摘要:
A color cathode ray tube having an electron gun which includes a one piece electrode plate. The one piece electrode plate has three beam passage holes in an in-line arrangement and bead supports. The one piece electrode plate has two portions including a portion having the beam passage holes and a portion having the bead supports which are formed as a one piece structure. The portion having the beam passage holes has a thickness larger than a thickness of the bead supports portion and the one piece structure has steps and continuous walls between the two portions.
摘要:
A cathode-ray tube having an electron gun which includes an electrode plate (E) in which a portion having three beam passage holes (H) and a portion having bead supports (S) are formed as a unitary or one piece structure, the two portions having different thicknesses (T.sub.1, T.sub.2), and the steps being inclinedly formed along the boundaries of the two portions. Since the portion having beam passage holes and the portion having bead supports are formed as a unitary or one piece structure easily and highly precisely in the electrode plate, the conventionally employed process of welding can be omitted, and thereby the productivity is raised and the manufacturing cost is decreased. Moreover, use of the material having the steps formed in advance contributes to increasing the productivity and preventing the machining tools from being damaged during the press-forming.
摘要:
A cathode-ray tube having an electron gun which includes an electrode plate (E) in which a portion having three beam passage holes (H) and a portion having bead supports (S) are formed as a unitary structure, the two portions having different thicknesses (T.sub.1, T.sub.2), and the steps being inclinedly formed along the boundaries of the two portions. Since the portion having beam passage holes and the portion having bead supports are formed as a unitary structure easily and highly precisely in the electrode plate, the conventionally employed process of welding can be omitted, and thereby the productivity is raised and the manufacturing cost is decreased. Moreover, use of the material having the steps formed in advance contributes to increasing the productivity and preventing the machining tools from being damaged during the press-forming.
摘要:
An electron beam aperture of a second grid electrode of a color cathode ray tube is a rectangular hole formed in the center of a slit-like recess having longer sides extending in the horizontal direction. The vertical width of the rectangular hole is greater than the width of each shorter side of the slit-like recess.
摘要:
In a broadcast receiving system, a first antenna receives a broadcast signal of a first frequency band and a second antenna receives a signal of a second frequency band different from the first frequency band. A frequency conversion unit converts the signal of the second frequency band into a second signal of the first frequency band. A selection unit selects one of the broadcast signal output from the first antenna and the second signal output from the frequency conversion unit. A demodulation unit demodulates the one of the broadcast signal and the second signal selected by the selection unit.
摘要:
On a surface of a silicon substrate, N.sup.+ type buried layer and N-type epitaxial layer are formed in order, and an isolation layer reaching the silicon substrate from the surface of the N-type epitaxial layer is formed to define a photodiode. In the surface of the photodiode, a rectangular recess is selectively formed toward inside of the N-type epitaxial layer. On the side face of the recess, a silicon oxide layer is formed. In the region surrounded by the silicon oxide layer, a photo absorbing layer and so forth is formed. On the other hand, in an optical waveguide, a LOCOS oxide layer is formed toward inside from the surface of the N-type epitaxial layer. The N-type epitaxial layer is sandwiched between the LOCOS oxide layer and the N.sup.+ type buried layer. The refraction indexes of the LOCOS oxide layer and the N.sup.+ type buried layer are smaller than that of the N-type epitaxial layer. Thus, the N-type epitaxial layer serves as an optical passage to efficiently introduce a light beam into the photo absorbing layer of the photodiode.
摘要:
A fabrication method of a semiconductor device that can realize a semiconductor device having an improved radiation performance of heat together with a low parasitic capacitance between a semiconductor substrate and a conductor of the device. An SOI structure having a single-crystal silicon layer formed on an insulating substructure is prepared and then, device regions are formed on the substructure by using the single-crystal silicon layer. Sidewall insulators are formed to cover side faces of the respective device regions, laterally isolating the device regions from each other. A resistive silicon layer is formed on a non-device region of the substructure. The resistive silicon layer has a resistivity or specific resistance greater than that of the device regions. Electronic elements are formed in the device regions. The resistive silicon layer may be made of polysilicon or single-crystal silicon.
摘要:
An insulating film is provided on a single crystal silicon layer of a SOI substrate, and a first groove for device isolation and a second groove for thickness measurement are formed to expose a surface of a silicon substrate of the SOI substrate. Then, the first and second grooves are filled with a filling film, and the filling film is etched back, so that the first groove is still filled with the filling film, while the filling film which have filled the second groove is removed to expose the surface of the silicon substrate, because the second groove has a width larger than that of the first groove.
摘要:
A method of manufacturing a semiconductor device includes a monocrystalline semiconductor layer of one conductivity type with a first insulating film covering the semiconductor layer. An aperture is selectively formed in the first insulating film to expose a part of the semiconductor layer. A first polycrystalline semiconductor film of an opposite conductivity type is formed on the first insulating film and has an overhang portion projecting over the aperture from an edge of the first insulating film defining the aperture. A second polycrystalline semiconductor film and a monocrystalline semiconductor film of the opposite conductivity type are grown simultaneously on a bottom surface of the overhang portion of the first polycrystalline semiconductor film and on the part of the monocrystalline semiconductor layer respectively until monocrystalline semiconductor film is in contact with the second polycrystalline semiconductor film, with a second insulating film selectively formed on the monocrystalline semiconductor film with leaving a part thereof to be exposed.
摘要:
Provided is a liquid crystal display device includes an optical switching member; a light guide plate made of a thermoplastic material, which includes at least one light introducing portion on at least one side surface thereof; and a light source disposed on the at least one side surface, in which: the at least one light introducing portion includes, in plan view of the light guide plate: a first portion extending from a light incident surface, which is an end surface of the at least one light introducing portion, while keeping a substantially constant width; and a second portion, which extends from the first portion and has a form which widens; and at least the second portion is connected to a front surface of the light guide plate through an inclined surface which is smoothly continuous with the front surface of the light guide plate.