公开(公告)日：2013-09-12
申请号：US13638062
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
IPC分类号： H01L51/56
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/325 , H01L27/3206 , H01L27/3211 , H01L27/3281 , H01L51/0018 , H01L51/504 , H01L51/56 , H05B33/10
摘要： A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.
摘要翻译： 提供了一种用于形成多色OLED器件的方法，其包括提供衬底，用氟化光致抗蚀剂溶液涂覆衬底以形成第一可光刻图层并使其暴露以产生暴露的氟化光致抗蚀剂材料的第一图案，并且第二 未曝光的氟化光致抗蚀剂材料的图案，用氟化溶剂显影光图案层以除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，将第一有机发光材料沉积在衬底上 形成用于发射第一颜色的光的第一有机发光层，并施加暴露的氟化光致抗蚀剂材料的第一图案以控制去除第一有机发光层的一部分。 然后将第二氟化光致抗蚀剂溶液涂覆在第一光刻的有机发光层上并暴露以形成具有不同于第一图案的图案和未曝光的氟化光致抗蚀剂材料的第四图案的暴露的氟化光致抗蚀剂材料的第三图案， 在氟化溶剂中的光图案化层，以去除未曝光的氟化光致抗蚀剂材料的第四图案，而不去除暴露的氟化光致抗蚀剂材料的第三图案，沉积至少第二发光材料以形成第二发光层，用于发射第二 与第一颜色的光不同的光的颜色，并施加暴露的氟化光致抗蚀剂材料的第三图案，以控制第二有机发光层的一部分的去除。
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公开(公告)号：US20140322850A1
公开(公告)日：2014-10-30
申请号：US13638049
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
CPC分类号： H01L51/0002 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/325 , G03F7/40 , H01L51/0018 , H01L51/0023 , H01L51/56 , Y02E10/549
摘要： The present invention provides a method for forming an organic device having a patterned conductive layer that includes providing a substrate, depositing organic materials over the substrate to form one or more organic layers, coating a photoresist solution over the one or more organic layers to form a photo-patternable layer, wherein the solution includes a fluorinated photoresist material and a first fluorinated solvent, selectively exposing portions of the photo-patternable layer to radiation to form a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, exposing the substrate to a second fluorinated solvent to develop the photo-patternable layer, removing the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, coating one or more conductive layers over the one or more organic layers and removing a portion of the one or more of the conductive layers to form a pattern. Particular embodiments of the present invention for forming arrays of top contact TFTs and a pixilated organic device are also provided.
摘要翻译： 本发明提供一种用于形成具有图案化导电层的有机器件的方法，其包括提供衬底，在衬底上沉积有机材料以形成一个或多个有机层，在一个或多个有机层上涂覆光致抗蚀剂溶液以形成 光刻图层，其中所述溶液包括氟化光致抗蚀剂材料和第一氟化溶剂，选择性地将可光可图层的部分暴露于辐射以形成暴露的氟化光致抗蚀剂材料的第一图案和未曝光的氟化光致抗蚀剂材料的第二图案， 将衬底暴露于第二氟化溶剂以显影光可图案层，除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，在一个或多个有机层上涂覆一个或多个导电层，以及 删除一部分或一部分 e的导电层以形成图案。 还提供了用于形成顶部接触TFT阵列和像素化有机器件的本发明的特定实施例。
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公开(公告)号：US08871545B2
公开(公告)日：2014-10-28
申请号：US13638062
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John DeFranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John DeFranco
IPC分类号： H01L21/00 , H01L51/40 , G03F7/004 , H01L51/56 , H01L51/00 , G03F7/32 , H05B33/10 , H01L27/32
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/325 , H01L27/3206 , H01L27/3211 , H01L27/3281 , H01L51/0018 , H01L51/504 , H01L51/56 , H05B33/10
摘要： A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.
摘要翻译： 提供了一种用于形成多色OLED器件的方法，其包括提供衬底，用氟化光致抗蚀剂溶液涂覆衬底以形成第一可光刻图层并使其暴露以产生暴露的氟化光致抗蚀剂材料的第一图案，并且第二 未曝光的氟化光致抗蚀剂材料的图案，用氟化溶剂显影光图案层以除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，将第一有机发光材料沉积在衬底上 形成用于发射第一颜色的光的第一有机发光层，并施加暴露的氟化光致抗蚀剂材料的第一图案以控制去除第一有机发光层的一部分。 然后将第二氟化光致抗蚀剂溶液涂覆在第一光刻的有机发光层上并暴露以形成具有不同于第一图案的图案和未曝光的氟化光致抗蚀剂材料的第四图案的暴露的氟化光致抗蚀剂材料的第三图案， 在氟化溶剂中的光图案化层，以去除未曝光的氟化光致抗蚀剂材料的第四图案，而不去除暴露的氟化光致抗蚀剂材料的第三图案，沉积至少第二发光材料以形成第二发光层，用于发射第二 与第一颜色的光不同的光的颜色，并施加暴露的氟化光致抗蚀剂材料的第三图案，以控制第二有机发光层的一部分的去除。
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