公开(公告)号：US07006541B2

公开(公告)日：2006-02-28

申请号：US10354945

申请日：2003-01-29

Applicant: Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

Inventor： Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

IPC: H01S3/13

CPC classification number: H01S3/225 ,  H01S3/1392

Abstract: A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.

公开(公告)号：US06856638B2

公开(公告)日：2005-02-15

申请号：US10035351

申请日：2001-10-19

Applicant: Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

Inventor： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

IPC: H01S3/081 ,  H01S3/106 ,  H01S3/13 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/0811 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

Abstract translation: 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的放电电路，包括 一对谐振器反射表面，设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元，用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件，其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

公开(公告)号：US06608848B2

公开(公告)日：2003-08-19

申请号：US09849600

申请日：2001-05-04

Applicant: Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

Inventor： Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

IPC: H01S313

CPC classification number: H01S3/1392 ,  H01S3/225

Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

公开(公告)号：US06553050B1

公开(公告)日：2003-04-22

申请号：US10081883

申请日：2002-02-21

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S322

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. The resonator includes an interferometric device, which may be a resonator reflector such as an output coupling interferometer or HR reflector, or a transmissive intracavity component, including a pair of opposing reflecting surfaces tuned to produce a response maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is preferably configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress at least one side band or outer portions of the response maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively, and may be cylindrical, Gaussian or spherical, and the curvature may extend over the entire reflecting surface or diameter of the incident beam. The curved surface may be part of a component that couples with a base optical block at a surface opposing the other reflecting surface, such as by a slot defined in the optical block or using an adhesive.

Abstract translation: 准分子或分子氟激光器包括填充有气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的电源电路，以及包括放电室的谐振器和一对谐振器反射器，用于产生 输出激光束。 谐振器包括干涉仪，其可以是谐振器反射器，例如输出耦合干涉仪或HR反射器，或透射腔内分量，包括一对相对的反射表面，其被调谐以在选定波长处产生响应最大值以使线宽变窄 的输出激光束。 一对相对的反射表面中的一个优选地被配置为使得干涉仪的相对的反射表面在入射光束横截面之间具有变化的光学距离，其用于抑制响应最大值的至少一个边带或外部部分 降低光谱纯度。 优选地，该表面是非平面的，并且可以分别包括高度或深度为四分之一波长的台阶，凹陷或凸起或凹陷的弯曲部分，并且可以是圆柱形，高斯或球形，并且曲率可以延伸超过 入射光束的整个反射面或直径。 弯曲表面可以是组件的一部分，其在与另一个反射表面相对的表面处与基底光学块耦合，例如通过在光学块中限定的狭槽或使用粘合剂。

公开(公告)号：US06792023B1

公开(公告)日：2004-09-14

申请号：US10112660

申请日：2002-03-28

Applicant: Juergen Kleinschmidt ,  Peter Lokai ,  Konstantin Aab

Inventor： Juergen Kleinschmidt ,  Peter Lokai ,  Konstantin Aab

IPC: H01S306

CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

Abstract: An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes, including a pair of main discharge electrodes and at least one preionization electrode, within the laser chamber and connected to a discharge circuit for energizing the gas mixture, and a resonator including a line-narrowing and/or selection module for generating a laser beam at high spectral purity. The line-narrowing module includes one or more line-narrowing and/or selection optics within a sealed module coupled to vacuum equipment through a vacuum port for reducing the pressure within the module,

Abstract translation: 准分子或分子氟激光系统包括填充有至少包含含卤物质和缓冲气体的气体混合物的激光室，在激光室内包括一对主放电电极和至少一个预电离电极的多个电极 并连接到用于激励气体混合物的放电电路，以及包括用于产生高光谱纯度的激光束的线狭窄和/或选择模块的谐振器。 线路变窄模块包括在密封模块内的一个或多个线狭窄和/或选择光学器件，该密封模块通过真空端口耦合到真空设备，用于减小模块内的压力，

公开(公告)号：US06567451B2

公开(公告)日：2003-05-20

申请号：US10098236

申请日：2002-03-15

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S322

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US06516012B2

公开(公告)日：2003-02-04

申请号：US10098258

申请日：2002-03-15

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S313

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US06421365B1

公开(公告)日：2002-07-16

申请号：US09715803

申请日：2000-11-17

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S308

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US5896220A

公开(公告)日：1999-04-20

申请号：US906523

申请日：1997-08-05

Applicant: Uwe Stamm ,  Ingo Klaft ,  Stefan Borneis ,  Vadim Berger ,  Peter Lokai

Inventor： Uwe Stamm ,  Ingo Klaft ,  Stefan Borneis ,  Vadim Berger ,  Peter Lokai

IPC: G02F1/39

CPC classification number: G02F1/39

Abstract: A source of narrow-band coherent radiation has a first optical parametric oscillator (OPO 1) for producing seed radiation, and a second optical parametric oscillator (OPO 2), into which the seed radiation is input after passing through a wavelength-selective element (G). In order to stabilize and adjust the bandwidth of the radiation (14) emitted by the second optical parametric oscillator (OPO 2), radiation of this type is also input into the wavelength-selective element (G) and thereby analyzed, in order, in accordance with the analysis, to adjust the wavelength-selective element or the OPO 2.

Abstract translation: 窄带相干辐射源具有用于产生种子辐射的第一光学参量振荡器（OPO 1）和第二光学参量振荡器（OPO 2），种子辐射在通过波长选择元件之后被输入其中 G）。 为了稳定和调整由第二光参量振荡器（OPO 2）发射的辐射（14）的带宽，这种类型的辐射也被输入到波长选择元件（G）中，从而依次分析 按照分析，调整波长选择元素或OPO 2。

公开(公告)号：US4905243A

公开(公告)日：1990-02-27

申请号：US288428

申请日：1988-12-22

Applicant: Peter Lokai ,  Heribert Rosenkranz

Inventor： Peter Lokai ,  Heribert Rosenkranz

IPC: H01S3/137 ,  H01S3/139 ,  H01S3/225

CPC classification number: H01S3/1392 ,  H01S3/139 ,  H01S3/225

Abstract: For stabilizing the frequency of a narrow-band Excimer laser beam the interference rings of a Fabry-Perot interferometer 16 are projected onto a solid-state image sensor 18 and by means of the solid-state image sensor an electrical signal is generated which is dependent on the frequency of the laser beam. The electrical signal is compared with a stored reference signal to derive an adjusting signal 32 for an optical reflection grating 38 with which the frequency of the laser beam 12 is regulated to a desired value. The absolute value of the frequency of the laser beam 12 is determined by means of the optogalvanic effect.

Abstract translation: 为了稳定窄带准分子激光束的频率，法布里 - 珀罗干涉仪16的干涉环被投影到固态图像传感器18上，并且借助于固态图像传感器，产生依赖的电信号 在激光束的频率上。 将电信号与存储的参考信号进行比较，以导出用于激光束12的频率被调节到期望值的光学反射光栅38的调整信号32。 通过光电效应确定激光束12的频率的绝对值。