IC tester joined with ion beam tester and the detection method of the
failure part of IC
    1.
    发明授权
    IC tester joined with ion beam tester and the detection method of the failure part of IC 失效
    IC测试仪与离子束测试仪和IC故障部分的检测方法相结合

    公开(公告)号:US5592099A

    公开(公告)日:1997-01-07

    申请号:US418498

    申请日:1995-04-07

    CPC分类号: G01R31/303

    摘要: An IC test system analyzes a defective part in the inside of an IC chip. The IC test system irradiates an ion beam on the surface of the IC under test and displays a potential contrast image of wiring conductors under the surface of the IC device. The IC test system has improved operability and image quality as well as a capability of specifying a defective part of the IC under test. A stop pattern setting part is provided for setting a plurality of patterns to suspend a renewal operation of pattern generation in a test pattern generator. Whenever this stop pattern occurs, a pattern renewal action of the test pattern generator is stopped and repeatedly generates the stop pattern while an ion beam tester acquires image data. When the acquisition of the image data completes, the test pattern generator resumes the pattern renewal action. Different test patterns are alternatively applied to the IC under test and the resulting image data is either added or subtracted to improve an image quality. By further controlling on and off of a power source to the IC under test, the potential contrast image can be obtained with further certainty.

    摘要翻译: IC测试系统分析IC芯片内部的故障部分。 IC测试系统在测试的IC的表面上照射离子束,并且在IC器件的表面下显示布线导体的潜在对比图像。 IC测试系统具有改进的可操作性和图像质量,以及指定被测IC的缺陷部分的能力。 提供了一种停止模式设置部分,用于设置多个模式以暂停测试模式生成器中的模式生成的更新操作。 无论何时发生该停止模式,停止测试图形发生器的图案更新动作,并且在离子束测试器获取图像数据的同时重复地产生停止模式。 当图像数据的获取完成时,测试图案生成器恢复图案更新动作。 将不同的测试图案替代地应用于被测试的IC,并且所得到的图像数据被添加或减去以提高图像质量。 通过进一步控制对被测IC的电源的开和关,可以进一步确定地获得潜在的对比度图像。

    IC analysis system and electron beam probe system and fault isolation
method therefor
    2.
    发明授权
    IC analysis system and electron beam probe system and fault isolation method therefor 失效
    IC分析系统和电子束探测系统及其故障隔离方法

    公开(公告)号:US5633595A

    公开(公告)日:1997-05-27

    申请号:US418418

    申请日:1995-04-07

    CPC分类号: G01R31/307

    摘要: A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

    摘要翻译: 提供了一种停止模式设置部件203,其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式,并且在每次生成设置在停止模式设置部件203中的测试图案时,测试模式 发生器210停止模式更新操作。 每次测试模式停止时,停止信号被施加到电子束探测器系统300,使其开始图像数据获取操作。 在图像数据获取完成时,写入完成信号生成部件308生成写入完成信号,该写入完成信号被施加到测试图案生成器210,使其恢复图案更新操作。 通过将不同的测试图案交替地应用于被测设备,并且显示所得到的图像数据之间的差异的图像数据,可以提高潜在的对比度图像。

    IC Analysis system and electron beam probe system and fault isolation
method therefor
    3.
    发明授权
    IC Analysis system and electron beam probe system and fault isolation method therefor 失效
    IC分析系统和电子束探测系统及其故障隔离方法

    公开(公告)号:US5589780A

    公开(公告)日:1996-12-31

    申请号:US312953

    申请日:1994-09-30

    CPC分类号: G01R31/307

    摘要: A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patters set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

    摘要翻译: 提供了一种停止模式设置部分203,其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式,并且在每次生成设置在停止模式设置部分203中的测试模式时,测试模式 发生器210停止模式更新操作。 每次测试模式停止时,停止信号被施加到电子束探测器系统300,使其开始图像数据获取操作。 在图像数据获取完成时,写入完成信号生成部件308生成写入完成信号,该写入完成信号被施加到测试图案生成器210,使其恢复图案更新操作。 通过将不同的测试图案交替地应用于被测设备,并且显示所得到的图像数据之间的差异的图像数据,可以提高潜在的对比度图像。

    IC analysis system and electron beam probe system and fault isolation
method therefor
    4.
    发明授权
    IC analysis system and electron beam probe system and fault isolation method therefor 失效
    IC分析系统和电子束探测系统及其故障隔离方法

    公开(公告)号:US5528156A

    公开(公告)日:1996-06-18

    申请号:US181584

    申请日:1994-01-14

    CPC分类号: G01R31/307

    摘要: A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pa-tern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

    摘要翻译: 提供了一种停止模式设置部件203,其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式,并且在每次生成设置在停止模式设置部件203中的测试图案时,测试模式 发生器210停止模式更新操作。 每次测试模式停止时,停止信号被施加到电子束探测器系统300,使其开始图像数据获取操作。 在完成图像数据采集之后,写入完成信号产生部件308产生写入完成信号,该写入完成信号被施加到测试图案发生器210,以使其恢复当前更新操作。 通过将不同的测试图案交替地应用于被测设备,并且显示所得到的图像数据之间的差异的图像数据,可以提高潜在的对比度图像。

    Detector objective lens
    5.
    发明授权
    Detector objective lens 失效
    检测器物镜

    公开(公告)号:US5895917A

    公开(公告)日:1999-04-20

    申请号:US877601

    申请日:1997-06-18

    CPC分类号: H01J37/145 H01J2237/2594

    摘要: The invention relates to a detector objective lens and a charged particle am device with such a detector objective lens containing a main lens for focussing a charged particle beam on a specimen, which consists of a magnetic lens (60) and an electrostatic lens (61) and a detector (62) disposed in front of the magnetic lens (60) in the direction of the charged particle beam (2) for detecting the charged particles released at the specimen (8). An additional lens is provided for influencing the released charged particles, which generates an electrostatic and/or magnetic field and is disposed between the main lens and the detector, the fields of the main lens and said additional lens being substantially separated from each other.

    摘要翻译: 本发明涉及一种具有这种检测器物镜的检测器物镜和带电粒子束装置,该检测器物镜包含用于将带电粒子束聚焦在由磁性透镜(60)和静电透镜(61)组成的样本上的主透镜, 以及检测器(62),其沿着带电粒子束(2)的方向设置在磁性透镜(60)的前方,用于检测在样本(8)处释放的带电粒子。 提供了附加透镜来影响释放的带电粒子,其产生静电场和/或磁场,并且设置在主透镜和检测器之间,主透镜和所述附加透镜的场基本上彼此分离。

    IC analysis system having charged particle beam apparatus for improved
contrast image
    7.
    发明授权
    IC analysis system having charged particle beam apparatus for improved contrast image 失效
    具有用于改善对比度图像的带电粒子束装置的IC分析系统

    公开(公告)号:US5640539A

    公开(公告)日:1997-06-17

    申请号:US309750

    申请日:1994-09-21

    CPC分类号: G01R31/307

    摘要: The object of the invention is to provide an IC analysis system having a charged particle beam apparatus in which the operability and picture quality have been enhanced and the measurement method of a device under test. In the IC analysis system, stop signal generating means in which the stop signal stimulates the acquisition of image data is added to a test pattern generator and acquisition completion signal generating means which releases the stopping state on completing the acquisition of image data and which resumes the test pattern updating operation is added to the charged particle beam apparatus. Furthermore, by adding mode select means to the charged particle beam apparatus, a clearer potential contrast image can be obtained. The methods for locating fault positions can be realized in the IC analysis system having the charged particle beam apparatus wherein the image data can be obtained by alternate test patterns, or by adding one image data to the reverse potential of another image data, or by scanning and irradiating the charged particle beam onto the same surface of the device at a plurality of times.

    摘要翻译: 本发明的目的是提供一种具有带电粒子束装置的IC分析系统,其中可操作性和图像质量得到提高,并且被测装置的测量方法。 在IC分析系统中,停止信号刺激图像数据的获取的停止信号产生装置被添加到测试图案发生器和获取完成信号产生装置,在完成图像数据的获取时释放停止状态,并且恢复 将测试图案更新操作添加到带电粒子束装置中。 此外,通过向带电粒子束装置添加模式选择装置,可以获得更清晰的电位对比图像。 用于定位故障位置的方法可以在具有带电粒子束装置的IC分析系统中实现,其中可以通过替代测试图案获得图像数据,或者通过将一个图像数据添加到另一图像数据的反向电位,或通过扫描 并且多次将带电粒子束照射到装置的相同表面上。