公开(公告)号：US5633595A

公开(公告)日：1997-05-27

申请号：US418418

申请日：1995-04-07

申请人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

发明人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q60/30 ,  G01R31/307 ,  G01R31/305

CPC分类号： G01R31/307

摘要： A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

摘要翻译： 提供了一种停止模式设置部件203，其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式，并且在每次生成设置在停止模式设置部件203中的测试图案时，测试模式 发生器210停止模式更新操作。 每次测试模式停止时，停止信号被施加到电子束探测器系统300，使其开始图像数据获取操作。 在图像数据获取完成时，写入完成信号生成部件308生成写入完成信号，该写入完成信号被施加到测试图案生成器210，使其恢复图案更新操作。 通过将不同的测试图案交替地应用于被测设备，并且显示所得到的图像数据之间的差异的图像数据，可以提高潜在的对比度图像。

公开(公告)号：US5589780A

公开(公告)日：1996-12-31

申请号：US312953

申请日：1994-09-30

申请人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

发明人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q60/30 ,  G01R31/307 ,  G01R31/305

CPC分类号： G01R31/307

摘要： A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patters set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

摘要翻译： 提供了一种停止模式设置部分203，其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式，并且在每次生成设置在停止模式设置部分203中的测试模式时，测试模式 发生器210停止模式更新操作。 每次测试模式停止时，停止信号被施加到电子束探测器系统300，使其开始图像数据获取操作。 在图像数据获取完成时，写入完成信号生成部件308生成写入完成信号，该写入完成信号被施加到测试图案生成器210，使其恢复图案更新操作。 通过将不同的测试图案交替地应用于被测设备，并且显示所得到的图像数据之间的差异的图像数据，可以提高潜在的对比度图像。

公开(公告)号：US5592099A

公开(公告)日：1997-01-07

申请号：US418498

申请日：1995-04-07

申请人： Masayuki Kuribara ,  Akira Goishi ,  Koshi Ueda

发明人： Masayuki Kuribara ,  Akira Goishi ,  Koshi Ueda

IPC分类号： G01R31/302 ,  G01R31/303 ,  H01L21/66 ,  G01R31/28

CPC分类号： G01R31/303

摘要： An IC test system analyzes a defective part in the inside of an IC chip. The IC test system irradiates an ion beam on the surface of the IC under test and displays a potential contrast image of wiring conductors under the surface of the IC device. The IC test system has improved operability and image quality as well as a capability of specifying a defective part of the IC under test. A stop pattern setting part is provided for setting a plurality of patterns to suspend a renewal operation of pattern generation in a test pattern generator. Whenever this stop pattern occurs, a pattern renewal action of the test pattern generator is stopped and repeatedly generates the stop pattern while an ion beam tester acquires image data. When the acquisition of the image data completes, the test pattern generator resumes the pattern renewal action. Different test patterns are alternatively applied to the IC under test and the resulting image data is either added or subtracted to improve an image quality. By further controlling on and off of a power source to the IC under test, the potential contrast image can be obtained with further certainty.

摘要翻译： IC测试系统分析IC芯片内部的故障部分。 IC测试系统在测试的IC的表面上照射离子束，并且在IC器件的表面下显示布线导体的潜在对比图像。 IC测试系统具有改进的可操作性和图像质量，以及指定被测IC的缺陷部分的能力。 提供了一种停止模式设置部分，用于设置多个模式以暂停测试模式生成器中的模式生成的更新操作。 无论何时发生该停止模式，停止测试图形发生器的图案更新动作，并且在离子束测试器获取图像数据的同时重复地产生停止模式。 当图像数据的获取完成时，测试图案生成器恢复图案更新动作。 将不同的测试图案替代地应用于被测试的IC，并且所得到的图像数据被添加或减去以提高图像质量。 通过进一步控制对被测IC的电源的开和关，可以进一步确定地获得潜在的对比度图像。

公开(公告)号：US5528156A

公开(公告)日：1996-06-18

申请号：US181584

申请日：1994-01-14

申请人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

发明人： Koshi Ueda ,  Akira Goishi ,  Masayuki Kuribara

IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q60/30 ,  G01R31/307 ,  G01R31/305

CPC分类号： G01R31/307

摘要： A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pa-tern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.

摘要翻译： 提供了一种停止模式设置部件203，其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式，并且在每次生成设置在停止模式设置部件203中的测试图案时，测试模式 发生器210停止模式更新操作。 每次测试模式停止时，停止信号被施加到电子束探测器系统300，使其开始图像数据获取操作。 在完成图像数据采集之后，写入完成信号产生部件308产生写入完成信号，该写入完成信号被施加到测试图案发生器210，以使其恢复当前更新操作。 通过将不同的测试图案交替地应用于被测设备，并且显示所得到的图像数据之间的差异的图像数据，可以提高潜在的对比度图像。

公开(公告)号：US20080067383A1

公开(公告)日：2008-03-20

申请号：US11820358

申请日：2007-06-19

申请人： Masayuki Kuribara

发明人： Masayuki Kuribara

IPC分类号： G21K7/00

CPC分类号： H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/0435 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

摘要： An electron-beam size measuring apparatus includes: electron beam irradiating means that irradiates an electron beam on a surface of a sample; detection means that detects electrons emitted from the sample; distance measurement means that measures the distance between the sample and a secondary electron control electrode of the detection means; a stage on which the sample is mounted; and control means which adjusts the height of the stage so that the distance measured by the distance measurement means would be equal to a predetermined fixed distance, which applies a control voltage to the secondary electron control electrode of the detection means, the control voltage predetermined so as to allow the sample surface potential to become constant with the sample positioned at the fixed distance, and which causes the electron beam to be irradiated by applying a predetermined accelerating voltage. The stage may include holding means that does not electrically connect the sample thereto, and moving means that moves the sample up and down.

摘要翻译： 电子束尺寸测量装置包括：电子束照射装置，其在样品的表面上照射电子束; 检测装置，其检测从样品发射的电子; 距离测量装置，用于测量检测装置的样品与二次电子控制电极之间的距离; 安装样品的阶段; 以及控制装置，其调节台的高度，使得由距离测量装置测量的距离将等于预定的固定距离，其将控制电压施加到检测装置的二次电子控制电极，预定的控制电压 为了使样品表面电位变得恒定，样品位于固定距离处，并且通过施加预定的加速电压使得电子束被照射。 舞台可以包括不将样本电连接的保持装置和使样本上下移动的移动装置。

公开(公告)号：US20060006330A1

公开(公告)日：2006-01-12

申请号：US11165572

申请日：2005-06-23

申请人： Masahiro Seyama ,  Masayuki Kuribara ,  Toshihiko Hara ,  Kazuhiro Arakawa ,  Toshimichi Iwai

发明人： Masahiro Seyama ,  Masayuki Kuribara ,  Toshihiko Hara ,  Kazuhiro Arakawa ,  Toshimichi Iwai

IPC分类号： G01N23/00

CPC分类号： G01N23/225 ,  H01J37/026 ,  H01J2237/0044 ,  H01J2237/28

摘要： There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the surface of the sample, a potential control section for adjusting electric potential of the surface of the sample to potential set in advance by applying voltage determined based on an amount of electric charge on the surface of the sample to the sample, an electron detecting section for detecting electrons produced when the electron beam is irradiated to the surface of the sample and an appearance acquiring section for acquiring the appearance of surface of the sample per each spot on the surface based on the electrons detected by the electron detecting section.

摘要翻译： 提供了一种用于通过向其上照射电子束来观察样品表面的样品观察装置，具有用于将电子束照射到样品表面的电子枪，用于调节表面的电位的电位控制部分 通过将样品表面上的电荷量确定的电压提取到样品，将样品调到电位;电子检测部分，用于检测当电子束照射到样品表面时产生的电子和外观 获取部分，用于基于由电子检测部分检测的电子获取表面上每个点的样品的表面的外观。

公开(公告)号：US20090242800A1

公开(公告)日：2009-10-01

申请号：US12380964

申请日：2009-03-05

申请人： Masayuki Kuribara

发明人： Masayuki Kuribara

IPC分类号： G01J1/58 ,  G01N21/64

CPC分类号： G01B15/04 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/2817 ,  H01J2237/2826

摘要： An electron-beam dimension measuring apparatus includes: electron-beam irradiating means for irradiating a surface of a sample with an electron beam; a stage on which the sample is placed; a photoelectron generating electrode disposed so as to face the sample; ultraviolet light irradiating means for emitting ultraviolet light; and control means for causing the ultraviolet light irradiating means to irradiate the sample and the photoelectron generating electrode with the ultraviolet light for a predetermined length of time, to cause the sample and the photoelectron generating electrode to emit photoelectrons, for applying a voltage to the photoelectron generating electrode, the voltage applied to supply energy corresponding to a difference between energy of photoelectrons emitted by the sample and energy of photoelectrons emitted by the photoelectron generating electrode, and thereby for controlling an electric potential of the surface of the sample to set the electric potential at 0 V. The control means measures the dimension of the sample after keeping the electric potential constant on the surface of the sample.

摘要翻译： 电子束尺寸测量装置包括：用电子束照射样品表面的电子束照射装置; 放置样品的阶段; 设置成面向样品的光电子产生电极; 用于发射紫外光的紫外线照射装置; 以及控制装置，用于使紫外光照射装置用紫外线照射样品和光电子产生电极预定的时间长度，以使样品和光电子产生电极发射光电子，以向光电子施加电压 产生电极，施加电压以对应于由样品发射的光电子的能量与由光电子产生电极发射的光电子的能量之间的差异，从而用于控制样品表面的电位以设定电位 在0V。控制装置在保持电极在样品表面上恒定后测量样品的尺寸。

公开(公告)号：US07560693B2

公开(公告)日：2009-07-14

申请号：US11820358

申请日：2007-06-19

申请人： Masayuki Kuribara

发明人： Masayuki Kuribara

IPC分类号： G21K7/00

CPC分类号： H01J37/20 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/0435 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

摘要： An electron-beam size measuring apparatus includes: electron beam irradiating means that irradiates an electron beam on a surface of a sample; detection means that detects electrons emitted from the sample; distance measurement means that measures the distance between the sample and a secondary electron control electrode of the detection means; a stage on which the sample is mounted; and control means which adjusts the height of the stage so that the distance measured by the distance measurement means would be equal to a predetermined fixed distance, which applies a control voltage to the secondary electron control electrode of the detection means, the control voltage predetermined so as to allow the sample surface potential to become constant with the sample positioned at the fixed distance, and which causes the electron beam to be irradiated by applying a predetermined accelerating voltage. The stage may include holding means that does not electrically connect the sample thereto, and moving means that moves the sample up and down.

摘要翻译： 电子束尺寸测量装置包括：电子束照射装置，其在样品的表面上照射电子束; 检测装置，其检测从样品发射的电子; 距离测量装置，用于测量检测装置的样品与二次电子控制电极之间的距离; 安装样品的阶段; 以及控制装置，其调节台的高度，使得由距离测量装置测量的距离将等于预定的固定距离，其将控制电压施加到检测装置的二次电子控制电极，预定的控制电压 为了使样品表面电位变得恒定，样品位于固定距离处，并且通过施加预定的加速电压使得电子束被照射。 舞台可以包括不将样本电连接的保持装置和使样本上下移动的移动装置。

公开(公告)号：US08530836B2

公开(公告)日：2013-09-10

申请号：US12380964

申请日：2009-03-05

申请人： Masayuki Kuribara

发明人： Masayuki Kuribara

IPC分类号： H01J37/28

CPC分类号： G01B15/04 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/2817 ,  H01J2237/2826

摘要： An electron-beam dimension measuring apparatus includes: electron-beam irradiating means for irradiating a surface of a sample with an electron beam; a stage on which the sample is placed; a photoelectron generating electrode disposed so as to face the sample; ultraviolet light irradiating means for emitting ultraviolet light; and control means for causing the ultraviolet light irradiating means to irradiate the sample and the photoelectron generating electrode with the ultraviolet light for a predetermined length of time, to cause the sample and the photoelectron generating electrode to emit photoelectrons, for applying a voltage to the photoelectron generating electrode, the voltage applied to supply energy corresponding to a difference between energy of photoelectrons emitted by the sample and energy of photoelectrons emitted by the photoelectron generating electrode, and thereby for controlling an electric potential of the surface of the sample to set the electric potential at 0 V. The control means measures the dimension of the sample after keeping the electric potential constant on the surface of the sample.

公开(公告)号：US20070284525A1

公开(公告)日：2007-12-13

申请号：US11726966

申请日：2007-03-23

申请人： Masayuki Kuribara ,  Jun Matsumoto

发明人： Masayuki Kuribara ,  Jun Matsumoto

IPC分类号： H01J37/28 ,  G01N23/00

CPC分类号： G01B15/04 ,  G01N23/225 ,  H01J2237/24535 ,  H01J2237/24578 ,  H01J2237/248 ,  H01J2237/2816 ,  H01J2237/2817

摘要： A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.

摘要翻译： 线宽测量调整方法，用于当用于测量线宽度的第一和第二电子束强度分布由分别通过在第一放大倍率下用电子束扫描第一照射距离获得的二次电子的强度分布图像产生时， 通过在第二倍率下用电子束扫描第二照射距离，包括以第二倍率调整电子束的第二电子束强度分布的步骤，使得第二电子束强度分布等于第一电子束强度分布 的电子束。 可以通过在产生电子束强度分布时增加或减少第二照射距离来调节第二电子束强度分布。