公开(公告)号：US09478396B2

公开(公告)日：2016-10-25

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US11458561B2

公开(公告)日：2022-10-04

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Shinji Sugatani ,  Masayuki Takahashi ,  Masahiro Takizawa

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/06 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01J29/56

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

公开(公告)号：US11229971B2

公开(公告)日：2022-01-25

申请号：US16127225

申请日：2018-09-11

Applicant: ADVANTEST CORPORATION

Inventor： Shinji Sugatani ,  Shigeki Nishina ,  Jun Matsumoto ,  Masahiro Takizawa ,  Minoru Soma ,  Akio Yamada

IPC: B23K15/00 ,  B28B1/00 ,  B28B17/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B29C64/268 ,  B29C64/153 ,  B22F10/20 ,  B23K15/02 ,  B33Y40/00 ,  B22F10/30

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a three-dimensional structure 36 from a ground potential member, an ammeter 73 that is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure 36, a melting judging unit 410 that is configured to detect that the powder layer 32 is melted based on the current value measured by the ammeter 73 and generate a melting signal, and a deflection controller 420 that is configured to receive the melting signal to determine the condition for the irradiation with the electron beam.

公开(公告)号：US20150200074A1

公开(公告)日：2015-07-16

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US10919105B2

公开(公告)日：2021-02-16

申请号：US16121581

申请日：2018-09-04

Applicant: ADVANTEST CORPORATION

Inventor： Shinji Sugatani ,  Shigeki Nishina ,  Jun Matsumoto ,  Masahiro Takizawa ,  Minoru Soma ,  Akio Yamada

IPC: B23K26/34 ,  B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B23K15/02 ,  B33Y50/02 ,  B22F3/105 ,  B29C64/268 ,  B29C64/153 ,  B33Y40/00

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layer 32 when the powder layer 32 is irradiated with the electron beam EB, a melting judging unit 410 that is configured to generate a melting signal based on the strength of the detection signal from the electron detector 72, and a deflection controller 420 that is configured to receive the melting signal to determine the condition of the irradiation the electron beam.

公开(公告)号：US10573491B2

公开(公告)日：2020-02-25

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Shinji Sugatani ,  Masaki Kurokawa ,  Masahiro Takizawa ,  Ryuma Iwashita

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/04

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

公开(公告)号：US09684245B2

公开(公告)日：2017-06-20

申请号：US14738934

申请日：2015-06-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Shinji Sugatani

IPC: G03F7/20 ,  G03F9/00 ,  H01J37/317

CPC classification number: G03F7/70425 ,  G03F9/7088 ,  H01J37/3174

Abstract: An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed between the electronic optical system 108 and the wafer stage WS. A substrate 71 constitutes the fog preventing mechanism 70, and opening holes 71a0 that penetrate up to the upper surface of the substrate 71 are formed in a first area of the bottom surface of the substrate 71, and opening holes 71a0 that are closed in the substrate 71 are formed in a second area of the bottom surface.