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公开(公告)号：US09383195B2
公开(公告)日：2016-07-05
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
IPC分类号： G03F7/20 , G01B11/30 , G01N21/956
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US20120281192A1
公开(公告)日：2012-11-08
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US08029973B2
公开(公告)日：2011-10-04
申请号：US12276705
申请日：2008-11-24
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Paulus Wilhelmus Leonardus Van Dijk , Erwin Rinaldo Meinders , Maria Peter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Paulus Wilhelmus Leonardus Van Dijk , Erwin Rinaldo Meinders , Maria Peter
CPC分类号： G03F7/707
摘要： A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
摘要翻译： 载体衬底在载体衬底的一侧上设置有PDMS层和固化剂层。 PDMS和固化剂可以被布置成接收和粘附到光刻基底。 载体衬底的尺寸可以使得组合的载体衬底和光刻衬底可以由传统的光刻设备来处理。
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公开(公告)号：US20080083818A1
公开(公告)日：2008-04-10
申请号：US11544000
申请日：2006-10-06
IPC分类号： B23K31/00
CPC分类号： B23K31/02 , B23K2101/40
摘要： A method of measuring bonding quality of a bonded substrate having an upper substrate on top of a lower substrate, the method comprising etching one or more windows in the upper substrate such that overlay measurement alignment marks on the upper substrate may be seen by a measurement system and overlay measurement alignment marks on the lower substrate may be seen by the measurement system, using the measurement system to measure the positions of the overlay measurement alignment marks, determining the distance between corresponding overlay measurement alignment marks on the upper and lower substrates, and adjusting the determined distance to take into account an offset between the overlay measurement alignment marks on the upper substrate and the overlay measurement alignment marks on the lower substrate.
摘要翻译： 一种在下基板的顶部测量具有上基板的键合衬底的接合质量的方法，所述方法包括蚀刻上衬底中的一个或多个窗口，使得可通过测量系统看到上衬底上的覆盖测量对准标记 并且通过测量系统可以看到下部基板上的覆盖测量对准标记，使用测量系统来测量覆盖测量对准标记的位置，确定上和下基板上相应的覆盖测量对准标记之间的距离，以及调整 考虑到上基板上的覆盖测量对准标记与下基板上的覆盖测量对准标记之间的偏移的确定的距离。
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5.发明授权Lithographic apparatus, programmable patterning device and lithographic method 有权光刻设备，可编程图案形成装置和光刻方法公开(公告)号：US08531648B2
公开(公告)日：2013-09-10
申请号：US13119884
申请日：2009-09-21
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。
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公开(公告)号：US08395755B2
公开(公告)日：2013-03-12
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US20100068416A1
公开(公告)日：2010-03-18
申请号：US12553390
申请日：2009-09-03
CPC分类号： G03F7/164 , G03F7/002 , G03F7/0047 , G03F7/28 , G03G13/283 , G03G13/286 , H01L21/31691
摘要： A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
摘要翻译： 光刻方法包括将干燥形式的颗粒提供在基材上或者提供在基材上的材料上，用一定剂量的辐射照射一个或多个颗粒，辐射剂量足以确保至少一个颗粒的一个颗粒 或更多的颗粒结合到基板上，或者与设置在基板上的材料接合，以及从基板上提供的颗粒，或者从基板上提供的材料去除未结合到基板上的材料，或者去除设置在基板上的材料 。
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公开(公告)号：US07567340B2
公开(公告)日：2009-07-28
申请号：US11529732
申请日：2006-09-29
CPC分类号： G03F7/70333 , G03F7/703
摘要： A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
摘要翻译： 公开了一种器件制造方法，其包括在衬底台上提供衬底，所述衬底具有包括多个大体上平坦的表面的目标区域，每个表面相对于衬底台具有不同的高度，确定每个大致平面的相对高度 将图案化的辐射束投影到基板的目标区域上，使得光束的焦平面基本上与大体上平坦的表面之一的平面重合，使基板台沿基本上平行于基板平面的方向移动 并且将所述图案化的辐射束投影到所述基板的目标区域上，使得所述光束的焦平面基本上与所述大体上平坦的表面中的另一个的平面重合。
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公开(公告)号：US07468291B2
公开(公告)日：2008-12-23
申请号：US11431107
申请日：2006-05-10
CPC分类号： H01L21/67138 , H01L23/544 , H01L24/11 , H01L24/742 , H01L2223/54473 , H01L2224/16 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01061 , H01L2924/01074 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/14
摘要： A method for locating, forming, or both locating and forming, bumps of material on a substrate having a plurality of devices, the method includes receiving data which indicates the number and location of the devices on the substrate, then using a flip-chip bumping apparatus to locate, form, or both locate and form, bumps of material on the devices, the positions of the devices being determined using the data.
摘要翻译： 一种用于在具有多个器件的衬底上定位，形成或两者定位和形成材料凸起的方法，所述方法包括接收指示衬底上器件的数量和位置的数据，然后使用倒装芯片凸起 定位，形成或两者定位和形成设备上材料的凸块的装置，使用数据确定装置的位置。
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公开(公告)号：US20080218718A1
公开(公告)日：2008-09-11
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC分类号： G03B27/42
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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