公开(公告)号：US20120056313A1

公开(公告)日：2012-03-08

申请号：US13224631

申请日：2011-09-02

申请人： Masashi AIZAWA ,  Jun Morimoto ,  Masayuki Kato

发明人： Masashi AIZAWA ,  Jun Morimoto ,  Masayuki Kato

IPC分类号： H01L23/40

CPC分类号： H01L21/50 ,  H01L23/36 ,  H01L23/49844 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L2224/29111 ,  H01L2224/29139 ,  H01L2224/2929 ,  H01L2224/29299 ,  H01L2224/29386 ,  H01L2224/30181 ,  H01L2224/32245 ,  H01L2924/00013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/0132 ,  H01L2924/0133 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/15747 ,  H01L2924/351 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01082 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/0665 ,  H01L2924/053 ,  H01L2224/29099 ,  H01L2224/29199

摘要： A semiconductor package includes a radiator plate including a stress alleviation section, a resin sheet arranged on the radiator plate, a pair of bus bars joined to the radiator plate through the resin sheet at positions at which the stress alleviation section is interposed between the bus bars, and a semiconductor device joined to the pair of bus bars by being sandwiched between the bus bars, and energized from outside through the pair of bus bars.

摘要翻译： 半导体封装包括散热板，该散热板包括应力消除部分，布置在散热板上的树脂片，一对汇流条，该汇流条通过树脂片连接在散热板上，该位置处应力缓解部分插在汇流条之间 以及通过夹在汇流条之间而连接到该对母线的半导体器件，并且通过该对母线从外部通电。

公开(公告)号：US08591993B2

公开(公告)日：2013-11-26

申请号：US12409387

申请日：2009-03-23

申请人： Shinya Higashi ,  Masashi Aizawa

发明人： Shinya Higashi ,  Masashi Aizawa

IPC分类号： C23C16/00 ,  C30B35/00

CPC分类号： C23C16/4584 ,  C23C16/4401 ,  C23C16/45591

摘要： An epitaxial wafer manufacturing apparatus including: a chamber; a gas introduction port provided in the chamber and configured to introduce a reaction gas into the chamber; a gas exhaust port provided in the chamber and configured to exhaust the reaction gas from inside the chamber; a rotating unit provided inside the chamber; a wafer holder provided in an upper portion of the rotating unit and configured to hold a wafer; and an annular flow-regulating wall being spaced from the rotating unit and the wafer holder, the annular flow-regulating surrounding the upper portion of the rotating unit and a upper portion of the wafer holder, and the annular flow-regulating expanding downward. The flow-regulating wall has an upper end being located above the wafer holder. The upper end has a smaller inner diameter than an outer periphery of the wafer holder. The flow-regulating wall has a lower end being located below an upper surface of the rotating unit. The lower end has a larger inner diameter than an outer periphery of the rotating unit.

摘要翻译： 一种外延晶片制造装置，包括：腔室; 气体导入口，设置在所述室中并且构造成将反应气体引入所述室中; 气体排出口，设置在所述室中并且构造成从所述室内部排出所述反应气体; 设置在所述室内的旋转单元; 晶片保持器，设置在所述旋转单元的上部并且被配置为保持晶片; 以及与所述旋转单元和所述晶片保持器间隔开的环形流量调节壁，围绕所述旋转单元的上部的所述环形流动调节器和所述晶片保持器的上部，并且所述环形流量调节向下扩展。 流动调节壁具有位于晶片保持器上方的上端。 上端具有比晶片保持器的外周更小的内径。 流动调节壁的下端位于旋转单元的上表面下方。 下端具有比旋转单元的外周更大的内径。

公开(公告)号：US20090238971A1

公开(公告)日：2009-09-24

申请号：US12409387

申请日：2009-03-23

申请人： Shinya Higashi ,  Masashi Aizawa

发明人： Shinya Higashi ,  Masashi Aizawa

IPC分类号： C23C16/46 ,  C23C16/458 ,  C23C16/44

CPC分类号： C23C16/4584 ,  C23C16/4401 ,  C23C16/45591

摘要： An epitaxial wafer manufacturing apparatus including: a chamber; a gas introduction port provided in the chamber and configured to introduce a reaction gas into the chamber; a gas exhaust port provided in the chamber and configured to exhaust the reaction gas from inside the chamber; a rotating unit provided inside the chamber; a wafer holder provided in an upper portion of the rotating unit and configured to hold a wafer; and an annular flow-regulating wall being spaced from the rotating unit and the wafer holder, the annular flow-regulating surrounding the upper portion of the rotating unit and a upper portion of the wafer holder, and the annular flow-regulating expanding downward. The flow-regulating wall has an upper end being located above the wafer holder. The upper end has a smaller inner diameter than an outer periphery of the wafer holder. The flow-regulating wall has a lower end being located below an upper surface of the rotating unit. The lower end has a larger inner diameter than an outer periphery of the rotating unit.

摘要翻译： 一种外延晶片制造装置，包括：腔室; 气体导入口，设置在所述室中并且构造成将反应气体引入所述室中; 气体排出口，设置在所述室中并且构造成从所述室内部排出所述反应气体; 设置在所述室内的旋转单元; 晶片保持器，设置在所述旋转单元的上部并且被配置为保持晶片; 以及与所述旋转单元和所述晶片保持器间隔开的环形流量调节壁，围绕所述旋转单元的上部的所述环形流动调节器和所述晶片保持器的上部，并且所述环形流量调节向下扩展。 流动调节壁具有位于晶片保持器上方的上端。 上端具有比晶片保持器的外周更小的内径。 流动调节壁的下端位于旋转单元的上表面下方。 下端具有比旋转单元的外周更大的内径。

公开(公告)号：US20080291385A1

公开(公告)日：2008-11-27

申请号：US12123861

申请日：2008-05-20

申请人： Masashi AIZAWA ,  Atsuo Inoue ,  Yasutada Nakagawa

发明人： Masashi AIZAWA ,  Atsuo Inoue ,  Yasutada Nakagawa

IPC分类号： G02F1/1339

CPC分类号： G02F1/13394

摘要： A liquid crystal display panel includes: a pair of substrates; a cylindrical spacer configured to hold a gap between the pair of substrates, and a liquid crystal which fills the gap. The cylindrical spacer includes a first support portion having a first support surface and a second support portion having a second support surface. The first support portion is provided inside the second support surface so that the first support surface is projected from the second support surface. The second support portion is provided on a major surface of one of the substrates the second support surface from the major surface.

摘要翻译： 液晶显示面板包括：一对基板; 被配置为保持所述一对基板之间的间隙的圆柱形间隔件和填充所述间隙的液晶。 圆柱形间隔件包括具有第一支撑表面的第一支撑部分和具有第二支撑表面的第二支撑部分。 第一支撑部分设置在第二支撑表面内部，使得第一支撑表面从第二支撑表面突出。 第二支撑部分在主要表面的第二支撑表面的一个基板的主表面上提供。

公开(公告)号：US08284372B2

公开(公告)日：2012-10-09

申请号：US12123861

申请日：2008-05-20

申请人： Masashi Aizawa ,  Atsuo Inoue ,  Yasutada Nakagawa

发明人： Masashi Aizawa ,  Atsuo Inoue ,  Yasutada Nakagawa

IPC分类号： G02F1/1339

CPC分类号： G02F1/13394

摘要： A liquid crystal display panel includes: a pair of substrates; a cylindrical spacer configured to hold a gap between the pair of substrates, and a liquid crystal which fills the gap. The cylindrical spacer includes a first support portion having a first support surface and a second support portion having a second support surface. The first support portion is provided inside the second support surface so that the first support surface is projected from the second support surface. The second support portion is provided on a major surface of one of the substrates the second support surface from the major surface.

摘要翻译： 液晶显示面板包括：一对基板; 被配置为保持所述一对基板之间的间隙的圆柱形间隔件和填充所述间隙的液晶。 圆柱形间隔件包括具有第一支撑表面的第一支撑部分和具有第二支撑表面的第二支撑部分。 第一支撑部分设置在第二支撑表面内部，使得第一支撑表面从第二支撑表面突出。 第二支撑部分在主要表面的第二支撑表面的一个基板的主表面上提供。