Corona preionization electrode unit for use in gas laser apparatus
    1.
    发明授权
    Corona preionization electrode unit for use in gas laser apparatus 有权
    用于气体激光装置的电晕前置电极单元

    公开(公告)号:US06654402B1

    公开(公告)日:2003-11-25

    申请号:US09626417

    申请日:2000-07-26

    IPC分类号: H01S3097

    摘要: A corona preionization electrode unit for use in gas laser apparatus, wherein the electric field for corona discharge is concentrated, and ultraviolet radiation is not blocked, and further the laser gas stream is not obstructed, thereby allowing efficient, stable and uniform corona preionization. The corona preionization electrode unit is disposed in a gas laser apparatus together with a pair of main discharge electrodes for ionizing and exciting a laser gas. The corona preionization electrode unit includes a first electrode covered with a dielectric material and a second electrode placed in contact with the outer surface of the dielectric material around the first electrode. The corona preionization electrode unit is positioned in the vicinity of either one of the main discharge electrodes. The second electrode is a plate-shaped member having a straight edge contacting at least the outer surface of the dielectric material. A portion of the plate-shaped member other than the edge is provided with a plurality of openings for passage of ultraviolet light for preionization and a circulating laser gas.

    摘要翻译: 一种用于气体激光装置的电晕前置电极单元,其中用于电晕放电的电场集中,并且紫外线辐射不被阻挡,并且进一步激光气流不被阻挡,由此允许有效,稳定和均匀的电晕预电离。 电晕前置电极单元与一对用于电离和激发激光气体的主放电电极一起设置在气体激光装置中。 电晕前置电极单元包括覆盖有介电材料的第一电极和与第一电极周围的电介质材料的外表面接触的第二电极。 电晕前置电极单元位于任一个主放电电极附近。 第二电极是具有与电介质材料的至少外表面接触的直边缘的板状构件。 除了边缘之外的板状构件的一部分设置有多个用于前体的紫外线通过的开口和循环的激光气体。

    Narrow-spectrum laser device
    2.
    发明授权
    Narrow-spectrum laser device 有权
    窄谱激光装置

    公开(公告)号:US07903700B2

    公开(公告)日:2011-03-08

    申请号:US11631463

    申请日:2005-07-07

    IPC分类号: H01S3/10 H01S3/22

    摘要: A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

    摘要翻译: 通过光谱纯度范围测量装置测量从放大激光器件(300)输出的激光束的光谱纯度范围(E95)。 为了使测得的光谱纯度范围(E95)在目标光谱纯度范围(E950)的允许范围E950±dE95内,从通过振荡激光装置(100)开始放电的时间到放电为止的放电时间 由放大激光装置(300)开始的光谱纯度范围(E95)被控制为稳定。

    ArF excimer laser devices, KrF excimer laser devices and fluorine alser devices
    3.
    发明授权
    ArF excimer laser devices, KrF excimer laser devices and fluorine alser devices 有权
    ArF准分子激光装置,KrF准分子激光装置和氟等离子体装置

    公开(公告)号:US06754247B2

    公开(公告)日:2004-06-22

    申请号:US09803983

    申请日:2001-03-13

    IPC分类号: H01S322

    CPC分类号: H01S3/225

    摘要: To provide an ArF excimer laser device capable of a pulsewidth FWHM of 20 ns or more, a pulse duration time of 50 ns or more, and a spectrum line width FWHM of 0.35 pm or less, and to provide a KrF excimer laser device and a fluorine laser device with stretched pulse widths. The ArF excimer laser device connects to the output terminal of a magnetic pulse compression circuit and has a pair of laser discharge electrodes located within the laser chamber and a peaking capacitor connected in parallel with the pair of laser discharge electrodes. The output waveform of the laser pulse has a bifurcated form with a front half peak and a later half peak and, if the peak value of the front half peak is P1 and the peak value of the later half peak is P2 and the (proportion of the pulse later half peak)=P2/(P1+P2)×100(%), then the (proportion of the pulse later half peak) is 50% or more.

    摘要翻译: 为了提供能够具有20ns以上的脉冲宽度FWHM,50ns以上的脉冲持续时间和0.35μm以下的谱线宽度FWHM的ArF准分子激光装置,并且提供KrF准分子激光装置和 氟激光器件具有拉伸的脉冲宽度。 ArF准分子激光装置连接到磁脉冲压缩电路的输出端,并且具有位于激光室内的一对激光放电电极和与该对激光放电电极并联连接的峰值电容器。 激光脉冲的输出波形具有前半峰和后半峰的分叉形式,如果前半峰的峰值为P1,后半峰的峰值为P2,则(( 脉冲后半峰)= P2 /(P1 + P2)×100(%),则(脉冲后半峰的比例)为50%以上。

    ArF excimer laser device and a fluoride laser device
    4.
    发明授权
    ArF excimer laser device and a fluoride laser device 有权
    ArF准分子激光装置和氟化物激光装置

    公开(公告)号:US06643312B2

    公开(公告)日:2003-11-04

    申请号:US09741079

    申请日:2000-12-21

    IPC分类号: H01S322

    CPC分类号: H01S3/097

    摘要: An ArF excimer laser device and a fluoride laser device for exposure which is structured so that primary current that infuses energy from a magnetic pulse compression circuit to discharge electrodes via a peaking capacitor overlaps secondary current that infuses energy from the capacitor in the final stage of the magnetic pulse compression circuit to the discharge electrodes, the oscillation cycle of the secondary current is set longer than the oscillation cycle of the primary current, and a pulse of laser oscillation operation is effected by the initial half-cycle of the discharge oscillation current waveform that reverses the polarity of the primary current being overlapped by the secondary current and by at least two half-cycles continuing thereafter, as a result of which a high repetition rate, pulse stretch, line-narrowed ArF excimer laser device and fluorine laser device can be implemented at repetition rate exceeding 2 kHz.

    摘要翻译: 一种ArF准分子激光装置和用于曝光的氟化物激光装置,其被构造成使得从磁脉冲压缩电路输入能量的初级电流经由峰值电容器放电电极与从电容器的最终阶段输入能量的次级电流重叠 磁脉冲压缩电路到放电电极,次级电流的振荡周期设定得比初级电流的振荡周期长,激光振荡动作的脉冲由放电振荡电流波形的初始半周期来实现, 使二次电流重叠的一次电流的极性反转,此后继续至少两个半周期,其结果是高重复率,脉冲拉伸,线变窄的ArF准分子激光装置和氟激光装置可以是 以超过2 kHz的重复率实现。

    Gas laser device that emits ultraviolet rays
    5.
    发明授权
    Gas laser device that emits ultraviolet rays 有权
    发射紫外线的气体激光装置

    公开(公告)号:US06480519B2

    公开(公告)日:2002-11-12

    申请号:US09732017

    申请日:2000-12-08

    IPC分类号: H01S3097

    CPC分类号: H01S3/038 H01S3/0384

    摘要: To reduce the cross-sectional area of a discharge circuit loop in the excitation circuit of a gas laser device that discharges ultraviolet rays, thereby reducing the inductance and enhancing the laser oscillation efficiency, the gas laser device is provided with a laser chamber (1) in which laser gas is sealed and which has a circulation means that circulates the laser gas within the chamber, a pair of main discharge electrodes (3, 4) disposed at a prescribed separation within said laser chamber (1), a discharge circuit having peaking capacitors (C3) that are connected in parallel with the pair of main discharge electrodes (3, 4,) and a preionization unit (15) in which a first electrode (9) and a second electrode (7) are disposed facing each other with a dielectric (8) interposed between them, the preionization unit (15) being disposed running along each side of one of the main discharge electrodes (4), that one of the main discharge electrodes (4) and the peaking capacitors (C3) being connected via a conduction member (25) that passes between the one of the main discharge electrodes (4) and the preionization unit (15).

    摘要翻译: 为了减小放电紫外线的气体激光装置的激励电路中的放电电路回路的截面积,从而降低电感并提高激光振荡效率,气体激光装置设置有激光室(1) 其中激光气体被密封并且具有使腔室内的激光气体循环的循环装置,在所述激光室(1)内以规定间隔设置的一对主放电电极(3,4),具有峰值的放电电路 与所述一对主放电电极(3,4)并联连接的电容器(C3)和其中第一电极(9)和第二电极(7)彼此面对地配置的预电离单元(15) 介于它们之间的电介质(8),所述预电离单元(15)沿着所述主放电电极(4)中的一个的每一侧设置,所述主放电电极(4)和所述峰值电容器(C3)中的一个为 通过在主放电电极(4)和预电离单元(15)之间通过的导电构件(25)连接。

    Narrow-Spectrum Laser Device
    6.
    发明申请
    Narrow-Spectrum Laser Device 有权
    窄谱激光装置

    公开(公告)号:US20080285602A1

    公开(公告)日:2008-11-20

    申请号:US11631463

    申请日:2005-07-07

    IPC分类号: H01S3/10 H01S3/13

    摘要: A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

    摘要翻译: 通过光谱纯度范围测量装置测量从放大激光器件(300)输出的激光束的光谱纯度范围(E 95)。 为了使测量的光谱纯度范围(E 95)在目标光谱纯度范围(E 950)的允许范围E 950±dE 95内,从通过振荡激光装置(100)开始放电的时间到 由放大激光装置(300)开始放电的时间被控制,光谱纯度范围(E 95)被控制为稳定。

    ArF and KrF excimer laser apparatus and fluorine laser apparatus for lithography

    公开(公告)号:US06636546B2

    公开(公告)日:2003-10-21

    申请号:US09971090

    申请日:2001-10-03

    IPC分类号: H01S322

    摘要: The present invention relates to an ArF excimer laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 4 kHz and also relates to a KrF excimer laser apparatus and fluorine laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 2 kHz. In a laser apparatus for lithography having laser discharge electrodes disposed in a laser chamber and a peaking capacitor connected in parallel to the laser discharge electrodes, the period Tn of the waveform of an oscillating current flowing in a first circuit loop formed by the final-stage capacitor of a magnetic pulse compression circuit and the laser discharge electrode and the period Tp of the waveform of an oscillating current flowing in a second circuit loop formed by the peaking capacitor and the laser discharge electrodes satisfy the condition of 5Tp≦Tn, and the period Tn satisfies the condition of Tn

    Gas laser apparatus emitting ultraviolet radiation
    8.
    发明授权
    Gas laser apparatus emitting ultraviolet radiation 有权
    气体激光装置发射紫外线

    公开(公告)号:US06847670B1

    公开(公告)日:2005-01-25

    申请号:US09661481

    申请日:2000-09-14

    摘要: The oscillation pulse width is extended in a gas laser apparatus emitting ultraviolet radiation by a high-repetition rate oscillating operation. The gas laser apparatus has a pair of laser discharge electrodes connected to the output terminals of a magnetic pulse compression circuit and disposed in a laser chamber. The pulse width is extended by determining circuit constants so that the period of the oscillating current flowing between the discharge electrodes is shortened and, at the same time, the peak value of the current is increased, whereby the laser gas is continuously excited even during at least one half-cycle subsequent to the first half-cycle of the oscillating current to sustain the laser oscillating operation.

    摘要翻译: 振荡脉冲宽度在通过高重复率振荡操作发射紫外线的气体激光装置中延伸。 气体激光装置具有连接到磁脉冲压缩电路的输出端并设置在激光室中的一对激光放电电极。 通过确定电路常数来延长脉冲宽度,使得在放电电极之间流动的振荡电流的周期缩短,并且同时电流的峰值增加,由此激光气体即使在在 在振荡电流的第一半周期之后的至少一个半周期以维持激光振荡操作。

    ArF excimer laser device for exposure
    9.
    发明授权
    ArF excimer laser device for exposure 有权
    用于曝光的ArF准分子激光装置

    公开(公告)号:US06584131B1

    公开(公告)日:2003-06-24

    申请号:US09680325

    申请日:2000-10-06

    申请人: Koji Kakizaki

    发明人: Koji Kakizaki

    IPC分类号: H01S322

    CPC分类号: H01S3/225 H01S3/036

    摘要: An ArF excimer laser device for performing an oscillating operation with a repetition rate of more than 3 kHz and an oscillating laser pulse width (Tis) of more than 30 ns. The laser operation is carried out in an initial half-period of an electrical discharge oscillating current waveform of a pulse of reversed polarity generated by a high voltage pulse generating device and in at least two subsequent half-periods. The pressure of the laser gas in the laser chamber is 2.5 to 3.5 atm, the fluorine concentration is 0.12% or less, and the argon gas concentration 3% or less. As a result, the laser pulse width (Tis) can be set to more than 30 ns.

    摘要翻译: 一种ArF准分子激光装置,用于以3kHz以上的重复频率进行振荡动作,振荡激光脉冲宽度(Tis)大于30ns。 在由高电压脉冲发生装置产生的反极性脉冲的放电振荡电流波形的初始半周期和至少两个后续半周期中进行激光操作。 激光室中的激光气体的压力为2.5〜3.5atm,氟浓度为0.12%以下,氩气浓度为3%以下。 结果,激光脉冲宽度(Tis)可以设定为大于30ns。

    Pulse oscillating gas laser device
    10.
    发明授权

    公开(公告)号:US06639929B2

    公开(公告)日:2003-10-28

    申请号:US09987316

    申请日:2001-11-14

    IPC分类号: H01S322

    摘要: A pulse oscillating gas laser device, which can reduce an influence of a shock wave caused by primary discharge and perform stable laser oscillation is provided. To this end, the device is a pulse oscillating gas laser device for exciting a laser gas by causing primary discharge in a pulse form between a pair of discharge electrodes (14, 15) opposing each other and oscillating laser light, in which a rib portion (42) with insulating properties for preventing creeping discharge is provided on a cathode base (36) with insulating properties, to which the discharge electrode (15) at a high voltage side is fixed, and a damping material (45) for attenuating a shock wave (41) caused by the primary discharge is inserted in an inside of a groove portion (52) between a raised portion (43) of the rib portion (42) and the high-voltage side discharge electrode (15).