METHOD FOR PRODUCING A HOLOGRAPHIC FILM
    2.
    发明申请
    METHOD FOR PRODUCING A HOLOGRAPHIC FILM 审中-公开
    生产全息膜的方法

    公开(公告)号:US20140302426A1

    公开(公告)日:2014-10-09

    申请号:US14284488

    申请日:2014-05-22

    IPC分类号: G03H1/02

    摘要: The invention relates to a method for producing holographic films, in which a photopolymer formulation is provided which comprises as constituents matrix polymers, writing monomers, a photoinitiator system, optionally a non-photopolymerizable component and optionally catalysts, radical stabilizers, solvents, additives and other auxiliaries and/or additives. The photopolymer formulation is applied in a planar manner and in the form of a film on a support film and the photopolymer formulation is dried on the support film at a temperature 60 100 DEG C. and are above the temperature T by at least 30 DEG C., and a photopolymer formulation having a plateau module of =0.030 MPa is used.

    摘要翻译: 本发明涉及一种生产全息膜的方法,其中提供了一种光聚合物配方,其包含基质聚合物,书写单体,光引发剂体系,任选的非光聚合组分和任选的催化剂,自由基稳定剂,溶剂,添加剂和其它组分 助剂和/或添加剂。 将光敏聚合物配方以平面方式并以薄膜的形式施加在支撑膜上,并将光聚合物配方在60℃<120℃的温度下在支撑膜上干燥,其中仅选择化合物作为 光聚合物配方,其TGA 95值> 100℃,温度T高于至少30℃,并且使用具有= 0.030MPa的平台模块的光聚合物配方。

    METHOD FOR PRODUCING A HOLOGRAPHIC FILM
    6.
    发明申请
    METHOD FOR PRODUCING A HOLOGRAPHIC FILM 有权
    生产全息膜的方法

    公开(公告)号:US20120219883A1

    公开(公告)日:2012-08-30

    申请号:US13504402

    申请日:2010-11-02

    IPC分类号: G03H5/00 G03F7/004

    摘要: The invention relates to a method for producing a holographic film, wherein a photopolymer formulation comprising matrix polymers, writing monomers, photoinitiator system, and optionally auxiliary materials and additives is provided, the photopolymer formulation is applied as a film to the surface of a substrate, and the film is dried, wherein a photopolymer formulation having a plateau module G0 of =0.03 MPa is used. The invention further relates to a holographic medium that can be obtained by means of the method according to the invention.

    摘要翻译: 本发明涉及一种用于制造全息膜的方法,其中提供了包含基质聚合物,书写单体,光引发剂体系和任选的辅助材料和添加剂的光聚合物制剂,光聚合物制剂作为薄膜施加到基材的表面, 并且干燥膜,其中使用具有= 0.03MPa的平台模块G0的光聚合物制剂。 本发明还涉及可以通过根据本发明的方法获得的全息介质。