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公开(公告)号：US09383195B2
公开(公告)日：2016-07-05
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
IPC分类号： G03F7/20 , G01B11/30 , G01N21/956
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US08570491B2
公开(公告)日：2013-10-29
申请号：US12919966
申请日：2009-02-27
申请人： Erwin Rinaldo Meinders , Maria Peter , Peter Theodorus Maria Giesen , Wilhelmus Johannes Maria de Laat
发明人： Erwin Rinaldo Meinders , Maria Peter , Peter Theodorus Maria Giesen , Wilhelmus Johannes Maria de Laat
CPC分类号： G03F7/707 , B23Q3/1546 , B32B38/1825 , G03F7/70758 , G03F7/70783
摘要： According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable elements form a surface for supporting the flexible foil. The movable elements comprise clamps (6) for clamping the foil (5). The movable elements (4) are individually movable parallel to the surface for supporting the foil, so as to stretch the clamped foil into a predefined shape. The table for compensating deformation in flexible foils may be used in a manufacturing process of flexible functional foils to compensate deformation of the foils during sequential patterning.
摘要翻译： 根据一个方面，本发明提供了一种用于补偿柔性箔中的变形的表（1）。该表包括支撑基座（2）和变形补偿系统（3）。 该系统包括由基部（2）支撑的多个可移动元件（4），其中可移动元件形成用于支撑柔性箔片的表面。 可移动元件包括用于夹紧箔片（5）的夹具（6）。 可移动元件（4）能够平行于用于支撑箔片的表面移动，从而将夹持的箔片拉伸成预定形状。 用于补偿柔性箔中的变形的表可以用于柔性功能箔的制造过程中，以在顺序图案化期间补偿箔的变形。
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公开(公告)号：US20090170025A1
公开(公告)日：2009-07-02
申请号：US12276705
申请日：2008-11-24
申请人： Wilhelmus Johannes Maria DE LAAT , Cheng-Qun GUI , Peter Theodorus Maria GIESEN , Paulus Wilhelmus Leonardus VAN DIJK , Erwin Rinaldo MEINDERS , Maria PETER
发明人： Wilhelmus Johannes Maria DE LAAT , Cheng-Qun GUI , Peter Theodorus Maria GIESEN , Paulus Wilhelmus Leonardus VAN DIJK , Erwin Rinaldo MEINDERS , Maria PETER
CPC分类号： G03F7/707
摘要： A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
摘要翻译： 载体衬底在载体衬底的一侧上设置有PDMS层和固化剂层。 PDMS和固化剂可以被布置成接收和粘附到光刻基底。 载体衬底的尺寸可以使得组合的载体衬底和光刻衬底可以由传统的光刻设备来处理。
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公开(公告)号：US20120281192A1
公开(公告)日：2012-11-08
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US07408624B2
公开(公告)日：2008-08-05
申请号：US11170735
申请日：2005-06-30
CPC分类号： G03F7/707 , G03F7/70691
摘要： A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.
摘要翻译： 光刻设备包括：衬底台，其构造成保持第一类型的第一衬底，所述第一衬底具有抛光表面; 以及投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。 抛光表面支撑第二类型的第二衬底，并且投影系统被配置为将图案化的辐射束投影到第二衬底上。
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公开(公告)号：US08029973B2
公开(公告)日：2011-10-04
申请号：US12276705
申请日：2008-11-24
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Paulus Wilhelmus Leonardus Van Dijk , Erwin Rinaldo Meinders , Maria Peter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Paulus Wilhelmus Leonardus Van Dijk , Erwin Rinaldo Meinders , Maria Peter
CPC分类号： G03F7/707
摘要： A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
摘要翻译： 载体衬底在载体衬底的一侧上设置有PDMS层和固化剂层。 PDMS和固化剂可以被布置成接收和粘附到光刻基底。 载体衬底的尺寸可以使得组合的载体衬底和光刻衬底可以由传统的光刻设备来处理。
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公开(公告)号：US20080083818A1
公开(公告)日：2008-04-10
申请号：US11544000
申请日：2006-10-06
IPC分类号： B23K31/00
CPC分类号： B23K31/02 , B23K2101/40
摘要： A method of measuring bonding quality of a bonded substrate having an upper substrate on top of a lower substrate, the method comprising etching one or more windows in the upper substrate such that overlay measurement alignment marks on the upper substrate may be seen by a measurement system and overlay measurement alignment marks on the lower substrate may be seen by the measurement system, using the measurement system to measure the positions of the overlay measurement alignment marks, determining the distance between corresponding overlay measurement alignment marks on the upper and lower substrates, and adjusting the determined distance to take into account an offset between the overlay measurement alignment marks on the upper substrate and the overlay measurement alignment marks on the lower substrate.
摘要翻译： 一种在下基板的顶部测量具有上基板的键合衬底的接合质量的方法，所述方法包括蚀刻上衬底中的一个或多个窗口，使得可通过测量系统看到上衬底上的覆盖测量对准标记 并且通过测量系统可以看到下部基板上的覆盖测量对准标记，使用测量系统来测量覆盖测量对准标记的位置，确定上和下基板上相应的覆盖测量对准标记之间的距离，以及调整 考虑到上基板上的覆盖测量对准标记与下基板上的覆盖测量对准标记之间的偏移的确定的距离。
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