摘要:
A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height.
摘要:
A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output.
摘要:
A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要:
A write error verification method of a writing apparatus verifying a write error after a write operation being started in the writing apparatus to which layout data containing a figure pattern to be formed is input and which forms the figure pattern on a target object based on the layout data input, the write error verification method includes: if a write error occurs in a process between input of the layout data into the writing apparatus and inspection of the target object on which the figure pattern is formed, selecting a part of the layout data necessary for operation of a function that has caused the write error; extracting parts of the layout data corresponding to a selected part of the layout data for all of a plurality of portions of the target object if a pattern indicated by the selected part of the layout data is arranged at the plurality of portions of the target object; creating verification data by deleting at least one parts extracted for at least one portions other than a portion that has caused the write error from extracted parts of the layout data and by using remaining data; and reproducing the operation of the function that has caused the write error using the verification data to output a result of the reproducing.
摘要:
A generation apparatus of writing error verification data for a pattern writing apparatus includes a data extraction part configured to extract, from layout data including a figure pattern to be written, part of the layout data required for an operation of a function having a writing error occurred after starting writing by the pattern writing apparatus which performs writing on a target workpiece based on the layout data, and a verification data generation part configured to perform a merge process based on extracted part of the layout data, and to generate writing error verification data, for which the merge process has been performed, for verifying the writing error of the pattern writing apparatus.
摘要:
A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, generating a partial pattern which can be deflected in a self region in the ranging pattern for each of the plurality of deflection regions on the basis of the input layout data, and converting layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data to output the charged particle beam pattern writing data.
摘要:
A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated.
摘要:
A write error verification method of a writing apparatus verifying a write error after a write operation being started in the writing apparatus to which layout data containing a figure pattern to be formed is input and which forms the figure pattern on a target object based on the layout data input, the write error verification method includes: if a write error occurs in a process between input of the layout data into the writing apparatus and inspection of the target object on which the figure pattern is formed, selecting a part of the layout data necessary for operation of a function that has caused the write error; extracting parts of the layout data corresponding to a selected part of the layout data for all of a plurality of portions of the target object if a pattern indicated by the selected part of the layout data is arranged at the plurality of portions of the target object; creating verification data by deleting at least one parts extracted for at least one portions other than a portion that has caused the write error from extracted parts of the layout data and by using remaining data; and reproducing the operation of the function that has caused the write error using the verification data to output a result of the reproducing.
摘要:
A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a charged particle beam on a pattern forming region of a target object; a position correction unit configured to calculate, using the charge amount distribution charged, a corrected position of each pattern forming position corrected for a misregistration amount including a misregistration amount dependent on a deflection position where the charged particle beam is deflected, the misregistration amount caused by an amount of charge; and a pattern generator configured to form a pattern in the corrected position by using the charged particle beam.
摘要:
A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.