公开(公告)号：US20160268097A1

公开(公告)日：2016-09-15

申请号：US15160972

申请日：2016-05-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Michael R. Rice ,  Ron Naftali ,  Natan Schlimoff ,  Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Zvika Rozenberg ,  Erez Admoni ,  Yochanan Madmon

IPC: H01J37/18 ,  G01N21/95 ,  H01J37/20 ,  H01L21/67 ,  G02B21/26

CPC classification number: H01J37/18 ,  G01N21/9501 ,  G01N2201/023 ,  G02B21/26 ,  H01J37/20 ,  H01J2237/022 ,  H01J2237/182 ,  H01J2237/202 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67242

Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.

Abstract translation: 腔室元件限定在从由衬底制造阶段和衬底检查阶段组成的组中选择的衬底相关阶段期间被利用的内部室，所述室元件包括：具有第一表面的第一元件; 第二元件，其具有围绕所述内部腔室的周边的第二表面; 连接到第二元件的第三元件; 以及夹紧机构，其连接到所述第二和第三元件并且被布置成朝向所述第一元件按压所述第二元件; 其中所述第一表面的第一区域和所述第二表面的第二区域在第一界面处彼此接近; 其中所述第一表面位于所述第二表面上方; 其中在所述第二区域中形成气体槽和真空槽; 其中所述第二元件包括气体管道，所述气体管道被布置成向所述气体槽提供气体;以及真空管道，其布置成向所述真空槽提供真空; 其中所述气体和所述真空的提供有助于在所述第一和第二区域之间形成气垫; 其中所述室元件可操作以在所述基板相关级期间部分地包围运动系统和基板的第一部分，所述运动系统布置成引入所述第一元件相对于所述第二元件和所述第三元件的运动，其中 气垫在运动过程中保持内腔中的预定条件。

公开(公告)号：US09302358B2

公开(公告)日：2016-04-05

申请号：US13944815

申请日：2013-07-17

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Igor Krayvitz (Krivts) ,  Israel Avneri ,  Yoram Uziel ,  Natan Schlimoff ,  Gilad Schwartz ,  Yochanan Madmon

IPC: B23Q3/00 ,  H01L21/67 ,  B08B3/04 ,  C23C16/44

CPC classification number: B23Q3/00 ,  B08B3/04 ,  C23C16/4409 ,  H01L21/6715 ,  H01L21/6719 ,  H01L21/67201

Abstract: Chamber elements defining a chamber include a first element having a first surface, a second element, a first dynamic seal and load mechanism. The second element includes an outer floating element that includes a second surface about the periphery of the chamber, and an inner floating element. The second surface and the first surface are maintained proximate to each other when the chamber is in a load position and when the chamber is closed. The load mechanism may move the inner floating element from the outer floating element until a gap between the inner floating element and the second element to facilitate loading of the device to the chamber. A movement system may generate relative movement between the first element and the second element.

Abstract translation: 限定腔室的室元件包括具有第一表面的第一元件，第二元件，第一动态密封件和负载机构。 第二元件包括外部浮动元件，其包括围绕室的周边的第二表面和内部浮动元件。 当腔室处于加载位置和腔室关闭时，第二表面和第一表面保持彼此靠近。 负载机构可以将内部浮动元件从外部浮动元件移动到内部浮动元件和第二元件之间的间隙，以便于将装置加载到腔室。 移动系统可以在第一元件和第二元件之间产生相对移动。

公开(公告)号：US20140027968A1

公开(公告)日：2014-01-30

申请号：US13944815

申请日：2013-07-17

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Igor Krayvitz (Krivts) ,  Israel Avneri ,  Yoram Uziel ,  Natan Schlimoff ,  Gilad Schwartz ,  Yochanan Madmon

IPC: B23Q3/00

CPC classification number: B23Q3/00 ,  B08B3/04 ,  C23C16/4409 ,  H01L21/6715 ,  H01L21/6719 ,  H01L21/67201

Abstract: Chamber elements defining a chamber include a first element having a first surface, a second element, a first dynamic seal and load mechanism. The second element includes an outer floating element that includes a second surface about the periphery of the chamber, and an inner floating element. The second surface and the first surface are maintained proximate to each other when the chamber is in a load position and when the chamber is closed. The load mechanism may move the inner floating element from the outer floating element until a gap between the inner floating element and the second element to facilitate loading of the device to the chamber. A movement system may generate relative movement between the first element and the second element.

Abstract translation: 限定腔室的室元件包括具有第一表面的第一元件，第二元件，第一动态密封件和负载机构。 第二元件包括外部浮动元件，其包括围绕室的周边的第二表面和内部浮动元件。 当腔室处于加载位置和腔室关闭时，第二表面和第一表面保持彼此靠近。 负载机构可以将内部浮动元件从外部浮动元件移动到内部浮动元件和第二元件之间的间隙，以便于将装置加载到腔室。 移动系统可以在第一元件和第二元件之间产生相对移动。

公开(公告)号：US09997328B2

公开(公告)日：2018-06-12

申请号：US15160972

申请日：2016-05-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Michael R. Rice ,  Ron Naftali ,  Natan Schlimoff ,  Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Zvika Rozenberg ,  Erez Admoni ,  Yochanan Madmon

IPC: G01N21/95 ,  G02B21/26 ,  H01J37/18 ,  H01J37/20 ,  H01L21/67

CPC classification number: H01J37/18 ,  G01N21/9501 ,  G01N2201/023 ,  G02B21/26 ,  H01J37/20 ,  H01J2237/022 ,  H01J2237/182 ,  H01J2237/202 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67242

Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.