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1.发明申请CLEANING MEANS FOR LARGE AREA PECVD DEVICES USING A REMOTE PLASMA SOURCE 审中-公开使用远程等离子体源对大面积PECVD器件进行清洁公开(公告)号：US20080035169A1
公开(公告)日：2008-02-14
申请号：US11549679
申请日：2006-10-16
申请人： Filippos Farmakis , Mustapha Elyaakoubi , Benoit Riou , Emmanuil Choumas , Michael Irzyk , Jozef Kudela
发明人： Filippos Farmakis , Mustapha Elyaakoubi , Benoit Riou , Emmanuil Choumas , Michael Irzyk , Jozef Kudela
IPC分类号： B08B6/00
CPC分类号： C23C16/4405 , B08B7/0035 , H01J37/32357 , H01J37/32862
摘要： This invention describes a method for cleaning a deposition chamber that is compatible with large area deposition. It comprises transport of activated gas from a remote plasma source to an area in the chamber in a uniform way through at least two injection points on equivalent paths for the reactive species. A respective gas injection system for the distribution of activated reactive gas comprises a source of reactive gas, a tubing for distributing the gas and an evacuable chamber. The gas is discharged to the tubing having at least one inlet constructively connected to the source and at least two outlets open to the chamber, thereby forming at least partially independent tube branches, wherein the length and the cross-section perpendicular to the gas flow of each tube branch, calculated between inlet and each respective outlet is essentially equal.
摘要翻译： 本发明描述了一种用于清洁与大面积沉积相容的沉积室的方法。 其包括将活化气体从远程等离子体源输送到室中的区域，以均匀的方式通过反应物种的等效路径上的至少两个注入点。 用于分配活性反应气体的各自的气体注入系统包括反应气体源，用于分配气体的管道和可抽空室。 气体被排放到具有构造地连接到源的至少一个入口的管道和至少两个通向腔室的出口，从而形成至少部分独立的管分支，其中垂直于气流的长度和横截面 在入口和每个相应出口之间计算的每个管支路基本相等。
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2.发明授权Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates 有权用于处理矩形大面积衬底的高频等离子体反应器的电压不均匀补偿方法公开(公告)号：US07687117B2
公开(公告)日：2010-03-30
申请号：US12346917
申请日：2008-12-31
IPC分类号： B05D1/06
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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公开(公告)号：US09398678B2
公开(公告)日：2016-07-19
申请号：US13825913
申请日：2011-09-14
CPC分类号： H05H1/24 , F03H1/0025 , H01J27/024 , H01J27/16 , H05H1/54
摘要： The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarization potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.
摘要翻译： 本发明涉及一种用于形成等离子体束的方法和装置。 根据本发明：检测等离子体束（PB）的电中性的质量（12和/或13）; 并且调整提取和加速栅格（4）的交变极化电位，使得等离子体束（PB）至少大致电中性。
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4.发明申请VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES 有权用于处理矩形大面积基片的高频等离子体反应器的电压非均匀性补偿方法公开(公告)号：US20090155489A1
公开(公告)日：2009-06-18
申请号：US12346917
申请日：2008-12-31
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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5.发明申请Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates 有权用于处理矩形大面积衬底的高频等离子体反应器的电压不均匀补偿方法公开(公告)号：US20050066898A1
公开(公告)日：2005-03-31
申请号：US10935779
申请日：2004-09-08
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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公开(公告)号：US20130300288A1
公开(公告)日：2013-11-14
申请号：US13825913
申请日：2011-09-14
IPC分类号： H05H1/24
CPC分类号： H05H1/24 , F03H1/0025 , H01J27/024 , H01J27/16 , H05H1/54
摘要： The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarisation potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.
摘要翻译： 本发明涉及一种用于形成等离子体束的方法和装置。 根据本发明：检测等离子体束（PB）的电中性的质量（在12和/或13）; 并且调整提取和加速栅格（4）的交变极化电位，使得等离子体束（PB）至少大致电中性。
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7.发明授权Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates 有权用于处理矩形大面积衬底的高频等离子体反应器的电压不均匀补偿方法公开(公告)号：US08056504B2
公开(公告)日：2011-11-15
申请号：US12708757
申请日：2010-02-19
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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8.发明申请VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES 有权用于处理矩形大面积基片的高频等离子体反应器的电压非均匀性补偿方法公开(公告)号：US20100139863A1
公开(公告)日：2010-06-10
申请号：US12708757
申请日：2010-02-19
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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9.发明授权Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates 有权用于处理矩形大面积衬底的高频等离子体反应器的电压不均匀补偿方法公开(公告)号：US07487740B2
公开(公告)日：2009-02-10
申请号：US10935779
申请日：2004-09-08
CPC分类号： H01J37/32009 , H01J37/32091 , H01J37/32541
摘要： A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
摘要翻译： 真空容器和至少两个电极限定内部工艺空间。 至少一个电源可以与电极连接。 基板保持器将待处理的基板保持在内部处理空间中。 电极中的至少一个沿着第一横截面具有凹形轮廓，并且沿着第二横截面具有凸形轮廓，第一横截面与第二横截面平行。 气体通过气体入口提供给空间。 电源被提供给电极并且处理基板。
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