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11 条记录 (耗时 0.013 秒)

    MOLD AND PROCESS FOR PRODUCTION OF MOLD
    2.
    发明申请
    MOLD AND PROCESS FOR PRODUCTION OF MOLD 有权
    模具和生产模具的过程

    公开(公告)号：US20130094089A1

    公开(公告)日：2013-04-18

    申请号：US13643632

    申请日：2011-04-01

    申请人： Akinobu Isurugi ,  Kiyoshi Minoura ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    发明人： Akinobu Isurugi ,  Kiyoshi Minoura ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    IPC分类号： G02B1/11 ,  C23F1/04

    CPC分类号： G02B1/11 ,  B29C33/424 ,  B29C33/56 ,  B29D11/0048 ,  B29D11/00865 ,  C23F1/04 ,  C25D11/10 ,  C25D11/12 ,  C25D11/24 ,  G02B1/118

    摘要： A mold manufacturing method of an embodiment of the present invention includes the steps of: (a) providing a mold base; (b) partially anodizing the aluminum layer to form a porous alumina layer, the porous alumina layer having a porous layer which defines a plurality of minute recessed portions and a barrier layer which is provided at a bottom of each of the plurality of minute recessed portions; and (c) after step (b), performing etching, thereby enlarging the plurality of minute recessed portions of the porous alumina layer, wherein in step (c) the etching is performed such that an average depth of the plurality of minute recessed portions increases but does not exceed a 1/7 of an average thickness of the barrier layer before the etching.

    摘要翻译： 本发明实施例的模具制造方法包括以下步骤：（a）提供模具底座; （b）部分阳极氧化铝层以形成多孔氧化铝层，所述多孔氧化铝层具有限定多个微小凹部的多孔层和设置在所述多个微小凹部中的每一个的底部的阻挡层 ; 和（c）在步骤（b）之后进行蚀刻，从而扩大多孔氧化铝层的多个微小凹陷部分，其中在步骤（c）中进行蚀刻，使得多个微小凹陷部分的平均深度增加 但不超过蚀刻前的阻挡层的平均厚度的1/7。

    Die, process for producing die, and process for producing antireflection film
    4.
    发明授权
    Die, process for producing die, and process for producing antireflection film 有权
    模具，制造模具的工艺和制造抗反射膜的工艺

    公开(公告)号：US09556532B2

    公开(公告)日：2017-01-31

    申请号：US13582033

    申请日：2011-03-22

    申请人： Kiyoshi Minoura ,  Akinobu Isurugi ,  Ichirou Ihara ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    发明人： Kiyoshi Minoura ,  Akinobu Isurugi ,  Ichirou Ihara ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    IPC分类号： C25D11/12 ,  C25D11/24 ,  G02B1/118 ,  C25D11/04 ,  B29C59/04 ,  B29C35/08

    CPC分类号： G02B1/118 ,  B29C59/046 ,  B29C2035/0827 ,  C25D11/04 ,  C25D11/045 ,  C25D11/12 ,  C25D11/24

    摘要： A method is provided for manufacturing a mold that has a porous alumina layer over its surface, which is capable of preventing formation of pits (recesses). A moth-eye mold manufacturing method of an embodiment of the present invention is a method for manufacturing a mold which has a porous alumina layer over its surface, including the steps of: providing a mold base which includes an aluminum base and an aluminum film deposited on a surface of the aluminum base, the aluminum film having a purity of not less than 99.99 mass %; anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; and bringing the porous alumina layer into contact with an etching solution to enlarge the plurality of minute recessed portions of the porous alumina layer.

    摘要翻译： 提供了一种用于制造在其表面上具有多孔氧化铝层的模具的方法，其能够防止形成凹坑（凹部）。 本发明的实施例的蛾眼模具的制造方法是在其表面上具有多孔氧化铝层的模具的制造方法，包括以下步骤：提供包括铝基底和铝膜沉积的模具基底 在铝基材的表面上，铝膜的纯度不低于99.99质量％; 阳极氧化铝膜的表面以形成具有多个微小凹陷部分的多孔氧化铝层; 并且使多孔氧化铝层与蚀刻溶液接触，以使多孔氧化铝层的多个微小凹陷部分扩大。

    MOLD, METHOD FOR PRODUCING MOLD, AND METHOD FOR PRODUCING NANOIMPRINT FILM
    5.
    发明申请
    MOLD, METHOD FOR PRODUCING MOLD, AND METHOD FOR PRODUCING NANOIMPRINT FILM 审中-公开
    模具，生产模具的方法以及制造纳米薄膜的方法

    公开(公告)号：US20130341823A1

    公开(公告)日：2013-12-26

    申请号：US14004190

    申请日：2012-03-01

    申请人： Kenichiro Nakamatsu ,  Hidekazu Hayashi ,  Kiyoshi Minoura ,  Akinobu Isurugi

    发明人： Kenichiro Nakamatsu ,  Hidekazu Hayashi ,  Kiyoshi Minoura ,  Akinobu Isurugi

    IPC分类号： B29C59/02

    CPC分类号： B29C59/026 ,  B29C33/3842 ,  B29C33/424 ,  B29C59/04 ,  B29C2059/023 ,  B82Y30/00 ,  B82Y40/00

    摘要： A mold is disclosed, which is capable of producing a nanoimprint film without a problem of clogging of irregularities of the mold with a resin material. A method for producing the mold and a method for producing a nanoimprint film using the mold are further disclosed. In an embodiment, the mold includes: a first surface having a nanostructure including plural recesses spaced at an interval of less than 1 μm between bottom points of adjacent recesses; and at least two second surfaces substantially not having the nanostructure, wherein the first surface is coplanar with the at least two second surfaces and is positioned between two second surfaces.

    摘要翻译： 公开了一种能够制造纳米压印膜的模具，而没有使用树脂材料堵塞模具的不规则性的问题。 还公开了一种用于制造模具的方法和使用该模具制造纳米压印膜的方法。 在一个实施例中，模具包括：具有纳米结构的第一表面，该纳米结构包括在相邻凹槽的底点之间以小于1um的间隔隔开的多个凹槽; 以及基本上不具有纳米结构的至少两个第二表面，其中所述第一表面与所述至少两个第二表面共面并且位于两个第二表面之间。

    METHOD FOR FORMING ANODIZED LAYER AND MOLD PRODUCTION METHOD
    6.
    发明申请
    METHOD FOR FORMING ANODIZED LAYER AND MOLD PRODUCTION METHOD 有权
    用于形成抗静电层和模具生产方法

    公开(公告)号：US20130153537A1

    公开(公告)日：2013-06-20

    申请号：US13819547

    申请日：2011-08-22

    申请人： Akinobu Isurugi ,  Kiyoshi Minoura ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    发明人： Akinobu Isurugi ,  Kiyoshi Minoura ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    IPC分类号： C25F3/02

    CPC分类号： C25F3/02 ,  B29C33/424 ,  B29C33/56 ,  C25D11/024 ,  C25D11/12 ,  C25D11/24

    摘要： An anodized layer formation method includes: providing an aluminum film provided on a support or an aluminum base; and forming a porous alumina layer which has minute recessed portions by applying a voltage between an anode which is electrically coupled to a surface of the aluminum film or the aluminum base and a cathode which is provided in an electrolytic solution with the surface of the aluminum film or the aluminum base being in contact with the electrolytic solution. The forming of the porous alumina layer includes increasing the voltage to a target value and, before the voltage is increased to the target value, increasing the voltage to a first peak value which is lower than the target value and thereafter decreasing the voltage to a value which is lower than the first peak value. As such, an anodized layer with reduced variation of recessed portions can be formed.

    摘要翻译： 阳极氧化层形成方法包括：提供设置在支撑体或铝基底上的铝膜; 以及通过在与铝膜或铝基底的表面电耦合的阳极和在铝电解液的表面上设置在电解液中的阴极之间施加电压而形成具有微小凹陷部分的多孔氧化铝层 或铝基与电解液接触。 多孔氧化铝层的形成包括将电压增加到目标值，并且在电压增加到目标值之前，将电压增加到低于目标值的第一峰值，然后将电压降低到值 其低于第一峰值。 因此，可以形成具有减小的凹部的变化的阳极氧化层。

    DIE, PROCESS FOR PRODUCING DIE, AND PROCESS FOR PRODUCING ANTIREFLECTION FILM
    8.
    发明申请
    DIE, PROCESS FOR PRODUCING DIE, AND PROCESS FOR PRODUCING ANTIREFLECTION FILM 有权
    DIE，生产DIE的方法，以及生产抗反射膜的方法

    公开(公告)号：US20120318772A1

    公开(公告)日：2012-12-20

    申请号：US13582033

    申请日：2011-03-22

    申请人： Kiyoshi Minoura ,  Akinobu Isurugi ,  Ichirou Ihara ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    发明人： Kiyoshi Minoura ,  Akinobu Isurugi ,  Ichirou Ihara ,  Hidekazu Hayashi ,  Kenichiro Nakamatsu

    IPC分类号： B44C1/22 ,  B29C35/08

    CPC分类号： G02B1/118 ,  B29C59/046 ,  B29C2035/0827 ,  C25D11/04 ,  C25D11/045 ,  C25D11/12 ,  C25D11/24

    摘要： A method is provided for manufacturing a mold that has a porous alumina layer over its surface, which is capable of preventing formation of pits (recesses). A moth-eye mold manufacturing method of an embodiment of the present invention is a method for manufacturing a mold which has a porous alumina layer over its surface, including the steps of: providing a mold base which includes an aluminum base and an aluminum film deposited on a surface of the aluminum base, the aluminum film having a purity of not less than 99.99 mass %; anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; and bringing the porous alumina layer into contact with an etching solution to enlarge the plurality of minute recessed portions of the porous alumina layer.

    摘要翻译： 提供了一种用于制造在其表面上具有多孔氧化铝层的模具的方法，其能够防止形成凹坑（凹部）。 本发明的实施例的蛾眼模具的制造方法是在其表面上具有多孔氧化铝层的模具的制造方法，包括以下步骤：提供包括铝基底和铝膜沉积的模具基底 在铝基材的表面上，铝膜的纯度不低于99.99质量％; 阳极氧化铝膜的表面以形成具有多个微小凹陷部分的多孔氧化铝层; 并且使多孔氧化铝层与蚀刻溶液接触，以使多孔氧化铝层的多个微小凹陷部分扩大。

    METHOD FOR MANUFACTURING MICROELECTRODE AND MICROELECTRODE MANUFACTURED BY THE SAME
    9.
    发明申请
    METHOD FOR MANUFACTURING MICROELECTRODE AND MICROELECTRODE MANUFACTURED BY THE SAME 审中-公开
    制造微电子的方法及其制造的微电子

    公开(公告)号：US20070169881A1

    公开(公告)日：2007-07-26

    申请号：US11692350

    申请日：2007-03-28

    申请人： Takuya MATSUMOTO ,  Sinji Matsui ,  Kenichiro Nakamatsu ,  Kaoru Ojima ,  Tomoji Kawai

    发明人： Takuya MATSUMOTO ,  Sinji Matsui ,  Kenichiro Nakamatsu ,  Kaoru Ojima ,  Tomoji Kawai

    IPC分类号： B32B37/00

    CPC分类号： H01L51/0022 ,  B82Y30/00

    摘要： A method for manufacturing a microelectrode includes one of allocating organic molecules or forming an organic molecular layer on a first substrate, applying a release agent onto a desired pattern formed on a second substrate, attaching an electrode material to the release agent, and bonding a surface of the second substrate to which the electrode material is attached and a surface of the first substrate on which the organic molecules are allocated or the organic molecular layer is formed to transfer the electrode material to the first substrate.

    摘要翻译： 微电极的制造方法包括在第一基板上分配有机分子或形成有机分子层之一，将剥离剂施加到形成在第二基板上的期望图案上，将电极材料附着到剥离剂上， 的电极材料所附着的第二基板和其上分配有机分子的第一基板的表面或形成有机分子层以将电极材料转移到第一基板。