公开(公告)号：US20180151424A1

公开(公告)日：2018-05-31

申请号：US15823422

申请日：2017-11-27

Applicant: Applied Materials, Inc.

Inventor： DAPING YAO ,  JIANG LU ,  CAN XU ,  PAUL F. MA ,  MEI CHANG

IPC: H01L21/768

Abstract: In some embodiments, a method of forming a cobalt layer on a substrate disposed in a process chamber, includes: (a) exposing the substrate to a first process gas comprising a cobalt precursor and a hydrogen containing gas to grow a smooth cobalt layer on a first surface of the substrate and on sidewalls and a bottom surface of a feature formed in the first surface of the substrate; (b) purging the first process gas from the process chamber; and (c) annealing the substrate in a hydrogen atmosphere to fill in voids within the cobalt layer to form a void-free cobalt layer. In some embodiments, plasma treating the substrate in gas under low pressure and/or thermally baking the substrate in gas in an atmosphere under a low pressure, may be performed prior to anneal.

公开(公告)号：US20200020509A1

公开(公告)日：2020-01-16

申请号：US16578602

申请日：2019-09-23

Applicant: APPLIED MATERIALS, INC.

Inventor： DAPING YAO ,  HYMAN W.H. LAM ,  JOHN C. FORSTER ,  JIANG LU ,  CAN XU ,  DIEN-YEH WU ,  PAUL F. MA ,  MEI CHANG

IPC: H01J37/32 ,  C23C16/513 ,  C23C16/505 ,  C23C16/52 ,  C23C16/455

Abstract: Embodiments of a gas delivery apparatus for use in a radio frequency (RF) processing apparatus are provided herein. In some embodiments, a gas delivery apparatus for use in a radio frequency (RF) processing apparatus includes: a conductive gas line having a first end and a second end; a first flange coupled to the first end; a second flange coupled to the second end, wherein the conductive gas line extends through and between the first and second flanges; and a block of ferrite material surrounding the conductive gas line between the first and second flanges.

公开(公告)号：US20180012732A1

公开(公告)日：2018-01-11

申请号：US15642002

申请日：2017-07-05

Applicant: APPLIED MATERIALS, INC.

Inventor： DAPING YAO ,  HYMAN W.H. LAM ,  JOHN C. FORSTER ,  JIANG LU ,  CAN XU ,  DIEN-YEH WU ,  PAUL F. MA ,  MEI CHANG

IPC: H01J37/32 ,  C23C16/505 ,  C23C16/513 ,  C23C16/52 ,  C23C16/455 ,  C23C16/06

CPC classification number: H01J37/3244 ,  C23C16/06 ,  C23C16/455 ,  C23C16/45563 ,  C23C16/45572 ,  C23C16/505 ,  C23C16/509 ,  C23C16/513 ,  C23C16/52 ,  H01J2237/002 ,  H01J2237/0213 ,  H01J2237/3321

Abstract: Embodiments of a gas delivery apparatus for use in a radio frequency (RF) processing apparatus are provided herein. In some embodiments, a gas delivery apparatus for use in a radio frequency (RF) processing apparatus includes: a conductive gas line having a first end and a second end; a first flange coupled to the first end; a second flange coupled to the second end, wherein the conductive gas line extends through and between the first and second flanges; and a block of ferrite material surrounding the conductive gas line between the first and second flanges.