公开(公告)号：US20150243482A1

公开(公告)日：2015-08-27

申请号：US14632944

申请日：2015-02-26

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: H01J37/317

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US09116434B2

公开(公告)日：2015-08-25

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F1/20 ,  G03F7/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

公开(公告)号：US20140120475A1

公开(公告)日：2014-05-01

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US11458561B2

公开(公告)日：2022-10-04

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Shinji Sugatani ,  Masayuki Takahashi ,  Masahiro Takizawa

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/06 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01J29/56

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

公开(公告)号：US11229971B2

公开(公告)日：2022-01-25

申请号：US16127225

申请日：2018-09-11

Applicant: ADVANTEST CORPORATION

Inventor： Shinji Sugatani ,  Shigeki Nishina ,  Jun Matsumoto ,  Masahiro Takizawa ,  Minoru Soma ,  Akio Yamada

IPC: B23K15/00 ,  B28B1/00 ,  B28B17/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B29C64/268 ,  B29C64/153 ,  B22F10/20 ,  B23K15/02 ,  B33Y40/00 ,  B22F10/30

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a three-dimensional structure 36 from a ground potential member, an ammeter 73 that is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure 36, a melting judging unit 410 that is configured to detect that the powder layer 32 is melted based on the current value measured by the ammeter 73 and generate a melting signal, and a deflection controller 420 that is configured to receive the melting signal to determine the condition for the irradiation with the electron beam.

公开(公告)号：US10919105B2

公开(公告)日：2021-02-16

申请号：US16121581

申请日：2018-09-04

Applicant: ADVANTEST CORPORATION

Inventor： Shinji Sugatani ,  Shigeki Nishina ,  Jun Matsumoto ,  Masahiro Takizawa ,  Minoru Soma ,  Akio Yamada

IPC: B23K26/34 ,  B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B23K15/02 ,  B33Y50/02 ,  B22F3/105 ,  B29C64/268 ,  B29C64/153 ,  B33Y40/00

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layer 32 when the powder layer 32 is irradiated with the electron beam EB, a melting judging unit 410 that is configured to generate a melting signal based on the strength of the detection signal from the electron detector 72, and a deflection controller 420 that is configured to receive the melting signal to determine the condition of the irradiation the electron beam.

公开(公告)号：US10573491B2

公开(公告)日：2020-02-25

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Shinji Sugatani ,  Masaki Kurokawa ,  Masahiro Takizawa ,  Ryuma Iwashita

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/04

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

公开(公告)号：US09213240B2

公开(公告)日：2015-12-15

申请号：US14632944

申请日：2015-02-26

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20 ,  G03F1/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。