公开(公告)号：US5210431A

公开(公告)日：1993-05-11

申请号：US831651

申请日：1992-02-07

申请人： Tunenobu Kimoto ,  Tadashi Tomikawa ,  Shoji Nakagama ,  Masayuki Ishii ,  Nobuhiko Fujita

发明人： Tunenobu Kimoto ,  Tadashi Tomikawa ,  Shoji Nakagama ,  Masayuki Ishii ,  Nobuhiko Fujita

IPC分类号： H01L21/04 ,  H01L29/16 ,  H01L29/45

CPC分类号： H01L29/1602 ,  H01L21/043 ,  H01L29/45

摘要： In an ohmic contact electrode for the p-type semiconductor diamond, the electrode is formed of metals or metallic compounds containing boron on a p-type semiconductor diamond, so as to obtain a decreased contact resistance.

摘要翻译： 在用于p型半导体金刚石的欧姆接触电极中，电极由在p型半导体金刚石上含有硼的金属或金属化合物形成，以获得降低的接触电阻。

公开(公告)号：US20110127077A1

公开(公告)日：2011-06-02

申请号：US13025581

申请日：2011-02-11

申请人： Maw Soe WIN ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

发明人： Maw Soe WIN ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

IPC分类号： H05K1/00 ,  C08K5/101 ,  C08K5/3492 ,  C08K5/5399 ,  C08K5/3475 ,  C08L79/08 ,  B05D5/00

CPC分类号： C09D11/102 ,  H05K3/28 ,  H05K2201/0154 ,  H05K2203/0783

摘要： The object is to provide a polyimide ink composition having good printing properties and good continuous priming properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof, the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight.

摘要翻译： 本发明的目的是提供具有良好的印刷性能和良好的连续起始性能的聚酰亚胺油墨组合物，该组合物可以在不高于220℃的低温下干燥，并且该组合物在干燥后得到涂膜，具有 优异的尺寸稳定性，耐热性，低弹性模量，柔软性，抗翘曲性，耐化学性，与基材的粘合性和耐电镀性。 该目的通过用于印刷的聚酰亚胺油墨组合物实现，其包含含有苯甲酸酯溶剂和甘醇二甲醚溶剂的混合溶剂和可溶于混合溶剂的聚酰亚胺; 其中所述聚酰亚胺是通过将聚酰亚胺低聚物与其分子骨架中不含硅氧烷键的四羧酸二酐组分和/或二胺组分缩聚得到的，所述聚酰亚胺低聚物是通过使四羧酸二酐组分缩聚而制备的， 和在其基础催化剂存在下的分子骨架中具有硅氧烷键的二胺组分或包含内酯和/或酸性化合物和碱的混合催化剂， ; 基于总二胺成分的具有硅氧烷键的二胺成分的含量为15〜85重量％。

公开(公告)号：US20080275181A1

公开(公告)日：2008-11-06

申请号：US11597694

申请日：2005-05-24

申请人： Maw Soe Win ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

发明人： Maw Soe Win ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

IPC分类号： C08G73/10

CPC分类号： C09D11/102 ,  H05K3/28 ,  H05K2201/0154 ,  H05K2203/0783

摘要： The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight.

摘要翻译： 本发明的目的是提供具有良好的印刷性能和良好的连续印刷性能的聚酰亚胺油墨组合物，该组合物可以在不高于220℃的低温下干燥，并且该组合物在干燥后得到涂膜， 优异的尺寸稳定性，耐热性，低弹性模量，柔软性，抗翘曲性，耐化学性，与基材的粘合性和耐电镀性。 该目的通过用于印刷的聚酰亚胺油墨组合物实现，其包含含有苯甲酸酯溶剂和甘醇二甲醚溶剂的混合溶剂和可溶于混合溶剂的聚酰亚胺; 其中所述聚酰亚胺通过聚酰亚胺低聚物与其分子骨架中不具有硅氧烷键的四羧酸二酐组分和/或二胺组分缩聚得到，所述聚酰亚胺低聚物是通过将四羧酸二酐组分和 在基础催化剂或含有内酯和/或酸性化合物和碱的混合催化剂存在下，在其分子骨架上具有硅氧烷键的二胺组分; 基于总二胺成分的具有硅氧烷键的二胺成分的含量为15〜85重量％。

公开(公告)号：US20090229870A1

公开(公告)日：2009-09-17

申请号：US12470399

申请日：2009-05-21

申请人： Maw Soe Win ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

发明人： Maw Soe Win ,  Toshiyuki Goshima ,  Eika Kyo ,  Shintaro Nakajima ,  Noriki Hayashi ,  Tohru Kashiwagi ,  Kenji Miyazaki ,  Katsuya Yamada ,  Naoyuki Yamabayashi ,  Shoji Nakagama ,  Hiroshi Okuyama ,  Fumio Kasabo ,  Ippei Tanaka

IPC分类号： H05K1/00 ,  C09D131/06 ,  B05D5/00

CPC分类号： C09D11/102 ,  H05K3/28 ,  H05K2201/0154 ,  H05K2203/0783

摘要： The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof, the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight.

摘要翻译： 本发明的目的是提供具有良好的印刷性能和良好的连续印刷性能的聚酰亚胺油墨组合物，该组合物可以在不高于220℃的低温下干燥，并且该组合物在干燥后得到涂膜， 优异的尺寸稳定性，耐热性，低弹性模量，柔软性，抗翘曲性，耐化学性，与基材的粘合性和耐电镀性。 该目的通过用于印刷的聚酰亚胺油墨组合物实现，其包含含有苯甲酸酯溶剂和甘醇二甲醚溶剂的混合溶剂和可溶于混合溶剂的聚酰亚胺; 其中所述聚酰亚胺是通过将聚酰亚胺低聚物与其分子骨架中不含硅氧烷键的四羧酸二酐组分和/或二胺组分缩聚得到的，所述聚酰亚胺低聚物是通过使四羧酸二酐组分缩聚而制备的， 和在其基础催化剂存在下的分子骨架中具有硅氧烷键的二胺组分或包含内酯和/或酸性化合物和碱的混合催化剂， ; 基于总二胺成分的具有硅氧烷键的二胺成分的含量为15〜85重量％。

公开(公告)号：US5075757A

公开(公告)日：1991-12-24

申请号：US556722

申请日：1990-07-25

申请人： Masayuki Ishii ,  Tunenobu Kimoto ,  Shoji Nakagama ,  Tadashi Tomikawa ,  Nobuhiko Fujita

发明人： Masayuki Ishii ,  Tunenobu Kimoto ,  Shoji Nakagama ,  Tadashi Tomikawa ,  Nobuhiko Fujita

IPC分类号： H01L29/78 ,  H01L21/04 ,  H01L21/203 ,  H01L21/205 ,  H01L21/28 ,  H01L21/337 ,  H01L29/43 ,  H01L29/45 ,  H01L29/808 ,  H01L33/16 ,  H01L33/34 ,  H01L33/40

CPC分类号： H01L21/043 ,  H01L29/45

摘要： As electrodes for the semiconductor diamond, the p.sup.+ or n.sup.+ polycrystalline silicon film or amorphous silicon film including microcrystalline silicon phase is formed on the semiconductor diamond, whereby an ohmic contact electrode with low contact resistance can be made.