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    Positive-working photoimageable bottom antireflective coating
    1.
    发明授权
    Positive-working photoimageable bottom antireflective coating 有权
    正面工作的可光成像底部抗反射涂层

    公开(公告)号：US08632948B2

    公开(公告)日：2014-01-21

    申请号：US12570923

    申请日：2009-09-30

    申请人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    发明人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    IPC分类号： G03F7/039 ,  G03F7/30 ,  C08F20/20

    CPC分类号： G03F7/091

    摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

    摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

    Positive-Working Photoimageable Bottom Antireflective Coating
    2.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 有权
    正面照相底部防反射涂层

    公开(公告)号：US20110076626A1

    公开(公告)日：2011-03-31

    申请号：US12570923

    申请日：2009-09-30

    申请人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    发明人： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    IPC分类号： G03F7/00 ,  G03C1/00

    CPC分类号： G03F7/091

    摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

    摘要翻译： 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

    Positive-Working Photoimageable Bottom Antireflective Coating
    3.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 审中-公开
    正面照相底部防反射涂层

    公开(公告)号：US20110086312A1

    公开(公告)日：2011-04-14

    申请号：US12576622

    申请日：2009-10-09

    申请人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    发明人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/091

    摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.

    摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。

    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
    8.
    发明申请
    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US20120308939A1

    公开(公告)日：2012-12-06

    申请号：US13153765

    申请日：2011-06-06

    申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC分类号： G03F7/20 ,  C08K5/42

    CPC分类号： C09D5/006 ,  G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

    Bottom antireflective coating compositions and processes thereof
    9.
    发明授权
    Bottom antireflective coating compositions and processes thereof 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US08623589B2

    公开(公告)日：2014-01-07

    申请号：US13153765

    申请日：2011-06-06

    申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC分类号： G03F7/38 ,  G03F7/40 ,  C09D5/00 ,  G03F7/039 ,  G03F7/11

    CPC分类号： C09D5/006 ,  G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。