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公开(公告)号：US20090053652A1
公开(公告)日：2009-02-26
申请号：US11844589
申请日：2007-08-24
申请人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
发明人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0397
摘要： Photoresist compositions are disclosed.
摘要翻译： 公开了光致抗蚀剂组合物。
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公开(公告)号：US08252503B2
公开(公告)日：2012-08-28
申请号：US11844589
申请日：2007-08-24
申请人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
发明人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0397
摘要： Photoresist compositions are disclosed.
摘要翻译： 公开了光致抗蚀剂组合物。
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公开(公告)号：US20110086312A1
公开(公告)日：2011-04-14
申请号：US12576622
申请日：2009-10-09
申请人： Ralph R. Dammel , Srinivasan Chakrapani , Munirathna Padmanaban , Shinji Miyazaki , Edward W. Ng , Takanori Kudo , Alberto D. Dioses , Francis M. Houlihan
发明人： Ralph R. Dammel , Srinivasan Chakrapani , Munirathna Padmanaban , Shinji Miyazaki , Edward W. Ng , Takanori Kudo , Alberto D. Dioses , Francis M. Houlihan
CPC分类号： G03F7/091
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.
摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。
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公开(公告)号：US20120122029A1
公开(公告)日：2012-05-17
申请号：US12944420
申请日：2010-11-11
摘要： The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
摘要翻译： 本发明涉及一种可光成像底层组合物，其包含聚合物，包含乙烯基醚基团的交联剂和包含单羧酸和多元羧酸盐和胺的热酸产生剂，其中胺的沸点为至少150 本发明还涉及一种用于在包含新组合物的底层中形成图像的方法。
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公开(公告)号：US20120308939A1
公开(公告)日：2012-12-06
申请号：US13153765
申请日：2011-06-06
摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。
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公开(公告)号：US08623589B2
公开(公告)日：2014-01-07
申请号：US13153765
申请日：2011-06-06
摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。
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7.发明申请公开(公告)号：US20080171270A1
公开(公告)日：2008-07-17
申请号：US11623335
申请日：2007-01-16
IPC分类号： G03F1/00
CPC分类号： C08F220/28
摘要： The present application relates to a polymer having the formula where R30, R31, R32, R33, R40, R41, R42, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions.
摘要翻译： 本申请涉及具有下式的聚合物：其中R 30，R 31，R 32，R 33， 本文描述了R 40，R 41，R 42，j j，k k，mm和n n。 这些化合物可用于形成光致抗蚀剂组合物。
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公开(公告)号：US20080131811A1
公开(公告)日：2008-06-05
申请号：US11566312
申请日：2006-12-04
IPC分类号： G03F7/004 , C07C381/04 , G03F7/26
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/0392 , Y10S430/122 , Y10S430/126
摘要： The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3−. The compounds are useful as photoactive materials.
摘要翻译： 本申请涉及式AiXi的化合物，其中A 1是有机鎓阳离子; 且X 1为下式的阴离子：X-CF 2 CF 2 R 2 OCF 2 CF 2 SO 2 > 3 - 。 这些化合物可用作光敏材料。
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公开(公告)号：US20120108067A1
公开(公告)日：2012-05-03
申请号：US12915950
申请日：2010-10-29
IPC分类号： H01L21/311 , G03F7/42
CPC分类号： G03F7/168 , C11D3/373 , C11D3/3765 , C11D3/43 , C11D7/5022 , C11D11/0047 , G03F7/2041
摘要： The invention relates to an edge bead remover composition for an organic film disposed on a substrate surface, comprising an organic solvent and at least one polymer having a contact angle with water greater than 70°. The invention also relates to a process for using the composition as an edge bead remover for an organic film.
摘要翻译： 本发明涉及一种用于有机膜的边缘珠粒去除组合物，其用于设置在基材表面上，包括有机溶剂和至少一种与水的接触角大于70°的聚合物。 本发明还涉及使用该组合物作为有机膜的边缘珠去除剂的方法。
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公开(公告)号：US08632948B2
公开(公告)日：2014-01-21
申请号：US12570923
申请日：2009-09-30
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。
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