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公开(公告)号：US20190271631A1
公开(公告)日：2019-09-05
申请号：US16414989
申请日：2019-05-17
申请人： RAVE LLC
发明人： Tod Evan Robinson , Bernabe Arruza , Kenneth Gilbert Roessler , David Brinkley , Jeffrey E. LeClaire
摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
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公开(公告)号：US20160170297A1
公开(公告)日：2016-06-16
申请号：US15048774
申请日：2016-02-19
申请人： RAVE LLC
CPC分类号： G03F1/82 , B08B7/0042 , G03F1/72 , Y10S134/902
摘要： A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.
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公开(公告)号：US20160158807A1
公开(公告)日：2016-06-09
申请号：US15011411
申请日：2016-01-29
申请人： RAVE, LLC
发明人： TOD ROBINSON
IPC分类号： B08B1/00
CPC分类号： B08B1/001 , B03C7/006 , B08B1/00 , B08B7/0028 , G03F1/82 , G03F7/70925
摘要： A system for removing debris from a surface of a substrate, the system including a cantilever arm and a tip supported by the cantilever arm. The tip has a proximal portion and a distal portion such that the tip is supported by the cantilever arm via the proximal portion. The system further includes at least one nanofibril attached to the distal portion of the tip, and the at least one nanofibril is configured to elastically deform against or around the debris or the surface of the substrate.
摘要翻译： 一种用于从基板的表面去除碎屑的系统，该系统包括悬臂和由悬臂支撑的尖端。 尖端具有近端部分和远端部分，使得尖端经由近端部分由悬臂臂支撑。 该系统还包括至少一个附着到尖端的远端部分的纳米纤维，并且所述至少一个纳米纤维构造成抵抗或围绕所述碎片或所述基底表面弹性变形。
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公开(公告)号：US08741067B2
公开(公告)日：2014-06-03
申请号：US14077028
申请日：2013-11-11
申请人： Rave, LLC
IPC分类号： B08B7/00
CPC分类号： B08B7/0042 , G03F1/82 , Y10S134/902
摘要： Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.
摘要翻译： 公开了用于清洁光掩模的表面并增加光掩模的可用寿命的方法。 一种方法包括使用光掩模的第一晶片印刷处理和设置在光掩模上的防护薄膜，并清洁光掩模。 清洁光掩模包括将激光束引导通过防护薄膜到光掩模，激光束具有基本上等于光掩模的吸收光谱的局部最大值的波长，用激光束加热光掩模，并将热量从 将光掩模施加到设置在光掩模上的污染物，从而热分解污染物。
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公开(公告)号：US20140130215A1
公开(公告)日：2014-05-08
申请号：US13671133
申请日：2012-11-07
申请人： RAVE, LLC
发明人： David Brinkley , Roy L. White
摘要： The present invention discloses a method of fabricating a scanning probe microscopy probe including positioning a pattern probe over a mold substrate; indenting the pattern probe into the mold substrate material to form a mold pit; depositing a film onto the mold substrate including the mold pit; removing a portion of the deposited film to form a probe, and releasing the probe from the mold substrate material.
摘要翻译： 本发明公开了一种制造扫描探针显微镜探针的方法，包括在模具基底上定位图案探针; 将图案探针压入模具基底材料中以形成模具凹坑; 在包括模具凹坑的模具基板上沉积膜; 去除沉积膜的一部分以形成探针，并将探针从模具基底材料上释放出来。
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公开(公告)号：US20130037053A1
公开(公告)日：2013-02-14
申请号：US13652114
申请日：2012-10-15
申请人： Rave, LLC
CPC分类号： G03F7/70925 , B03C7/006 , B08B1/00 , B08B7/0028 , G03F1/72 , G03F1/82
摘要： A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
摘要翻译： 提供了用于从光刻掩模的表面去除碎屑的系统。 该系统包括具有由悬臂支撑的尖端的原子力显微镜。 尖端包括设置在其上的表面和纳米级涂层。 涂层的表面能低于光刻掩模的表面能。
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公开(公告)号：US10330581B2
公开(公告)日：2019-06-25
申请号：US15160302
申请日：2016-05-20
申请人： RAVE LLC
发明人： Tod Evan Robinson , Bernabe J. Arruza , Kenneth Gilbert Roessler , David Brinkley , Jeffrey E. Leclaire
IPC分类号： B08B6/00 , B08B7/00 , B08B9/087 , G01N15/14 , G01N15/10 , B08B1/00 , G03F7/20 , G03F1/82 , G03F1/84 , G03F7/00 , G01Q80/00 , G01Q20/02 , G01Q60/42 , G01Q70/12
摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
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公开(公告)号：US09958771B2
公开(公告)日：2018-05-01
申请号：US15190793
申请日：2016-06-23
申请人： Rave LLC
CPC分类号： G03F1/64 , G03F7/70983
摘要： A method and apparatus for removing a pellicle from a photomask wherein the adhesive between the pellicle frame and photomask is cooled sufficiently to allow the adhesive property of the adhesive to diminish to the point where the adhesive will release from the photomask with little or no mechanical force and leaving minimal adhesive on the photomask. The adhesive is cooled by way of manifolds containing coolant being brought in contact with the pellicle frame or by way of a coolant spray nozzles spraying coolant directly onto the pellicle frame.
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公开(公告)号：US20170189945A1
公开(公告)日：2017-07-06
申请号：US15400143
申请日：2017-01-06
申请人： RAVE LLC
CPC分类号： B08B7/0042 , G03F1/82 , G03F1/84 , Y10S134/902
摘要： Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.
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公开(公告)号：US20160266165A1
公开(公告)日：2016-09-15
申请号：US15160302
申请日：2016-05-20
申请人： RAVE LLC
发明人： TOD EVAN ROBINSON , BERNABE J. ARRUZA , KENNETH GILBERT ROESSLER , DAVID BRINKLEY , JEFFREY E. LECLAIRE
CPC分类号： G01N15/14 , B08B1/00 , B08B1/001 , B08B7/0028 , G01N15/1056 , G01Q20/02 , G01Q60/42 , G01Q70/12 , G01Q80/00 , G03F1/82 , G03F1/84 , G03F7/0002 , G03F7/70925
摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
摘要翻译： 用于收集和分析来自纳米加工过程中使用的尖端的碎片的碎片收集和计量系统，该系统包括辐射源，照射检测器，致动器和控制器。 照射源可操作以将入射照射引导到尖端，并且照射检测器可操作以接收来自尖端的样品照射，由于直接入射照射被施加到尖端上而产生样品照射。 控制器可操作地耦合到致动器系统和照射检测器，并且控制器可操作以基于照射检测器对样品照射的第一响应接收第一信号，并且控制器可操作以实现尖端之间的相对运动 以及基于第一信号的照射源和照射检测器中的至少一个。
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