公开(公告)号：US12106936B2

公开(公告)日：2024-10-01

申请号：US18214355

申请日：2023-06-26

Applicant: Applied Materials, Inc.

Inventor： Peter F. Kurunczi ,  Morgan Evans ,  Joseph C. Olson ,  Christopher A. Rowland ,  James Buonodono

IPC: H01J37/20 ,  H01J37/08 ,  H01J37/305

CPC classification number: H01J37/3053 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0822 ,  H01J2237/20228 ,  H01J2237/3174

Abstract: A system may include a substrate stage, configured to support a substrate, where a main surface of the substrate defines a substrate plane. The system may include an ion source, including an extraction assembly that is oriented to direct an ion beam to the substrate along a trajectory defining a non-zero angle of incidence with respect to a perpendicular to the substrate plane. The system may include a radical source oriented to direct a radical beam to the substrate along a trajectory defining the non-zero angle of incidence with respect to a perpendicular to the substrate plane. The substrate stage may be further configured to scan the substrate along a first direction, lying with the substrate plane, while the main surface of the substrate is oriented within the substrate plane.

公开(公告)号：US20230335375A1

公开(公告)日：2023-10-19

申请号：US18214355

申请日：2023-06-26

Applicant: Applied Materials, Inc.

Inventor： Peter F. Kurunczi ,  Morgan Evans ,  Joseph C. Olson ,  Christopher A. Rowland ,  James Buonodono

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J37/20 ,  H01J37/08 ,  H01J2237/3174 ,  H01J2237/0822 ,  H01J2237/0041 ,  H01J2237/20228

Abstract: A system may include a substrate stage, configured to support a substrate, where a main surface of the substrate defines a substrate plane. The system may include an ion source, including an extraction assembly that is oriented to direct an ion beam to the substrate along a trajectory defining a non-zero angle of incidence with respect to a perpendicular to the substrate plane. The system may include a radical source oriented to direct a radical beam to the substrate along a trajectory defining the non-zero angle of incidence with respect to a perpendicular to the substrate plane. The substrate stage may be further configured to scan the substrate along a first direction, lying with the substrate plane, while the main surface of the substrate is oriented within the substrate plane.

公开(公告)号：US11715621B2

公开(公告)日：2023-08-01

申请号：US16535885

申请日：2019-08-08

Applicant: APPLIED Materials, Inc.

Inventor： Peter F. Kurunczi ,  Morgan Evans ,  Joseph C. Olson ,  Christopher A. Rowland ,  James Buonodono

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/20 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0822 ,  H01J2237/20228 ,  H01J2237/3174

Abstract: A system may include a substrate stage, configured to support a substrate, where a main surface of the substrate defines a substrate plane. The system may include an ion source, including an extraction assembly that is oriented to direct an ion beam to the substrate along a trajectory defining a non-zero angle of incidence with respect to a perpendicular to the substrate plane. The system may include a radical source oriented to direct a radical beam to the substrate along a trajectory defining the non-zero angle of incidence with respect to a perpendicular to the substrate plane. The substrate stage may be further configured to scan the substrate along a first direction, lying with the substrate plane, while the main surface of the substrate is oriented within the substrate plane.