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公开(公告)号：US08633259B2
公开(公告)日：2014-01-21
申请号：US13339784
申请日：2011-12-29
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译： 根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。 一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。
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公开(公告)号：US20120172479A1
公开(公告)日：2012-07-05
申请号：US13339784
申请日：2011-12-29
IPC分类号： C08K5/1535 , C08K5/101 , H01L21/02 , C08K5/07 , C08K5/05 , B32B37/24 , C08K5/3415 , C08K5/20
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译： 根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。 一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。
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3.发明授权Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 失效控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法公开(公告)号：US07608382B2
公开(公告)日：2009-10-27
申请号：US11981617
申请日：2007-10-31
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
摘要翻译： 提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。 具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。 还提供了具有所需外用摩尔百分数的示例性单体。
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4.发明授权Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 有权控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法公开(公告)号：US07341816B2
公开(公告)日：2008-03-11
申请号：US10783174
申请日：2004-02-20
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
摘要翻译： 提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。 具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。 还提供了具有所需外用摩尔百分数的示例性单体。
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公开(公告)号：US07612146B2
公开(公告)日：2009-11-03
申请号：US11220814
申请日：2005-09-07
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
IPC分类号： C08F8/42
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。
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公开(公告)号：US06949609B2
公开(公告)日：2005-09-27
申请号：US10317366
申请日：2002-12-12
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition. Also disclosed are catalyst systems for use in producing the photoresist compositions of the present invention which permit molecular weight control of the photoresist products.
摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。 另外，本发明涉及用于后处理这种光致抗蚀剂组合物以便获得以下一种或多种的方法：（1）聚合物组合物的光密度的降低; 和（2）聚合物组合物中残余金属和/或单体的量的减少。 还公开了用于制备本发明的光致抗蚀剂组合物的催化剂体系，其允许光致抗蚀剂产品的分子量控制。
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7.发明申请Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 失效控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法公开(公告)号：US20080124651A1
公开(公告)日：2008-05-29
申请号：US11981617
申请日：2007-10-31
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided
摘要翻译： 提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。 具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。 还提供了具有所需外用摩尔百分数的示例性单体
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公开(公告)号：US09175123B2
公开(公告)日：2015-11-03
申请号：US13223884
申请日：2011-09-01
申请人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
发明人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
IPC分类号： B32B27/32 , C08F132/08 , C08F232/00 , H01L51/05
CPC分类号： H01L51/052 , C08F32/04 , C08F232/00 , C08L45/00 , H01L51/0035 , H01L51/004 , H01L51/0043 , H01L51/0537 , H01L51/0541 , H01L51/0545 , H01L51/107
摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.
摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为用于制造电子器件的栅极绝缘体层，包括这种聚环烯烃栅极绝缘体的电子器件以及用于制备 这种多环烯烃栅极绝缘体层和包含这些层的电子器件。
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公开(公告)号：US08829087B2
公开(公告)日：2014-09-09
申请号：US13315404
申请日：2011-12-09
申请人： Osamu Onishi , Larry F. Rhodes , Nobuo Tagashira
发明人： Osamu Onishi , Larry F. Rhodes , Nobuo Tagashira
IPC分类号： C08K5/526 , C08K5/07 , C08L45/00 , C08F232/04 , C08F232/08 , G03F7/038 , C08F4/80
CPC分类号： C08F232/08 , G03F7/038
摘要： Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.
摘要翻译： 根据本发明的实施方案提供用于形成用于制造各种类型的光电显示器的层/膜的聚合物。 这样的实施方案还提供用于形成这样的层/膜的这种聚合物的组合物，其中形成的层/膜在可见光光谱上具有高透明度。
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10.发明授权Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权可自成像的成膜聚合物，其组合物和由其制成的装置和结构公开(公告)号：US08748074B2
公开(公告)日：2014-06-10
申请号：US13303423
申请日：2011-11-23
CPC分类号： G03F7/0382 , C08F222/06 , C08F232/08 , G03F7/0233 , G03F7/0395
摘要： Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive tone imaging or negative tone imaging. The films formed thereby are useful as self-imageable layers in the manufacture of microelectronic, such as semiconductor, and optoelectronic devices.
摘要翻译： 用于形成包含包含具有至少一个酚官能度的降冰片烯型重复单元和马来酸酐型重复单元的聚合物的聚合物和组合物，其可被配制为正色调成像或负色调成像。 由此形成的膜可用作微电子制造中的自可成像层，例如半导体和光电器件。
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