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公开(公告)号：US5360974A
公开(公告)日：1994-11-01
申请号：US963886
申请日：1992-10-20
IPC分类号： G01B7/34 , B23Q1/34 , B23Q1/36 , B23Q1/56 , G01B5/00 , G01N37/00 , G01Q10/04 , G01Q70/04 , G21K5/10
CPC分类号： G01Q10/04 , B23Q1/36 , B82Y35/00 , G01B5/0002 , G01Q70/04
摘要： A dual quad flexure carriage and assembly, for receiving a sensing probe, is used for scanning the sensing probe across a target surface. The flexure carriage is a unitary structure providing flat motion for the sensing probe during the scanning procedure, while further compensating for thermal creep. The dual quad flexure assembly comprises the dual quad flexure carriage along with piezo actuators and control systems to provide highly linear orthogonal motion.
摘要翻译： 用于接收感测探头的双四重弯曲滑架和组件用于在目标表面上扫描感测探头。 挠性托架是在扫描过程中为感测探头提供平坦运动的单一结构，同时进一步补偿热蠕变。 双四重弯曲组件包括双四重弯曲滑架以及压电致动器和控制系统，以提供高度线性的正交运动。
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公开(公告)号：US08182609B1
公开(公告)日：2012-05-22
申请号：US12188564
申请日：2008-08-08
IPC分类号： B08B7/00
CPC分类号： B08B7/0042 , G03F1/62 , G03F1/82 , H01L21/67028 , Y10S134/902
摘要： The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a thermal increase in the particle and removing the particle from the substrate by thermal decomposition. The laser has a wavelength that substantially coincides with a high absorption coefficient of the particle.
摘要翻译： 本发明提供了一种清洁基板表面的方法，其包括将激光朝向设置在基板上的至少一个辐射产生的颗粒引导，产生颗粒的热量增加并通过热分解从基板移除颗粒。 激光器具有与颗粒的高吸收系数基本一致的波长。
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公开(公告)号：US5635848A
公开(公告)日：1997-06-03
申请号：US402417
申请日：1995-03-10
申请人： James M. Hammond , James C. Mahlbacher , Kenneth G. Roessler , Michael Servedio , Li-Cheng R. Zai
发明人： James M. Hammond , James C. Mahlbacher , Kenneth G. Roessler , Michael Servedio , Li-Cheng R. Zai
CPC分类号： G01R1/06705
摘要： A digital and analog controller for controlling a high-speed probe actuator is disclosed. This method and system provide the probe actuator system with improved damping ratio and reduced impact force, so the throughput of the tester is increased with fast settling actuator armature. With this method and system, the steady-state probe force is less sensitive to the servo system, test probe and variation in the probing distance d. An electronic circuit, which consists of analog operational amplifiers, monostable multivibrators, and D flip-flops, is presented for low-cost applications.
摘要翻译： 公开了一种用于控制高速探头致动器的数字和模拟控制器。 该方法和系统为探头致动器系统提供了改进的阻尼比和减小的冲击力，因此测试仪的生产量随着快速沉降执行器电枢而增加。 利用这种方法和系统，稳态探头力对伺服系统，测试探头和探测距离d的变化敏感度较低。 一个电子电路由模拟运算放大器，单稳态多谐振荡器和D触发器组成，用于低成本应用。
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4.发明授权
公开(公告)号：US5262643A
公开(公告)日：1993-11-16
申请号：US897646
申请日：1992-06-12
IPC分类号： G01B21/30 , G01N37/00 , G01Q10/02 , G01Q10/04 , G01Q30/18 , G01Q70/18 , G05D3/12 , H01V37/28
CPC分类号： G01Q10/02 , B82Y35/00 , Y10S977/851
摘要： A non-contact, step-wise method for automatically positioning a sensing probe, having a vibrating cantilever and tip, above a target surface utilizing acoustic and Van der Waals interactions respectively during an approach method. The sensing probe is lowered to a substantially optimized tip to target surface distance. The system utilizes the interaction of forces between the vibrating cantilever and target surface to automatically position the sensing probe above the target surface.
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公开(公告)号：US20120231397A1
公开(公告)日：2012-09-13
申请号：US13475997
申请日：2012-05-20
IPC分类号： G03F7/20
CPC分类号： B08B7/0042 , G03F1/62 , G03F1/82 , H01L21/67028 , Y10S134/902
摘要： A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.
摘要翻译： 提供了从薄膜光掩模表面去除雾霾形成的晶片制造工艺。 晶片制造工艺包括预打印晶片处理，使用至少一个具有防护薄膜的光掩模，光掩模清洁处理，使用光掩模的晶片印刷处理和印后晶片处理的晶片印刷处理。 光掩模清洁处理步骤包括将激光穿过防护薄膜，朝向设置在光掩模上的无机颗粒，以通过热分解从光掩模中除去颗粒。
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公开(公告)号：US5260577A
公开(公告)日：1993-11-09
申请号：US973796
申请日：1992-11-09
申请人： David W. Abraham , James M. Hammond , Martin A. Klos , Kenneth G. Roessler , Robert M. Stowell , Hemantha K. Wickramasinghe
发明人： David W. Abraham , James M. Hammond , Martin A. Klos , Kenneth G. Roessler , Robert M. Stowell , Hemantha K. Wickramasinghe
CPC分类号： H01J37/20 , G01Q70/04 , Y10S977/872
摘要： A sample carriage, for receiving a sample to be scanned and positionable in a scanning probe microscope, is used for physically decoupling the sample from the scanning probe microscope assembly. The sample carriage, constructed from low thermal coefficient material, is physically decoupled by releasably clamping a sample carriage to a bridge support.
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公开(公告)号：US08562749B2
公开(公告)日：2013-10-22
申请号：US13475997
申请日：2012-05-20
IPC分类号： B08B7/00
CPC分类号： B08B7/0042 , G03F1/62 , G03F1/82 , H01L21/67028 , Y10S134/902
摘要： A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.
摘要翻译： 提供了从薄膜光掩模表面去除雾霾形成的晶片制造工艺。 晶片制造工艺包括预打印晶片处理，使用至少一个具有防护薄膜的光掩模，光掩模清洁处理，使用光掩模的晶片印刷处理和印后晶片处理的晶片印刷处理。 光掩模清洁处理步骤包括将激光穿过防护薄膜，朝向设置在光掩模上的无机颗粒，以通过热分解从光掩模中除去颗粒。
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公开(公告)号：US08293019B2
公开(公告)日：2012-10-23
申请号：US12277106
申请日：2008-11-24
IPC分类号： B08B7/00
CPC分类号： B08B7/0042 , G03F1/82 , Y10S134/902
摘要： Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.
摘要翻译： 提供了清洁基板的表面和增加光掩模基板的使用寿命的方法。 在一种方法中，衬底具有设置在其上的至少一个辐射产生颗粒，并且具有基本上与衬底的高吸收系数一致的波长的激光器被引向衬底。 在衬底中产生热增加，并且通过将热能从衬底转移到辐射产生的颗粒直到辐射产生的颗粒分解，从衬底去除辐射产生的颗粒。
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9.发明授权Method for improving measurement accuracy using active lateral scanning control of a probe 失效使用探头的主动横向扫描控制来提高测量精度的方法
公开(公告)号：US5773824A
公开(公告)日：1998-06-30
申请号：US841538
申请日：1997-04-23
CPC分类号： G01Q10/065 , Y10S977/851
摘要： A scanning probe microscope includes probe moved into and out of engagement with a sample surface by a combination of deflections occurring within a fast actuator, having a relatively small range of motion, and a slow actuator, having a relatively large range of motion. When the deflection of the fast actuator is moved outside a predetermined range, in which such deflection is a linear function of applied voltage, the slow actuator is operated so that subsequent operation of the fast actuator can return the fast actuator to its predetermined range, Furthermore, when it is necessary to operate the slow actuator in this way, a scanning motion moving the sample surface past the probe is stopped until the probe is brought into a correct level of engagement with the sample surface, with the fast actuator deflected within the predetermined range.
摘要翻译： 扫描探针显微镜包括通过在具有相对较小的运动范围的快速致动器内发生的偏转的组合以及具有相对较大的运动范围的慢速致动器的组合而移动进入和离开与样品表面接合的探针。 当快速致动器的偏转移动到预定范围之外，其中这种偏转是施加电压的线性函数时，慢速致动器被操作，使得快速致动器的后续操作可使快速致动器返回到其预定范围。 当需要以这种方式操作慢速致动器时，停止将样品表面移动通过探针的扫描运动，直到探针与样品表面达到正确的接合水平，而快速致动器在预定的范围内偏转 范围。
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