利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

38 条记录 (耗时 0.018 秒)

    Sticking method and sticking apparatus
    2.
    发明授权
    Sticking method and sticking apparatus 失效
    粘贴方法和粘贴装置

    公开(公告)号：US08298365B2

    公开(公告)日：2012-10-30

    申请号：US12796872

    申请日：2010-06-09

    申请人： Hirofumi Imai ,  Koki Tamura ,  Takahiro Asai ,  Takahiro Yoshioka ,  Yoshihiro Inao

    发明人： Hirofumi Imai ,  Koki Tamura ,  Takahiro Asai ,  Takahiro Yoshioka ,  Yoshihiro Inao

    IPC分类号： B32B38/10 ,  B32B37/12

    CPC分类号： C09J5/00 ,  B32B37/12 ,  B32B2457/14 ,  H01L21/67132 ,  H01L21/6836 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/68381 ,  Y10T156/1111 ,  Y10T156/16

    摘要： A sticking method for sticking a support plate onto a substrate in such a way that the support plate can be removed in quickly and easily is provided. The sticking method according to the present invention includes the step of sticking a support plate 3 onto a wafer 2 via a first adhesive layer 4 provided on the wafer 2, a separate film 5 provided on the first adhesive layer 4, and a second adhesive layer 6, provided on the separation film layer 5, which either is higher in rate of dissolution in a solution than the first adhesive layer 4 or dissolves in a solvent different from the solvent in which the first adhesive layer 4 dissolves.

    摘要翻译： 提供了一种用于将支撑板粘贴到基板上以使得能够快速且容易地移除支撑板的方式的粘贴方法。 根据本发明的粘贴方法包括通过设置在晶片2上的第一粘合层4，设置在第一粘合剂层4上的分离膜5和第二粘合剂层将支撑板3粘贴到晶片2上的步骤 6，设置在分离膜层5上，或者溶解在比第一粘合剂层4溶解的溶解速度高的溶剂中，或溶解在与第一粘合层4溶解的溶剂不同的溶剂中。

    SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN
    4.
    发明申请
    SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN 审中-公开
    SILSESQUIOXANE树脂，积极抵抗组合物，耐腐蚀层压材料和形成耐力图案的方法

    公开(公告)号：US20090068586A1

    公开(公告)日：2009-03-12

    申请号：US12247876

    申请日：2008-10-08

    申请人： Tsuyoshi Nakamura ,  Koki Tamura ,  Tomotaka Yamada ,  Taku Hirayama ,  Daisuke Kawana ,  Takayuki Hosono

    发明人： Tsuyoshi Nakamura ,  Koki Tamura ,  Tomotaka Yamada ,  Taku Hirayama ,  Daisuke Kawana ,  Takayuki Hosono

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： C08G77/04 ,  C08G77/24 ,  G03F7/0392 ,  G03F7/0757 ,  Y10T428/31663

    摘要： A silsesquioxane resin, a positive resist composition, a resist laminate, and a method of forming a resist pattern that are capable of suppressing a degas phenomenon are provided, and a silicon-containing resist composition and a method of forming a resist pattern that are ideally suited to immersion lithography are also provided. The silsesquioxane resin includes structural units represented by the general shown below [wherein, R1 and R2 each represent, independently, a straight chain, branched, or cyclic saturated aliphatic hydrocarbon group; R3 represents an acid dissociable, dissolution inhibiting group containing a hydrocarbon group that includes an aliphatic monocyclic or polycyclic group; R4 represents a hydrogen atom, or a straight chain, branched, or cyclic alkyl group; X represents an alkyl group of 1 to 8 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; and m represents an integer from 1 to 3].

    摘要翻译： 提供倍半硅氧烷树脂，正性抗蚀剂组合物，抗蚀剂层压体以及能够抑制脱气现象的形成抗蚀剂图案的方法，以及理想地形成抗蚀剂图案的含硅抗蚀剂组合物和方法 也提供了适用于浸没式光刻技术。 倍半硅氧烷树脂包括由下述通式表示的结构单元[其中，R 1和R 2各自独立地表示直链，支链或环状的饱和脂族烃基; R3表示含有脂肪族单环或多环基团的含有烃基的酸解离性溶解抑制基团， R4表示氢原子，或直链，支链或环状烷基; X表示1〜8个碳原子的烷基，其中至少一个氢原子被氟原子取代; m表示1〜3的整数]。

    Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern
    6.
    发明申请
    Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern 审中-公开
    倍半硅氧烷树脂，正性抗蚀剂组合物，包括抗蚀剂的层叠体和形成抗蚀剂图案的方法

    公开(公告)号：US20060222866A1

    公开(公告)日：2006-10-05

    申请号：US10546575

    申请日：2004-02-25

    申请人： Tsuyoshi Nakamura ,  Koki Tamura ,  Tomotaka Yamada ,  Taku Hirayama ,  Daisuke Kawana ,  Takayuki Hosono

    发明人： Tsuyoshi Nakamura ,  Koki Tamura ,  Tomotaka Yamada ,  Taku Hirayama ,  Daisuke Kawana ,  Takayuki Hosono

    IPC分类号： B32B27/00 ,  C08L83/04 ,  C08G77/04 ,  B32B9/04

    CPC分类号： C08G77/04 ,  C08G77/24 ,  G03F7/0392 ,  G03F7/0757 ,  Y10T428/31663

    摘要： A silsesquioxane resin, a positive resist composition, a resist laminate, and a method of forming a resist pattern that are capable of suppressing a degas phenomenon are provided, and a silicon-containing resist composition and a method of forming a resist pattern that are ideally suited to immersion lithography are also provided. The silsesquioxane resin includes structural units represented by the general shown below [wherein, R1 and R2 each represent, independently, a straight chain, branched, or cyclic saturated aliphatic hydrocarbon group; R3 represents an acid dissociable, dissolution inhibiting group containing a hydrocarbon group that includes an aliphatic monocyclic or polycyclic group; R4 represents a hydrogen atom, or a straight chain, branched, or cyclic alkyl group; X represents an alkyl group of 1 to 8 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; and m represents an integer from 1 to 3].

    摘要翻译： 提供倍半硅氧烷树脂，正性抗蚀剂组合物，抗蚀剂层压体以及能够抑制脱气现象的形成抗蚀剂图案的方法，以及理想地形成抗蚀剂图案的含硅抗蚀剂组合物和方法 也提供了适用于浸没式光刻技术。 倍半硅氧烷树脂包括由下列通式表示的结构单元[其中，R 1和R 2各自独立地表示直链，支链或环状的饱和脂族烃 组; R 3表示含有脂肪族单环或多环基团的含有烃基的酸解离性溶解抑制基团， R 4表示氢原子，或直链，支链或环状的烷基; X表示1〜8个碳原子的烷基，其中至少一个氢原子被氟原子取代; m表示1〜3的整数]。

    Positive resist composition
    7.
    发明申请
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号：US20050227170A1

    公开(公告)日：2005-10-13

    申请号：US11091617

    申请日：2005-03-28

    申请人： Takayuki Hosono ,  Koki Tamura ,  Daisuke Kawana ,  Tomotaka Yamada

    发明人： Takayuki Hosono ,  Koki Tamura ,  Daisuke Kawana ,  Tomotaka Yamada

    IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027 ,  G03C1/492

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0757 ,  Y10S430/115 ,  Y10S430/122

    摘要： A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin and the acid generator component (B) contains an onium salt-based acid generator (B1) containing a perfluoroalkyl sulfonate ion having 3 or 4 carbon atoms as an anion.

    摘要翻译： 提供了具有优异的掩模线性的正性抗蚀剂组合物。 该组合物是包含产生暴露酸的基础树脂成分（A）和酸发生剂成分（B）的正性抗蚀剂组合物，其中，所述基础树脂成分（A）为硅树脂，所述酸发生剂成分（B）含有 含有具有3或4个碳原子的全氟烷基磺酸根离子作为阴离子的鎓盐型酸发生剂（B1）。

    Adhesive composition and film adhesive
    10.
    发明授权
    Adhesive composition and film adhesive 有权
    粘合剂组合物和胶粘剂

    公开(公告)号：US08124685B2

    公开(公告)日：2012-02-28

    申请号：US12683688

    申请日：2010-01-07

    申请人： Hirofumi Imai ,  Koki Tamura ,  Koichi Misumi ,  Takahiro Asai

    发明人： Hirofumi Imai ,  Koki Tamura ,  Koichi Misumi ,  Takahiro Asai

    IPC分类号： C08L37/00

    CPC分类号： C09J133/14 ,  Y10T428/2891

    摘要： An adhesive composition of the present invention is an adhesive composition including a polymer obtained by copolymerizing a monomer composition containing a (meth)acrylic acid ester and a monomer having a maleimide group, the (meth)acrylic acid ester has a structure represented by General Formula (1): wherein R1 is a hydrogen atom or a methyl group, and R2 is a C4 to C20 alkyl group, and the (meth)acrylic acid ester is contained in the monomer composition by 10 to 50 parts by mass where an amount of the monomer composition is 100 parts by mass. With the arrangement, it is possible to provide an adhesive agent and a film adhesive each of which can be suitably used in high temperature processing.

    摘要翻译： 本发明的粘合剂组合物是包含通过共聚包含（甲基）丙烯酸酯的单体组合物和具有马来酰亚胺基团的单体而获得的聚合物的粘合剂组合物，所述（甲基）丙烯酸酯具有由通式 （1）表示：其中，R1为氢原子或甲基，R2为C4〜C20烷基，单体组合物含有（甲基）丙烯酸酯10〜50质量份， 单体组成为100质量份。 通过这种布置，可以提供粘合剂和薄膜粘合剂，它们都可以适用于高温加工。