公开(公告)号：US08533954B2

公开(公告)日：2013-09-17

申请号：US13207046

申请日：2011-08-10

Applicant: Akira Tange ,  Hideki Okada ,  Isao Sumiyoshi ,  Mitsuhiro Sugiyama

Inventor： Akira Tange ,  Hideki Okada ,  Isao Sumiyoshi ,  Mitsuhiro Sugiyama

IPC: B21F35/00

CPC classification number: F16F1/06 ,  C21D7/06 ,  C21D9/02 ,  Y10T29/479 ,  Y10T29/49609 ,  Y10T29/49611

Abstract: A spring wire with a hardness of 50 to 56 HRC is subjected to first and second shot peening processes within a warm working temperature range of 150° C. to 350° C. In the first shot peening process, a first shot of a shot size of at least 1.0 mm is used. In the second shot peening process, a second shot smaller in shot size than the first shot is used. Through these shot peening processes, compressive residual stress is imparted to the spring wire. The spring wire includes a residual stress increase part, residual stress peak part, and residual stress decrease part. In the residual stress decrease part, a part including a compressive residual stress magnitude equivalent to the magnitude of the compressive residual stress at a surface of the spring wire exists at a region at a depth exceeding the permissible pit depth.

Abstract translation: 硬度为50〜56HRC的弹簧丝在150〜350℃的温暖​​工作温度范围内进行第一次和第二次喷丸硬化处理。在第一次喷丸硬化处理中， 使用至少1.0mm。 在第二次喷丸硬化处理中，使用了比第一次投篮更小的投篮尺寸的第二次投篮。 通过这些喷丸硬化处理，赋予弹簧丝压缩残余应力。 弹簧丝包括残余应力增加部分，残余应力峰部分和残余应力减少部分。 在残余应力减少部分中，包括与弹簧丝的表面处的压缩残余应力的大小相当的压缩残余应力大小的部分存在于超过允许凹坑深度的深度的区域。

公开(公告)号：US20110292318A1

公开(公告)日：2011-12-01

申请号：US13116048

申请日：2011-05-26

Applicant: Hiroshi Nakamoto ,  Mitsuhiro Sugiyama ,  Masahiro Ito

Inventor： Hiroshi Nakamoto ,  Mitsuhiro Sugiyama ,  Masahiro Ito

IPC: G02F1/1335

CPC classification number: G02B6/003 ,  G02B6/0016 ,  G02B6/0028 ,  G02B6/0038 ,  G02B6/0068 ,  G02F1/133514 ,  G02F1/133524 ,  G02F1/133603 ,  G02F1/133615 ,  G02F1/1368

Abstract: Provided is a liquid crystal display device includes an optical switching member; a light guide plate made of a thermoplastic material, which includes at least one light introducing portion on at least one side surface thereof; and a light source disposed on the at least one side surface, in which: the at least one light introducing portion includes, in plan view of the light guide plate: a first portion extending from a light incident surface, which is an end surface of the at least one light introducing portion, while keeping a substantially constant width; and a second portion, which extends from the first portion and has a form which widens; and at least the second portion is connected to a front surface of the light guide plate through an inclined surface which is smoothly continuous with the front surface of the light guide plate.

Abstract translation: 提供一种液晶显示装置，包括光开关元件; 由热塑性材料制成的导光板，其在至少一个侧表面上包括至少一个光引入部分; 以及设置在所述至少一个侧表面上的光源，其中：所述至少一个光导入部在所述导光板的平面图中包括从作为所述导光板的端面的光入射面延伸的第一部分 所述至少一个光导入部保持基本恒定的宽度; 以及第二部分，其从第一部分延伸并且具有变宽的形式; 并且至少第二部分通过与导光板的前表面平滑连续的倾斜表面连接到导光板的前表面。

公开(公告)号：US06259196B1

公开(公告)日：2001-07-10

申请号：US09389222

申请日：1999-09-03

Applicant: Masayoshi Misono ,  Tutomu Tojyo ,  Hiroyuki Tamura ,  Mitsuhiro Sugiyama

Inventor： Masayoshi Misono ,  Tutomu Tojyo ,  Hiroyuki Tamura ,  Mitsuhiro Sugiyama

IPC: H01J2970

CPC classification number: H01J29/707 ,  H01J29/58

Abstract: A cathode ray tube including an electron gun including a cathode and a plurality of electrodes and for generating an electron beam, a phosphor screen and an electron beam deflection device. The cathode ray tube includes a deflection-defocusing correcting member having laminated nonmagnetic and magnetic materials disposed in a deflection magnetic field produced by the electron beam deflection device for establishing at least one non-uniform magnetic field. The magnetic materials are disposed at positions with respect to a path of the electron beam where a magnetic flux density of said deflection magnetic field is more than five per cent of a maximum magnetic flux density of the deflection magnetic field.

Abstract translation: 一种包括具有阴极和多个电极并用于产生电子束的电子枪的阴极射线管，荧光屏和电子束偏转装置。 阴极射线管包括偏转散焦校正构件，其具有层叠的非磁性材料和磁性材料，其设置在由电子束偏转装置产生的偏转磁场中，用于建立至少一个不均匀的磁场。 磁性材料设置在相对于电子束的路径的位置，其中所述偏转磁场的磁通密度大于偏转磁场的最大磁通密度的5％。

公开(公告)号：US06232711B1

公开(公告)日：2001-05-15

申请号：US09460517

申请日：1999-12-14

Applicant: Mitsuhiro Sugiyama ,  Tsutomu Tojyo ,  Masahiro Ito ,  Masayoshi Misono ,  Hiroyuki Tamura

Inventor： Mitsuhiro Sugiyama ,  Tsutomu Tojyo ,  Masahiro Ito ,  Masayoshi Misono ,  Hiroyuki Tamura

IPC: H01J2950

CPC classification number: H01J29/503

Abstract: A color cathode ray tube includes a panel section having an internal surface with a phosphor layer formed thereon and a neck portion accommodating therein an electron gun assembly for emission of a plurality of electron beams plus a funnel section connecting the panel section and the neck portion together, wherein the electron gun assembly is designed to have a plate-shaped electrode with a plurality of electron beam passage holes corresponding in the number to the electron beams. The plate electrode has cylindrical bulged portions projecting in a way corresponding to the plurality of electron beams, each of which portion has its top face in which an electron beam opening or hole is formed. The present invention provides a color cathode ray tube comprising a readily manufacturable high-resolution electron gun assembly.

Abstract translation: 彩色阴极射线管包括具有形成在其上的荧光体层的内表面的面板部分和容纳有用于发射多个电子束的电子枪组件的颈部，以及将面板部分和颈部连接在一起的漏斗部分 其中，电子枪组件被设计成具有一个板状电极，该板状电极具有多个对应于电子束的电子束通过孔。 平板电极具有以对应于多个电子束的方式突出的圆柱形凸出部分，每个电子束的每个部分的顶面形成有电子束开口或孔。 本发明提供一种包括容易制造的高分辨率电子枪组件的彩色阴极射线管。

公开(公告)号：US06222310B1

公开(公告)日：2001-04-24

申请号：US09498616

申请日：2000-02-07

Applicant: Takeshi Mera ,  Satoru Endo ,  Mitsuhiro Sugiyama

Inventor： Takeshi Mera ,  Satoru Endo ,  Mitsuhiro Sugiyama

IPC: H01J2950

CPC classification number: H01J29/485 ,  H01J9/14 ,  H01J2229/4824

Abstract: A color cathode ray tube having an electron gun which includes a one piece electrode plate. The one piece electrode plate has three beam passage holes in an in-line arrangement and bead supports. The one piece electrode plate has two portions including a portion having the beam passage holes and a portion having the bead supports which are formed as a one piece structure. The portion having the beam passage holes has a thickness larger than a thickness of the bead supports portion and the one piece structure has steps and continuous walls between the two portions.

Abstract translation: 一种具有电子枪的彩色阴极射线管，其包括一片电极板。 一体式电极板具有三个沿直线排列的光束通过孔和珠支撑。 一体式电极板具有两部分，包括具有光束通过孔的部分和具有形成为一体结构的凸缘支撑部分。 具有光束通过孔的部分的厚度大于胎圈支撑部分的厚度，并且一体结构在两部分之间具有台阶和连续的壁。

公开(公告)号：US6136628A

公开(公告)日：2000-10-24

申请号：US47412

申请日：1998-03-25

Applicant: Mitsuhiro Sugiyama

Inventor： Mitsuhiro Sugiyama

IPC: H01L21/265 ,  H01L31/107 ,  H01L31/20

CPC classification number: H01L31/206 ,  H01L31/107 ,  Y02E10/50

Abstract: It has been pointed out that the avalanche breakdown voltage of a photodetector comprising an avalanche layer formed by selective epitaxial growth considerably fluctuates. A N.sup.+ --Si buried layer and a N--Si epitaxial layer 3 are successively formed on a P--Si substrate. A cavity is formed in the N--Si epitaxial layer, and a SiO.sub.2 layer is grown in the empty space of the cavity. Then, the SiO.sub.2 layer is etched by dry etching, and a SiO.sub.2 layer is left behind on the side wall of the cavity. Next, a P--Si diffusion layer (an avalanche layer) is formed on the N.sup.+ --Si buried layer by P ion implantation. Subsequently, A SiGe/Si layer (an absorption layer) is selectively grown, and a P.sup.+ --Si layer (an electrode layer) is selectively grown thereon.

Abstract translation: 已经指出，包括通过选择性外延生长形成的雪崩层的光电检测器的雪崩击穿电压显着波动。 在P-Si衬底上依次形成N + -Si掩埋层和N-Si外延层3。 在N-Si外延层中形成空穴，并且在空腔的空间中生长SiO 2层。 然后，通过干蚀刻蚀刻SiO 2层，并且在空腔的侧壁上留下SiO 2层。 接着，通过P离子注入在N + -Si掩埋层上形成P-Si扩散层（雪崩层）。 随后，选择性地生长A SiGe / Si层（吸收层），并且在其上选择性地生长P + -Si层（电极层）。

公开(公告)号：US5991487A

公开(公告)日：1999-11-23

申请号：US934891

申请日：1997-09-22

Applicant: Mitsuhiro Sugiyama

Inventor： Mitsuhiro Sugiyama

IPC: H01L27/14 ,  G02B6/12 ,  G02B6/42 ,  H01L31/0232 ,  H01L31/10 ,  G02B6/10

CPC classification number: H01L31/0232 ,  G02B6/12004 ,  G02B6/42 ,  G02B2006/12123 ,  G02B2006/12126

Abstract: An optical waveguide layer in a semiconductor photodetector includes a first interface in contact directly with a first insulation layer and a second interface in contact directly with a second insulation layer, wherein each of the first and second insulation layers is much lower in refractive index than any parts of the optical waveguide layer so that a light being propagated through the optical waveguide layer reflects at the first and second interfaces without any permeation into the first and second insulation layers.

Abstract translation: 半导体光电检测器中的光波导层包括与第一绝缘层直接接触的第一界面和与第二绝缘层直接接触的第二界面，其中第一和第二绝缘层中的每一个的折射率比任何 使得通过光波导层传播的光在第一和第二界面处反射而不会渗入第一和第二绝缘层。

公开(公告)号：US5978533A

公开(公告)日：1999-11-02

申请号：US64514

申请日：1998-04-23

Applicant: Mitsuhiro Sugiyama

Inventor： Mitsuhiro Sugiyama

IPC: G02B6/42 ,  G02B6/30 ,  G02B6/36 ,  H01L21/301 ,  H01L31/02 ,  H01S5/00

CPC classification number: G02B6/30 ,  G02B6/3636 ,  G02B6/3692 ,  G02B6/4233

Abstract: An optical part fixing chip in accordance with the present invention comprises: a guide trench bored in a substrate and having one end thereof abutted on one side of the chip; and a stepped area abutting on one end of the guide trench and extending along one side of the optical part fixing chip. The height of the step of the stepped area is the same as the depth of the guide trench.

Abstract translation: 根据本发明的光学部件固定芯片包括：引导沟槽，其在基板中钻孔并且其一端邻接在芯片的一侧; 以及邻接在所述导向槽的一端并沿着所述光学部件固定芯片的一侧延伸的阶梯区域。 阶梯区域的台阶高度与导槽的深度相同。

公开(公告)号：US20120055023A1

公开(公告)日：2012-03-08

申请号：US13207046

申请日：2011-08-10

Applicant: Akira TANGE ,  Hideki Okada ,  Isao Sumiyoshi ,  Mitsuhiro Sugiyama

Inventor： Akira TANGE ,  Hideki Okada ,  Isao Sumiyoshi ,  Mitsuhiro Sugiyama

IPC: B21F35/00

CPC classification number: F16F1/06 ,  C21D7/06 ,  C21D9/02 ,  Y10T29/479 ,  Y10T29/49609 ,  Y10T29/49611

Abstract: A spring wire with a hardness of 50 to 56 HRC is subjected to first and second shot peening processes within a warm working temperature range of 150 to 350° C. In the first shot peening process, a first shot of a shot size of at least 1.0 mm is used. In the second shot peening process, a second shot smaller in shot size than the first shot is sued. Through these shot peening processes, compressive residual stress is imparted to the spring wire. The spring wire includes a residual stress increase part, residual stress peak part, and residual stress decrease part. In the residual stress decrease part, a part including a compressive residual stress magnitude equivalent to the magnitude of the compressive residual stress at a surface of the spring wire exists at a region at a depth exceeding the permissible pit depth.

Abstract translation: 硬度为50至56HRC的弹簧丝在150至350℃的温暖​​工作温度范围内进行第一和第二喷丸硬化处理。在第一喷丸硬化处理中， 使用1.0毫米。 在第二次喷丸硬化过程中，拍摄尺寸比第一张照片小的第二张照片被起诉。 通过这些喷丸硬化处理，赋予弹簧丝压缩残余应力。 弹簧丝包括残余应力增加部分，残余应力峰部分和残余应力减少部分。 在残余应力减少部分中，包括与弹簧丝的表面处的压缩残余应力的大小相当的压缩残余应力大小的部分存在于超过允许凹坑深度的深度的区域。

公开(公告)号：USD613264S1

公开(公告)日：2010-04-06

申请号：US29326034

申请日：2008-10-10

Applicant: Mitsuhiro Sugiyama ,  Yoshio Nakajima

Designer： Mitsuhiro Sugiyama ,  Yoshio Nakajima