公开(公告)号：US07006541B2

公开(公告)日：2006-02-28

申请号：US10354945

申请日：2003-01-29

Applicant: Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

Inventor： Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

IPC: H01S3/13

CPC classification number: H01S3/225 ,  H01S3/1392

Abstract: A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.

公开(公告)号：US06856638B2

公开(公告)日：2005-02-15

申请号：US10035351

申请日：2001-10-19

Applicant: Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

Inventor： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

IPC: H01S3/081 ,  H01S3/106 ,  H01S3/13 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/0811 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

Abstract translation: 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的放电电路，包括 一对谐振器反射表面，设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元，用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件，其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

公开(公告)号：US06553050B1

公开(公告)日：2003-04-22

申请号：US10081883

申请日：2002-02-21

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S322

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. The resonator includes an interferometric device, which may be a resonator reflector such as an output coupling interferometer or HR reflector, or a transmissive intracavity component, including a pair of opposing reflecting surfaces tuned to produce a response maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is preferably configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress at least one side band or outer portions of the response maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively, and may be cylindrical, Gaussian or spherical, and the curvature may extend over the entire reflecting surface or diameter of the incident beam. The curved surface may be part of a component that couples with a base optical block at a surface opposing the other reflecting surface, such as by a slot defined in the optical block or using an adhesive.

Abstract translation: 准分子或分子氟激光器包括填充有气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的电源电路，以及包括放电室的谐振器和一对谐振器反射器，用于产生 输出激光束。 谐振器包括干涉仪，其可以是谐振器反射器，例如输出耦合干涉仪或HR反射器，或透射腔内分量，包括一对相对的反射表面，其被调谐以在选定波长处产生响应最大值以使线宽变窄 的输出激光束。 一对相对的反射表面中的一个优选地被配置为使得干涉仪的相对的反射表面在入射光束横截面之间具有变化的光学距离，其用于抑制响应最大值的至少一个边带或外部部分 降低光谱纯度。 优选地，该表面是非平面的，并且可以分别包括高度或深度为四分之一波长的台阶，凹陷或凸起或凹陷的弯曲部分，并且可以是圆柱形，高斯或球形，并且曲率可以延伸超过 入射光束的整个反射面或直径。 弯曲表面可以是组件的一部分，其在与另一个反射表面相对的表面处与基底光学块耦合，例如通过在光学块中限定的狭槽或使用粘合剂。

公开(公告)号：US06717973B2

公开(公告)日：2004-04-06

申请号：US09883097

申请日：2001-06-13

Applicant: Dirk Basting ,  Sergei Govorkov ,  Juergen Kleinschmidt ,  Peter Lokai ,  Uwe Stamm

Inventor： Dirk Basting ,  Sergei Govorkov ,  Juergen Kleinschmidt ,  Peter Lokai ,  Uwe Stamm

IPC: H01S320

CPC classification number: H01S3/225 ,  B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/4257 ,  G03F7/70025 ,  G03F7/70558 ,  G03F7/70808 ,  H01S3/0014 ,  H01S3/0315 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/1062 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2258

Abstract: A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.

Abstract translation: F2激光器包括填充有包括分子氟的气体混合物的放电室，用于在包括初级线和次级线的157nm和158nm之间的波长范围内产生光谱发射，多个电极与用于生产的电源电路 用于激发分子氟的脉冲放电，包括放电室的谐振器和用于产生具有小于1ms的带宽的激光束的干涉仪，以及耦合在反馈环路中的波长监测器，用于监测光谱分布 的激光束。 处理器基于监测的光谱分布来控制干涉测量装置的干涉光谱，使得光谱分布内的边带基本上最小化。

公开(公告)号：US06792023B1

公开(公告)日：2004-09-14

申请号：US10112660

申请日：2002-03-28

Applicant: Juergen Kleinschmidt ,  Peter Lokai ,  Konstantin Aab

Inventor： Juergen Kleinschmidt ,  Peter Lokai ,  Konstantin Aab

IPC: H01S306

CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

Abstract: An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes, including a pair of main discharge electrodes and at least one preionization electrode, within the laser chamber and connected to a discharge circuit for energizing the gas mixture, and a resonator including a line-narrowing and/or selection module for generating a laser beam at high spectral purity. The line-narrowing module includes one or more line-narrowing and/or selection optics within a sealed module coupled to vacuum equipment through a vacuum port for reducing the pressure within the module,

Abstract translation: 准分子或分子氟激光系统包括填充有至少包含含卤物质和缓冲气体的气体混合物的激光室，在激光室内包括一对主放电电极和至少一个预电离电极的多个电极 并连接到用于激励气体混合物的放电电路，以及包括用于产生高光谱纯度的激光束的线狭窄和/或选择模块的谐振器。 线路变窄模块包括在密封模块内的一个或多个线狭窄和/或选择光学器件，该密封模块通过真空端口耦合到真空设备，用于减小模块内的压力，

公开(公告)号：US06567451B2

公开(公告)日：2003-05-20

申请号：US10098236

申请日：2002-03-15

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S322

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US06516012B2

公开(公告)日：2003-02-04

申请号：US10098258

申请日：2002-03-15

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S313

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US06421365B1

公开(公告)日：2002-07-16

申请号：US09715803

申请日：2000-11-17

Applicant: Juergen Kleinschmidt ,  Peter Lokai

Inventor： Juergen Kleinschmidt ,  Peter Lokai

IPC: H01S308

CPC classification number: H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

公开(公告)号：US06608848B2

公开(公告)日：2003-08-19

申请号：US09849600

申请日：2001-05-04

Applicant: Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

Inventor： Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

IPC: H01S313

CPC classification number: H01S3/1392 ,  H01S3/225

Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

公开(公告)号：US06272158B1

公开(公告)日：2001-08-07

申请号：US09679592

申请日：2000-10-04

Applicant: Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

Inventor： Jürgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

IPC: H01S313

CPC classification number: H01S3/1392 ,  H01S3/225

Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

Abstract translation: 波长校准系统确定准分子或分子激光系统的窄谱分光发射带的绝对波长。 该系统包括模块，该模块包括与激光系统的可变范围内的变窄带周围的激光输出光束的分量光学相互作用的元件。 通过监测模块内的电压变化来检测层间谐振，或者通过光电检测设备检测光吸收。 当发生光学转变并被检测时，窄带的绝对波长可以精确地确定。 当该系统具体包括ArF-准分子激光室时，该模块优选地是含有吸光约193nm的元素的加合加速器，该元件优选为选自砷，碳，氧，铁 ，气态烃，卤化烃，碳污染的惰性气体，锗和铂蒸气。 当该系统具体包括F2激光室时，该模块优选为含有吸收约157nm的元素的加合加速器，该元件优选为选自硒，溴和硅的气体或蒸汽。 该模块可选地是可配置为用光吸收气体吹扫的净化室。