摘要:
There is provided an encapsulant material for solar cells which facilitates production of a solar cell module and is excellent in flexibility, heat resistance, transparency, etc., and a solar cell module produced using the encapsulant material. The present invention relates to an encapsulant material for solar cells which includes a resin composition (C) containing an ethylene-α-olefin random copolymer (A) capable of satisfying the following condition (a) and an ethylene-α-olefin block copolymer (B) capable of satisfying the following condition (b): (a) a heat of crystal fusion is from 0 to 70 J/g as measured in differential scanning calorimetry at a heating rate of 10° C./min; and (b) a crystal fusion peak temperature is 100° C. or higher and a heat of crystal fusion is from 5 to 70 J/g as measured in differential scanning calorimetry at a heating rate of 10° C./min.
摘要:
Provided is a cover film for solar cells, with which solar cell modules are easy to produce, which comprises an encapsulant resin layer excellent in softness, transparency and heat resistance, and a weather-resistant layer excellent in weather resistance, moisture proofness, transparency and heat resistance and having high adhesiveness to the encapsulant resin layer, and is therefore excellent in handleability, and which is effective for reducing the weight of solar cell modules and for enhancing the impact resistance and the durability thereof; and also provided is a solar cell module produced by the use of the cover film for solar cells. Disclosed is production of a cover film for solar cells by laminating weather-resistant layer or a surface protective layer, and an encapsulant resin layer comprising a resin composition that contains an ethylene-a-olefin random copolymer and an ethylene-α-olefin block copolymer both having specific thermal properties.
摘要:
A semiconductor device has a semiconductor substrate, a multi-layered wiring construction formed over the semiconductor device, and a metal-insulator-metal (MIM) capacitor arrangement established in the multi-layered wiring construction. The MIM capacitor arrangement includes first, second, third, fourth, fifth, and sixth electrode structures, which are arranged in order in parallel with each other at regular intervals. The first, second, fifth and sixth electrode structures are electrically connected to each other so as to define a first capacitor, and the third and fourth electrode structures are electrically connected to each other so as to define a second capacitor.
摘要:
Disclosed are an inductor for a semiconductor integrated circuit, which provides a wider cross-sectional area, significantly reduces the resistance to improve the Q value and has a highly uniform film thickness, and a method of fabricating the inductor. A spiral inductor is formed on a topmost interconnection layer of a multilayer interconnection layer formed by a damascene method. This inductor is formed by patterning a barrier metal layer on an insulation film, on which a topmost interconnection is formed, in such a way that the barrier metal layer contacts the topmost interconnection, then forming a protective insulation film on an entire surface of the barrier metal layer, forming an opening in that portion of the protective insulation film which lies over the barrier metal layer, forming a thick Cu film with the barrier metal layer serving as a plating electrode, and performing wet etching of the Cu film. This process can allow the inductor to be so formed as to be thick and have a wide line width.
摘要:
On a silicon substrate, a first insulation layer, a lower conductive layer, a capacitor-insulator layer, and an upper conductive layer are formed in that order. Then, a first resist pattern is formed, the upper conductive layer is etched to form an upper electrode, and the capacitor-insulator layer is successively etched partway under the same etching condition as that of the upper conductive layer. Next, second resist pattern is formed, the remaining part of the capacitor-insulator layer is etched to form a second insulation layer, and the lower conductive layer is successively etched under the same etching condition as that of the capacitor-insulator layer so as to form a lower electrode and a lower wiring. In this manner, an MiM capacitor element constituted by the upper electrode, a part of the second insulation layer, and the lower electrode can be fabricated.
摘要:
Electrically conductive layers 1a and 2a connected to each other via a contact form one inductor, while electrically conductive layers 1b and 2b connected to each other via other contact form the other inductor. Since the areas defined by the loops forming these two inductors are equal to each other, the inductances of the inductors are also equal to each other. Between both the inductors, the lengths in the loop of the portions (the conductive layers 1a and 1b) formed on a lower interlayer insulating film are equal to each other, while the lengths in the loop of the portions (the conductive layers 2a and 2b) formed on an upper interlayer insulating film are also equal to each other. This allows external disturbances such as parasitic capacitance to affect both the inductors equally. Accordingly, a voltage controlled oscillator incorporating the invention can stably provide undistorted sinusoidal oscillation signals.
摘要:
A Phase-Locked Loop (PLL) circuit includes a voltage-controlled oscillator. The voltage-controlled oscillator includes a voltage-current conversion circuit and a current-controlled oscillation circuit. The voltage-current conversion circuit includes an input transistor having a gate terminal connecting a control voltage, a first transistor connected in series to the input transistor, a second transistor connected as a current-mirror to the first transistor, to generate a control current, and a current source connected in parallel to the first transistor. The current-controlled oscillation circuit oscillates at a frequency according to the control current.
摘要:
According to one aspect of the present invention, there is provided a voltage controlled oscillator controlling frequency of an output signal according to input voltage, the voltage controlled oscillator including a current controlled oscillator setting the frequency of the output signal based on control current, and a voltage-current converter including a transistor controlling a current amount of the control current according to the input voltage, in which the voltage-current converter is supplied with control voltage, and threshold value voltage of the transistor is controlled according to the control voltage.
摘要:
An object is to increase the amount of substrate noise absorbed in a guard ring, and to prevent a malfunction caused by the substrate noise in a semiconductor device including an SOI substrate provided with the guard ring. Then, there is provided a semiconductor device, including: an SOI substrate in which a support substrate 10, an insulating layer 11, and an SOI layer 12 are stacked one by one; an element section 4 provided in one region of the SOI substrate; and a guard ring region 8 provided around the element section 4 of the SOI substrate, wherein a first diffusion layer 15 provided in the SOI layer 12 of the element section 4, and a second diffusion layer 26 provided in the SOI layer 12 of the guard ring region 8 are electrically connected to each other.
摘要:
An insulating film is provided in a region surrounding a circuit region on a p type silicon substrate, and a frame-shaped electrode is provided to surround the circuit region on the insulating film. The region directly under the electrode at the surface of the p type silicon substrate is formed as a non-doped region with no impurity implanted. Then, a positive power supply potential is applied to the electrode. In this way, a depletion layer is formed directly under the electrode at the surface of the p type silicon substrate. Consequently, the substrate noise is shielded.