Anodically bonded cell, method for making same and systems incorporating same
    1.
    发明申请
    Anodically bonded cell, method for making same and systems incorporating same 有权
    阳离子型电池,制造方法及其结合体系

    公开(公告)号:US20050184815A1

    公开(公告)日:2005-08-25

    申请号:US11030009

    申请日:2005-01-05

    IPC分类号: H01J25/50

    CPC分类号: G04F5/14

    摘要: A cell suitable for use with an atomic clock and a method for making the same, the cell including: a silicon wafer having a recess formed therein; at least one amorphous silicate member having an ion mobility and temperature expansion coefficient approximately that of silicon sealing the recess; and, an alkali metal containing component and buffer gas contained in the recess. The method includes: providing a silicon wafer; forming a cavity through the silicon wafer; introducing an alkali metal containing component and buffer gas into the cavity; and, anodically bonding at least one amorphous silicate member having an ion mobility and temperature expansion coefficient approximately that of silicon to the wafer to close the cavity.

    摘要翻译: 适用于原子钟的电池及其制造方法,所述电池包括:形成有凹部的硅晶片; 至少一种无定形硅酸盐部件,其离子迁移率和温度膨胀系数近似于密封凹部的硅的非晶硅酸盐部件; 以及包含在所述凹部中的含碱金属成分和缓冲气体。 该方法包括:提供硅晶片; 通过硅晶片形成空腔; 将含碱金属的组分和缓冲气体引入所述空腔中; 并且将具有大约硅的离子迁移率和温度膨胀系数的至少一种无定形硅酸盐构件阳极结合到晶片上以封闭空腔。

    Low voltage defect super high efficiency diode sources
    4.
    发明申请
    Low voltage defect super high efficiency diode sources 审中-公开
    低电压缺陷超高效二极管源

    公开(公告)号:US20050152424A1

    公开(公告)日:2005-07-14

    申请号:US10922795

    申请日:2004-08-20

    摘要: A high efficiency, low voltage defect laser, and a method of forming a high efficiency laser. The low voltage defect laser includes at least one p-clad layer, at least one n-clad layer, and at least one waveguide of at least a plurality of quantum wells. The at least one waveguide is sandwiched at least between the p-clad layer and the n-clad layer, and at least one permeable crystal layer may be embedded in the p-clad layer and immediately adjacent to the at least one waveguide. The method includes growing an AlGaAs layer atop a GaAs layer, etching of the AlGaAs into submicron structure, oxidizing the AlGaAs, SAG undoped growing of an SAG undoped GaAs atop the GaAs layer, and regrowing, with p++ doped GaAs, of a planar-buried p++ GaAs.

    摘要翻译: 一种高效率,低电压缺陷激光器和形成高效激光器的方法。 所述低电压缺陷激光器包括至少一个p覆盖层,至少一个n覆层和至少多个量子阱的至少一个波导。 所述至少一个波导至少夹在所述p覆盖层和所述n覆层之间,并且至少一个可透过的晶体层可以嵌入所述p覆盖层中并且紧邻所述至少一个波导。 该方法包括在GaAs层之上生长AlGaAs层,将AlGaAs蚀刻成亚微米结构,在GaAs层顶上氧化AlGaAs,SAG未掺杂的GaAs的SAG未掺杂生长,并用p + >掺杂GaAs,一个平面埋置的p ++ GaAs。