公开(公告)号：US20100237243A1

公开(公告)日：2010-09-23

申请号：US12789070

申请日：2010-05-27

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/22

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

公开(公告)号：US20090152595A1

公开(公告)日：2009-06-18

申请号：US12066470

申请日：2006-09-08

申请人： Toru Kaga ,  Yoshihiko Naito ,  Masatoshi Tsuneoka ,  Kenji Terao ,  Nobuharu Noji ,  Ryo Tajima

发明人： Toru Kaga ,  Yoshihiko Naito ,  Masatoshi Tsuneoka ,  Kenji Terao ,  Nobuharu Noji ,  Ryo Tajima

IPC分类号： H01L23/522 ,  G01R31/302

CPC分类号： G01R31/307 ,  G01R31/2884 ,  G11C29/02 ,  G11C29/025

摘要： There are provided a semiconductor device having a pattern which allows electric failures to be sensitively detected at high speeds, and a method of testing the same. In one embodiment, the semiconductor device comprises a pair of row wires including a plurality of first wires arranged in a first layer at predetermined intervals in a row direction, where the first wires have ends connected to second wires arranged in a second layer at a predetermined intervals through vias, and the first wire and second wire are at the same potential. In the pair of row wires, a first wire positioned at a right end of one row wire is connected to a first conductor, and a first wire positioned at a left end in the other row wire is connected to a second conductor. By sequentially scanning the first conductor and second conductor using an electron beam, a change in the amount of emitted secondary electrons due to a difference in potential between these conductors is detected to detect electric anomalies.

摘要翻译： 提供了具有能够高速灵敏地检测电故障的图案的半导体器件及其测试方法。 在一个实施例中，半导体器件包括一对行导线，其包括以行方向以预定间隔布置在第一层中的多个第一布线，其中第一布线具有以预定的方式连接到布置在第二层中的第二布线 通过通孔的间隔，并且第一线和第二线处于相同的电位。 在一对行配线中，位于一列行的右端的第一配线与第一导体连接，位于另一行配线左端的第一配线与第二导体连接。 通过使用电子束顺序扫描第一导体和第二导体，检测由于这些导体之间的电位差引起的发射二次电子量的变化，以检测电气异常。

公开(公告)号：US20070119357A1

公开(公告)日：2007-05-31

申请号：US11564421

申请日：2006-11-29

申请人： Ryo TAJIMA

发明人： Ryo TAJIMA

IPC分类号： D05B3/12

CPC分类号： D05C7/08

摘要： Sewing machine includes a plurality of machine heads, and at least one sequin feeder apparatus provided for each of the machine heads. The sequin feeder apparatus of a desired number of machine heads of the plurality of machine heads are grouped into a group, and a sequin feed pitch is variably set independently for each of the grouped sequin feeder apparatus in that group. Such an arrangement allows sequins of different sizes (different feed pitches) to be set on all of the sequin feeder apparatus in the group. If the plurality of machine heads are controlled on a group-by-group basis in order to sew a sequin-contained embroidery pattern, it is possible to increase the variety of sizes of sequins that can be used in the embroidery pattern.

摘要翻译： 缝纫机包括多个机头，以及为每个机头提供的至少一个亮片馈送装置。 将多个机头的期望数量的机头的金片馈送装置分组成一组，并且对于该组中的每个分组的亮片馈送装置，独立地可变地设置亮片馈送节距。 这种布置允许在组中的所有亮片馈送装置上设置不同尺寸的亮片（不同的馈送间距）。 如果为了缝制含有亮片的刺绣图案，以组为单位对多个机头进行控制，则可以增加绣花图案中可以使用的亮片的尺寸的种类。

公开(公告)号：US08013315B2

公开(公告)日：2011-09-06

申请号：US11898358

申请日：2007-09-11

申请人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

发明人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

IPC分类号： G21K5/10

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/153 ,  H01J37/29 ,  H01J2237/0047 ,  H01J2237/1532 ,  H01J2237/216

摘要： A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focal estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.

摘要翻译： 一种带电粒子束装置300，用于通过向样本W施加带电粒子束以检测从样本发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样本W.包括用于调节像散的散光的散光调节装置 带电粒子束。 散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的焦点估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴 带电粒子束在中心。 还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

公开(公告)号：US07365324B2

公开(公告)日：2008-04-29

申请号：US11378465

申请日：2006-03-20

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G21K7/00 ,  G21N23/99 ,  G01N23/225 ,  H01J37/28

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US07138629B2

公开(公告)日：2006-11-21

申请号：US10754623

申请日：2004-01-12

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G21K7/00 ,  G21N23/99 ,  H01J37/28 ,  G01N23/225

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US20120234224A1

公开(公告)日：2012-09-20

申请号：US13422233

申请日：2012-03-16

申请人： Ryo TAJIMA

发明人： Ryo TAJIMA

IPC分类号： D05B19/12 ,  D05C5/02

CPC分类号： D05C9/22 ,  D05C5/04 ,  D05C9/06

摘要： Pattern data of an embroidery pattern includes data of given points for defining plural positions associated with the embroidery pattern as reference positions for pre-movement of the embroidery frame and distance data that indicates respective distances between the respective given points and a predetermined starting point. Before embroidering or trace is started, any one of the given points is specified or selected, and the embroidery frame is moved to the reference position associated with the selected given point through manual operation of a switch. When the embroidering or the trace starts, the embroidery frame is automatically moved from the selected reference position to a position corresponding to the starting point of the embroidery pattern on the basis of the distance data between the specified given point and the starting point, and then the embroidering or the trace is started from the position corresponding to the starting point.

摘要翻译： 刺绣图案的图案数据包括用于定义与绣花图案相关联的多个位置的给定点的数据，作为用于刺绣框的预先移动的参考位置和指示各个给定点之间的相应距离和预定起点的距离数据。 在绣花或跟踪开始之前，指定或选择给定点中的任何一个，并且通过手动操作开关将绣花框移动到与选定给定点相关联的参考位置。 当刺绣或痕迹开始时，根据指定给定点和起始点之间的距离数据，绣花框自动从选定的参考位置移动到与刺绣图案的起始点对应的位置，然后 从对应于起点的位置开始绣花或跟踪。

公开(公告)号：US08256362B2

公开(公告)日：2012-09-04

申请号：US12134512

申请日：2008-06-06

申请人： Ryo Tajima ,  Shoji Kato

发明人： Ryo Tajima ,  Shoji Kato

IPC分类号： D05B21/00

CPC分类号： D05C11/06 ,  D05B3/02 ,  D05B19/14 ,  D05C7/06

摘要： First calculation section calculates, on the basis of sewing data, a sewing-progressing direction angle for rotating a rotary cylinder to orient an embroidering material, guided by a guide lever of a zigzag sewing head, in a sewing-progressing direction. Second calculation section adds or subtracts a zigzag-swinging angle to or from the sewing-progressing direction angle to thereby calculate a target rotational angle of the rotary cylinder. Swinging mechanism may be provided for swinging the guide lever relative to the rotary cylinder, and a swinging amount corresponding to the swinging angle of the rotary cylinder may be added to a width of zigzag-swinging by the swinging mechanism. Alternatively, every swinging movement necessary for zigzagging the embroidering material may be set by the swinging angle without the guide lever being caused to swing relative to the rotary cylinder.

摘要翻译： 第一计算部根据缝制数据，计算用于旋转滚筒的缝纫进给方向角度，以使由Zigzag缝纫头的引导杆引导的刺绣材料在缝制进给方向上定向。 第二计算部对缝制进给方向角度加上或减去锯齿形摆动角度，由此算出旋转圆筒的目标旋转角度。 可以设置摆动机构，用于使引导杆相对于旋转圆筒摆动，并且可以通过摆动机构将与旋转圆筒的摆动角度相对应的摆动量加到锯齿形摆动的宽度上。 或者，可以通过摆动角度来设定锯齿刺绣材料所需的每个摆动运动，而不会使导向杆相对于旋转圆筒摆动。

公开(公告)号：US07934461B2

公开(公告)日：2011-05-03

申请号：US11564421

申请日：2006-11-29

申请人： Ryo Tajima

发明人： Ryo Tajima

IPC分类号： D05B3/12 ,  G06F7/00

CPC分类号： D05C7/08

摘要： Sewing machine includes a plurality of machine heads, and at least one sequin feeder apparatus provided for each of the machine heads. The sequin feeder apparatus of a desired number of machine heads of the plurality of machine heads are grouped into a group, and a sequin feed pitch is variably set independently for each of the grouped sequin feeder apparatus in that group. Such an arrangement allows sequins of different sizes (different feed pitches) to be set on all of the sequin feeder apparatus in the group. If the plurality of machine heads are controlled on a group-by-group basis in order to sew a sequin-contained embroidery pattern, it is possible to increase the variety of sizes of sequins that can be used in the embroidery pattern.

摘要翻译： 缝纫机包括多个机头，以及为每个机头提供的至少一个亮片馈送装置。 将多个机头的期望数量的机头的金片馈送装置分组成一组，并且对于该组中的每个分组的亮片馈送装置，独立地可变地设置亮片馈送节距。 这种布置允许在组中的所有亮片馈送装置上设置不同尺寸的亮片（不同的馈送间距）。 如果为了缝制含有亮片的刺绣图案，以组为单位对多个机头进行控制，则可以增加绣花图案中可以使用的亮片的尺寸的种类。

公开(公告)号：US07741601B2

公开(公告)日：2010-06-22

申请号：US12073892

申请日：2008-03-11

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/225 ,  G01N23/00 ,  A61N5/00

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25·1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 从样品W发射的电子被检测器25·11检测。