摘要:
A multicharged ions generating source that is easy to manufacture, excellent in controllability and maintainability, high in degree of ionization and large in beam intensity and a charged particle beam apparatus using the same are disclosed. The multicharged ions generating source includes an ion source electrode (3) comprising an electron source (4), a drift tube (5) that constitutes an ion trapping region and a collector (6), a superconducting magnet (11) for ion entrapment, an ion infeed means (20, 22), a first vacuum chamber (2) receiving the ion source electrode (3), a second vacuum chamber (10) receiving the superconducting magnet (11), and a vacuum pumping unit (15, 16) provided for each of the first and second vacuum chambers. The first and the second vacuum chambers (2) and (10) are made removable from each other, and only the ion source electrode (3) to be held at extremely high vacuum can be baked for degassing.
摘要:
A surface analyzer 1 includes: a sample stage 6 for placing a sample 5; a source for generating multicharged ions 3 for irradiating a beam 4 of multicharged ions having a valence of 15 or higher to the sample 5 placed on the sample stage 6; a mass analyzer 8 for detecting secondary ions 7 generated as a result of irradiating the beam of multicharged ions 4 to the sample 5; a secondary electron detector 10 for detecting secondary electrons 9 generated as a result of irradiating the beam of multicharged ions 4 to the sample 5; and a controller of mass analyzer 12 for generating analysis start signals in response to the secondary electron signals received, and transmitting the start signals to the mass analyzer. The surface analyzer 1 enables high-quality analysis of the surface of the sample in short time by using the multicharged ions.
摘要:
A surface analyzer 1 includes: a sample stage 6 for placing a sample 5; a source for generating multicharged ions 3 for irradiating a beam 4 of multicharged ions having a valence of 15 or higher to the sample 5 placed on the sample stage 6; a mass analyzer 8 for detecting secondary ions 7 generated as a result of irradiating the beam of multicharged ions 4 to the sample 5; a secondary electron detector 10 for detecting secondary electrons 9 generated as a result of irradiating the beam of multicharged ions 4 to the sample 5; and a controller of mass analyzer 12 for generating analysis start signals in response to the secondary electron signals received, and transmitting the start signals to the mass analyzer. The surface analyzer 1 enables high-quality analysis of the surface of the sample in short time by using the multicharged ions.
摘要:
A multicharged ions generating source that is easy to manufacture, excellent in controllability and maintainability, high in degree of ionization and large in beam intensity and a charged particle beam apparatus using the same are disclosed. The multicharged ions generating source includes an ion source electrode (3) comprising an electron source (4), a drift tube (5) that constitutes an ion trapping region and a collector (6), a superconducting magnet (11) for ion entrapment, an ion infeed means (20, 22), a first vacuum chamber (2) receiving the ion source electrode (3), a second vacuum chamber (10) receiving the superconducting magnet (11), and a vacuum pumping unit (15, 16) provided for each of the first and second vacuum chambers. The first and the second vacuum chambers (2) and (10) are made removable from each other, and only the ion source electrode (3) to be held at extremely high vacuum can be baked for degassing.