公开(公告)号：US20240249906A1

公开(公告)日：2024-07-25

申请号：US18158357

申请日：2023-01-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Po-Tang TSENG ,  Ching-Heng YEN ,  Tai-Kun KAO ,  Sheng-Tai PENG ,  Chun Yan CHEN

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0815

Abstract: An ion source head includes a curved liner that is configured to more closely and accurately repel, direct, or deflect ion species generated within an ion source cavity of an ion source container of an ion source head towards an ion beam opening that extends through the ion source container of the ion source head. This prevents or reduces the ion species from becoming trapped in the ion source cavity instead of exiting the ion source cavity through the ion beam opening that extends through the ion source container of the ion source head. The curved liner may be received by a curved structure of the ion source container of the ion source head. The ion source head may be utilized within an implanter tool to refine or process a solid target with the ion beam generated by the ion source head with the curved liner.

公开(公告)号：US09852887B2

公开(公告)日：2017-12-26

申请号：US13975206

申请日：2013-08-23

Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.

Inventor： Stephen Edward Savas ,  Xiao Bai ,  Zhimin Wan ,  Peter M. Kopalidis

IPC: H01J37/317 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J2237/0815 ,  H01J2237/0817

Abstract: An ion source uses at least one induction coil to generate ac magnetic field to couple rf/VHF power into a plasma within a vessel, where the excitation coil may be a single set of turns each turn having lobes or multiple separate sets of windings. The excitation coil is positioned outside and proximate that side of the vessel that is opposite to the extraction slit, and elongated parallel to the length dimension of the extraction slit. The conducting shield(s) positioned outside or integrated with the well of the vessel are used to block the capacitive coupling to the plasma and/or to collect any rf/VHF current may be coupled into the plasma. The conducting shield positioned between the vessel and the coil set can either shield the plasma from capacitive coupling from the excitation coils, or be tuned to have a higher rf/VHF voltage to ignite or clean the source.

公开(公告)号：US09773646B2

公开(公告)日：2017-09-26

申请号：US15019990

申请日：2016-02-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Oba ,  Yasuhiko Sugiyama ,  Mamoru Okabe

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/20 ,  H01J27/16 ,  H01J37/06

CPC classification number: H01J37/32522 ,  H01J27/16 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32807 ,  H01J2237/0815 ,  H01J2237/31749

Abstract: A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber and made of a dielectric material; a coil wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an envelope surrounding the gas introduction chamber, the plasma generation chamber and the coil; and insulating liquid filled inside the gas introduction chamber, the plasma generation chamber and the envelope to immerse the coil and having an dielectric strength voltage relatively greater than that of the envelope and the same dielectric dissipation factor as the plasma generation chamber.

公开(公告)号：US09773636B2

公开(公告)日：2017-09-26

申请号：US14831468

申请日：2015-08-20

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： W. Davis Lee ,  Neil Bassom ,  Anthony Renau

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/028 ,  H01J27/205 ,  H01J27/24 ,  H01J37/3171 ,  H01J2237/0815 ,  H01J2237/082 ,  H01J2237/31701

Abstract: An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.

公开(公告)号：US09583308B1

公开(公告)日：2017-02-28

申请号：US14837610

申请日：2015-08-27

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/147

CPC classification number: H01J37/08 ,  H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/053 ,  H01J2237/0815 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: An apparatus, referred to as a light bath, is disposed in a beamline ion implantation system and is used to photoionize particles in the ion beam into positively charged particles. Once positively charged, these particles can be manipulated by the various components in the beamline ion implantation system. In certain embodiments, a positively biased electrode is disposed downstream from the light bath to repel the formerly non-positively charged particles away from the workpiece. In certain embodiments, the light bath is disposed within an existing component in the beamline ion implantation system, such as a deceleration stage or a Vertical Electrostatic Energy Filter. The light source emits light at a wavelength sufficiently short so as to ionize the non-positively charged particles. In certain embodiments, the wavelength is less than 250 nm.

Abstract translation: 称为光浴的装置设置在束线离子注入系统中，用于将离子束中的颗粒光电离成带正电的颗粒。 一旦带正电，这些颗粒可以通过束线离子注入系统中的各种组分来操纵。 在某些实施例中，正偏置的电极设置在光浴的下游，以将以前不带正电的颗粒排斥离开工件。 在某些实施例中，光浴设置在束线离子注入系统中的现有部件内，例如减速阶段或垂直静电能量过滤器。 光源以足够短的波长发射光，以使非正电荷的粒子离子化。 在某些实施方案中，波长小于250nm。

公开(公告)号：US20160064186A1

公开(公告)日：2016-03-03

申请号：US14469050

申请日：2014-08-26

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Christopher Lupoli ,  William Davis Lee ,  Frank Sinclair ,  James Pixley

IPC: H01J37/30 ,  H01J37/05 ,  H05H5/06 ,  H01J37/317

CPC classification number: H01J37/3007 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0473 ,  H01J2237/0815 ,  H05H5/063

Abstract: A tandem accelerator and ion implanter with improved performance is disclosed. The tandem accelerator includes a plurality of input electrodes, a plurality of output electrodes and a high voltage terminal disposed therebetween. The high voltage terminal includes a stripper tube. Neutral molecules are injected into the stripper tube, which remove electrons from the incoming negative ion beam. The resulting positive ions are accelerated toward the plurality of output electrodes. To reduce the amount of undesired positive ions that exit the stripper tube, bias electrodes is disposed at the entrance and exit of the stripper tube. The bias electrodes are biased a second voltage, greater than the first voltage applied to the terminal. The bias electrodes repel slow moving positive ions, preventing them from exiting the stripper tube and contaminating the workpiece.

Abstract translation: 公开了一种具有改进性能的串联加速器和离子注入机。 串联加速器包括多个输入电极，多个输出电极和设置在它们之间的高电压端子。 高压端子包括剥离管。 将中性分子注入汽提塔，从入射的负离子束中除去电子。 所产生的正离子朝向多个输出电极加速。 为了减少离开汽提塔的不需要的正离子的量，偏压电极设置在汽提塔管的入口和出口处。 偏置电极偏置第二电压，大于施加到端子的第一电压。 偏置电极排斥缓慢移动的正离子，防止它们离开剥离管并污染工件。

公开(公告)号：US09214313B2

公开(公告)日：2015-12-15

申请号：US13082983

申请日：2011-04-08

Applicant: Joseph M. Matesa, Jr. ,  Paul E. Fischione

Inventor： Joseph M. Matesa, Jr. ,  Paul E. Fischione

IPC: H01J1/50 ,  H01J37/08 ,  H01J27/04 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J27/04 ,  H01J37/3056 ,  H01J2237/061 ,  H01J2237/0815

Abstract: An ion source is disclosed which utilizes independently powered electrodes that are isolated with a series of insulators. The ion source comprises an anode electrode with a hollow interior, where the anode is disposed between a cathode and an anti-cathode. A magnet or electro-magnet imposes a magnetic field in an axial direction through the bore of the anode. Gas is introduced into the anode area at a controllable pressure. The ion source includes a first voltage differential between the anode and cathode for the production of plasma and a second voltage differential between the anode and the anti-cathode for extraction of ions from the plasma, forming an ion beam, which is preferably of a narrow diameter at low beam energy. In particular, the voltage differential between the anti-cathode and anode is adjusted to control the initial beam divergence of extracted ions. An optional focus electrode with an independent power supply further focuses the ion beam. A final electrode defines the output boundary of the ion source to provide un-perturbed drift of the ions into the vacuum chamber.

Abstract translation: 公开了一种离子源，其利用与一系列绝缘体隔离的独立供电的电极。 离子源包括具有中空内部的阳极电极，其中阳极设置在阴极和反阴极之间。 磁体或电磁铁通过阳极的孔沿轴向施加磁场。 气体以可控的压力被引入阳极区域。 离子源包括用于产生等离子体的阳极和阴极之间的第一电压差和用于从等离子体提取离子的阳极和反阴极之间的第二电压差，形成离子束，其优选地为窄 直径在低光束能量。 特别地，调整反阴极和阳极之间的电压差以控制提取的离子的初始光束发散。 具有独立电源的可选聚焦电极进一步聚焦离子束。 最终电极定义了离子源的输出边界，以提供离子到真空室中的无扰动漂移。

公开(公告)号：US20150283405A1

公开(公告)日：2015-10-08

申请号：US14246803

申请日：2014-04-07

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: A61N5/10

CPC classification number: A61N5/1082 ,  A61N5/1044 ,  A61N5/1067 ,  A61N5/107 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  A61N2005/1097 ,  G21K1/093 ,  G21K5/04 ,  H01J37/141 ,  H01J2237/0815 ,  H05H2007/007 ,  H05H2007/082

Abstract: A rotatable targeting magnet apparatus and method of use thereof is described where the rotatable targeting magnet rotates independently of a beamline arc at the end of the beamline arc, where the arc is after an accelerator and before the patient in a cancer therapy system. The rotatable targeting magnet directs the charged particle beam, such as vertically, using applied current to the targeting magnet while rotation of the magnet allows scanning across the tumor. Rotation of the patient relative to the charged particle allows distribution of trailing Bragg peak energy within and/or circumferentially about the tumor.

Abstract translation: 描述了一种可旋转靶向磁铁装置及其使用方法，其中可转动的定向磁体独立于束线弧的末端处的光束弧线旋转，其中电弧在加速器之后并且在癌症治疗系统中的患者之前。 可旋转定向磁体通过使用施加的电流将带电粒子束（例如垂直）引导到靶向磁体，同时磁体的旋转允许跨越肿瘤扫描。 患者相对于带电粒子的旋转允许在肿瘤内和/或周向周围分布肿瘤的后布拉格峰能量。

公开(公告)号：US20150273240A1

公开(公告)日：2015-10-01

申请号：US14231020

申请日：2014-03-31

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: A61N5/10 ,  H01J37/141

CPC classification number: A61N5/1082 ,  A61N5/1044 ,  A61N5/1067 ,  A61N5/107 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  A61N2005/1097 ,  G21K1/093 ,  G21K5/04 ,  H01J37/141 ,  H01J2237/0815 ,  H05H2007/007 ,  H05H2007/082

Abstract: A fast magnet switching method and apparatus used to rapidly redirect cations, such as H+ or C6+, in a beam path, such as during or between treatment of individual volumes or voxels of a tumor of the patient, is described. Switching means include rapidly increasing or decreasing applied current to a coil about a magnet, which rapidly alters a magnetic field crossing the charged particle path and redirects a charged particle beam away from the patient, such as to a charged particle beam stop. Means to rapidly induce the current change include: (1) using a separate high voltage power supply and/or (2) opening a switch to redirect current through a resistor. In both cases, the rapid current change to the coil yields a rapid change the magnetic field and a corresponding rapid change in direction of the charged particles in the charged particle cancer therapy system.

Abstract translation: 描述了用于在诸如患者的肿瘤的个体体积或体素的处理期间或之间的波束路径中快速重定向阳离子（例如H +或C6 +）的快速磁体切换方法和装置。 切换装置包括对围绕磁体的线圈的施加电流迅速增加或减小，其迅速改变穿过带电粒子路径的磁场并将带电粒子束重新定向远离患者，诸如带电粒子束停止。 快速引起电流变化的手段包括：（1）使用单独的高压电源和/或（2）打开开关以使电流重新定向通过电阻器。 在这两种情况下，线圈的快速电流变化都会迅速改变带电粒子癌症治疗系统中带电粒子的磁场和相应的方向快速变化。

公开(公告)号：US20150248992A1

公开(公告)日：2015-09-03

申请号：US14635413

申请日：2015-03-02

Applicant: ASHWINI K. SINHA ,  STANLEY M. SMITH ,  DOUGLAS C. HEIDERMAN ,  SERGE M. CAMPEAU

Inventor： ASHWINI K. SINHA ,  STANLEY M. SMITH ,  DOUGLAS C. HEIDERMAN ,  SERGE M. CAMPEAU

IPC: H01J37/317 ,  C01B3/00 ,  H01J37/08

CPC classification number: H01J37/3171 ,  C01B3/00 ,  H01J27/22 ,  H01J37/08 ,  H01J37/32458 ,  H01J37/32807 ,  H01J2237/006 ,  H01J2237/0473 ,  H01J2237/08 ,  H01J2237/0815 ,  H01J2237/31701 ,  H01J2237/3365 ,  Y02E60/324

Abstract: A novel composition, system and method thereof for improving beam current during boron ion implantation are provided. The boron ion implant process involves utilizing B2H6, BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.

Abstract translation: 提供了一种用于在硼离子注入期间改善束电流的新型组成，系统及其方法。 硼离子注入工艺涉及使用特定浓度范围的B2H6，BF3和H2。 在生成和注入活性氢离子物质期间使用的离子源的工作电弧电压下，选择B2H6具有高于BF 3的电离横截面。 氢气允许更高水平的B 2 H 6被引入BF 3中而不减少F离子清除。 当与常规硼前体材料产生的束电流相比时，活性硼离子产生改进的束电流，其特征在于保持或增加束电流水平而不引起离子源的劣化。