公开(公告)号：US09067066B2

公开(公告)日：2015-06-30

申请号：US14356629

申请日：2012-03-27

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

IPC: G21K5/04 ,  A61N5/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1074 ,  A61N2005/1087 ,  H05H13/04 ,  H05H2277/11

Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.

Abstract translation: 控制单元设置有保持部，其保持多个操作模式，每个操作模式是由加速器周期性重复的操作模式，所述操作模式具有针对粒子束的不同发射次数调整的各自的操作条件，以使得 加速器中的偏转电磁体即使在滞后的情况下也具有预期的磁场强度; 用于读取每个切片的照射条件的用于在深度方向上的照射目标的多个切片的读取部分; 选择部，其基于读取的照射条件选择适合于每个切片的操作模式; 以及主控制部，其基于所述照射条件，基于所选择的操作模式和照射装置对每个切片进行加速器的控制。

公开(公告)号：US08933420B2

公开(公告)日：2015-01-13

申请号：US14240197

申请日：2011-11-02

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

IPC: A61N5/10

CPC classification number: A61N5/1077 ,  A61N5/1049 ,  A61N5/1069 ,  A61N2005/1087

Abstract: A particle beam therapy system comprising a treatment table, a treatment table control unit and an irradiation control unit configured to output an instruction for controlling the treatment table control unit, an accelerator and a scanning electromagnet, wherein after the treatment table control unit controls the treatment table so as for a patient isocenter which is reference position of an affected area of a patient to move to a position of an irradiation isocenter which is set at a position which is closer to an irradiation nozzle than an equipment isocenter which is reference of positional relation of the irradiation nozzle and the treatment table, the irradiation control unit outputs an instruction for irradiating the patient with a particle beam.

Abstract translation: 一种粒子束治疗系统，包括治疗台，治疗台控制单元和照射控制单元，其被配置为输出用于控制治疗台控制单元的指令，加速器和扫描电磁体，其中在治疗台控制单元控制治疗 将患者的中心位置作为患者的受影响区域的基准位置移动到被设定在比作为位置关系的参照的设备等角点更靠近照射喷嘴的位置的照射等角点的位置 的照射喷嘴和处理台，照射控制单元输出用于对粒子束照射患者的指示。

公开(公告)号：US20140228615A1

公开(公告)日：2014-08-14

申请号：US14240650

申请日：2011-11-03

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

IPC: A61N5/10

CPC classification number: A61N5/1081 ,  A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095

Abstract: A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.

Abstract translation: 根据本发明的粒子束照射装置设置有真空管道，该真空管道形成带电粒子束通过的真空区域，从真空区域发射带电粒子束的真空窗口，扫描的扫描电磁体 带电粒子束; 监视装置，其包括检测带电粒子束的通过位置的位置监视器及其光束尺寸，包括监视装置的低散射气体填充室以及控制带电粒子束的照射的照射管理装置; 所述粒子束照射装置的特征在于，所述低散射气体充填室可变地设置成使得所述监视装置和所述真空窗口之间的射束轴向位置关系是期望的， 散射气体填充室填充有低散射气体。

公开(公告)号：US20140187847A1

公开(公告)日：2014-07-03

申请号：US14240197

申请日：2011-11-02

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

IPC: A61N5/10

CPC classification number: A61N5/1077 ,  A61N5/1049 ,  A61N5/1069 ,  A61N2005/1087

Abstract: A particle beam therapy system comprising a treatment table, a treatment table control unit and an irradiation control unit configured to output an instruction for controlling the treatment table control unit, an accelerator and a scanning electromagnet, wherein after the treatment table control unit controls the treatment table so as for a patient isocenter which is reference position of an affected area of a patient to move to a position of an irradiation isocenter which is set at a position which is closer to an irradiation nozzle than an equipment isocenter which is reference of positional relation of the irradiation nozzle and the treatment table, the irradiation control unit outputs an instruction for irradiating the patient with a particle beam.

Abstract translation: 一种粒子束治疗系统，包括治疗台，治疗台控制单元和照射控制单元，其被配置为输出用于控制治疗台控制单元的指令，加速器和扫描电磁体，其中在治疗台控制单元控制治疗 将患者的中心位置作为患者的受影响区域的基准位置移动到被设定在比作为位置关系的参照的设备等角点更靠近照射喷嘴的位置的照射等角点的位置 的照射喷嘴和处理台，照射控制单元输出用于对粒子束照射患者的指示。

公开(公告)号：US07663201B2

公开(公告)日：2010-02-16

申请号：US11447966

申请日：2006-06-07

Applicant: Yukiko Yamada

Inventor： Yukiko Yamada

IPC: H01L21/44 ,  H01L21/4763 ,  H01L29/40

CPC classification number: H01L24/16 ,  H01L24/03 ,  H01L24/05 ,  H01L24/12 ,  H01L2224/02123 ,  H01L2224/03 ,  H01L2224/0401 ,  H01L2224/05557 ,  H01L2224/05576 ,  H01L2224/13099 ,  H01L2224/16227 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/351 ,  H01L2924/00

Abstract: The present invention provides a semiconductor device exhibiting an improved reliability. A semiconductor device comprises a semiconductor chip having an electrode on a surface thereof and a mounting substrate, and the electrode (aluminum electrode) of the semiconductor chip is coupled to the mounting substrate through a bump (solder bump 104). A plurality of diffusion barrier films (UBM 112) for preventing a diffusion of a material composing the bump is provided between the electrode and the bump, and the diffusion barrier film is formed to have a plurality of divided portions via spacings therebetween.

Abstract translation: 本发明提供一种显示出可靠性提高的半导体器件。 半导体器件包括其表面上具有电极的半导体芯片和安装衬底，并且半导体芯片的电极（铝电极）通过凸块（焊料凸块104）耦合到安装衬底。 在电极和凸点之间设置有用于防止构成凸块的材料的扩散的多个扩散阻挡膜（UBM 112），并且扩散阻挡膜通过它们之间的间隔形成为具有多个分割部分。

公开(公告)号：US09101763B2

公开(公告)日：2015-08-11

申请号：US14240650

申请日：2011-11-03

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

IPC: A61N5/00 ,  A61N5/10

CPC classification number: A61N5/1081 ,  A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095

Abstract: A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.

Abstract translation: 根据本发明的粒子束照射装置设置有真空管道，该真空管道形成带电粒子束通过的真空区域，从真空区域发射带电粒子束的真空窗口，扫描的扫描电磁体 带电粒子束; 监视装置，其包括检测带电粒子束的通过位置的位置监视器及其光束尺寸，包括监视装置的低散射气体填充室以及控制带电粒子束的照射的照射管理装置; 所述粒子束照射装置的特征在于，所述低散射气体充填室可变地设置成使得所述监视装置和所述真空窗口之间的射束轴向位置关系是期望的， 散射气体填充室填充有低散射气体。

公开(公告)号：US09067065B2

公开(公告)日：2015-06-30

申请号：US13977058

申请日：2011-03-07

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

IPC: A61N5/10 ,  G21K1/093

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1087 ,  G21K1/093

Abstract: The particle beam irradiation apparatus comprises: a position monitor that detects a passing position of a charged particle beam; and an irradiation control apparatus that calculates a distance from a predetermined reference point to the position monitor, calculates a beam irradiation position on an irradiation subject, and controls irradiation of the beam; wherein the irradiation control apparatus includes a position calculation apparatus that calculates the beam irradiation position, based on a beam position detected by the position monitor, a scanning starting point distance information on a distance from a irradiation plane of the irradiation subject to a scanning starting point, of the beam, in a scanning electromagnet, and a position monitor distance information on a distance, from the irradiation plane to the position monitor, that is calculated based on the calculated distance.

Abstract translation: 粒子束照射装置包括：位置监视器，其检测带电粒子束的通过位置; 以及照射控制装置，其计算从预定基准点到所述位置监视器的距离，计算照射对象的光束照射位置，并控制所述光束的照射; 其特征在于，所述照射控制装置包括：位置计算装置，其基于由所述位置监视器检测到的光束位置计算所述光束照射位置;从所述照射对象的照射面到扫描开始点的距离的扫描开始点距离信息 ，扫描电磁体中的距离信息，以及从照射平面到位置监视器的基于计算出的距离计算的位置监视距离信息。

公开(公告)号：US20140323793A1

公开(公告)日：2014-10-30

申请号：US14356629

申请日：2012-03-27

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

IPC: A61N5/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1074 ,  A61N2005/1087 ,  H05H13/04 ,  H05H2277/11

Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.

Abstract translation: 控制单元设置有保持部，其保持多个操作模式，每个操作模式是由加速器周期性重复的操作模式，所述操作模式具有针对粒子束的不同发射次数调整的各自的操作条件，以使得 加速器中的偏转电磁体即使在滞后的情况下也具有预期的磁场强度; 用于读取每个切片的照射条件的用于在深度方向上的照射目标的多个切片的读取部分; 选择部，其基于读取的照射条件选择适合于每个切片的操作模式; 以及主控制部，其基于所述照射条件，基于所选择的操作模式和照射装置对每个切片进行加速器的控制。

公开(公告)号：US08586942B2

公开(公告)日：2013-11-19

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: H01J3/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。

公开(公告)号：US20130274538A1

公开(公告)日：2013-10-17

申请号：US13977058

申请日：2011-03-07

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

IPC: A61N5/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1087 ,  G21K1/093

Abstract: The particle beam irradiation apparatus comprises: a position monitor that detects a passing position of a charged particle beam; and an irradiation control apparatus that calculates a distance from a predetermined reference point to the position monitor, calculates a beam irradiation position on an irradiation subject, and controls irradiation of the beam; wherein the irradiation control apparatus includes a position calculation apparatus that calculates the beam irradiation position, based on a beam position detected by the position monitor, a scanning starting point distance information on a distance from a irradiation plane of the irradiation subject to a scanning starting point, of the beam, in a scanning electromagnet, and a position monitor distance information on a distance, from the irradiation plane to the position monitor, that is calculated based on the calculated distance.

Abstract translation: 粒子束照射装置包括：位置监视器，其检测带电粒子束的通过位置; 以及照射控制装置，其计算从预定基准点到所述位置监视器的距离，计算照射对象的光束照射位置，并控制所述光束的照射; 其特征在于，所述照射控制装置包括：位置计算装置，其基于由所述位置监视器检测到的光束位置计算所述光束照射位置;从所述照射对象的照射面到扫描开始点的距离的扫描开始点距离信息 ，扫描电磁体中的距离信息，以及从照射平面到位置监视器的基于计算出的距离计算的位置监视距离信息。