公开(公告)号：US20240273278A1

公开(公告)日：2024-08-15

申请号：US18568115

申请日：2022-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter VAN HERTUM ,  Dimitra GKOROU ,  Joachim Kinley VAN SCHOUBROECK ,  Zahra KAREVAN ,  Alexander YPMA

IPC: G06F30/398 ,  G03F7/00

CPC classification number: G06F30/398 ,  G03F7/705 ,  G03F7/70508

Abstract: A computer implemented method for diagnosing a system includes: receiving a causal graph, the causal graph defining (i) a plurality of nodes each representing a module of a plurality of modules of a system, wherein each module is characterized by one or more signals; and (ii) edges connected between the nodes, the edges representing propagation of performance between modules; generating a reasoning tool by augmenting the causal graph with diagnostics knowledge based on historically determined relations between performance, statistical and causal characteristics of at least one module out of the plurality of modules; obtaining a health metric of the at least one module, wherein the health metric is associated with the one or more signals associated with the at least one module; and using the health metric as an input to the reasoning tool to identify a module that is the most likely cause of the behavior.

公开(公告)号：US20200019067A1

公开(公告)日：2020-01-16

申请号：US16335277

申请日：2017-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Weitian KOU ,  Alexander YPMA ,  Marc HAUPTMANN ,  Michiel KUPERS ,  Lydia Marianna VERGAIJ-HUIZER ,  Erik Johannes Maria WALLERBOS ,  Erik Henri Adriaan DELVIGNE ,  Willem Seine Christian ROELOFS ,  Hakki Ergün CEKLI ,  Stefan Cornelis Theodorus VAN DER SANDEN ,  Cedric Desire GROUWSTRA ,  David Frans Simon DECKERS ,  Manuel GIOLLO ,  Iryna DOVBUSH

IPC: G03F7/20

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

公开(公告)号：US20190278188A1

公开(公告)日：2019-09-12

申请号：US16351873

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Alexander YPMA ,  Jasper MENGER ,  David DECKERS ,  David HAN ,  Adrianus Cornelis Matheus KOOPMAN ,  Irina LYULINA ,  Scott Anderson MIDDLEBROOKS ,  Richard Johannes Franciscus VAN HAREN ,  Jochem Sebastiaan WILDENBERG

IPC: G03F7/20 ,  G06F16/26 ,  G03F9/00

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

公开(公告)号：US20190187569A1

公开(公告)日：2019-06-20

申请号：US16322148

申请日：2017-07-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander YPMA ,  Adrianus Cornelis Matheus KOOPMAN ,  Scott Anderson MIDDLEBROOKS

IPC: G03F7/20 ,  G06T7/00

CPC classification number: G03F7/70525 ,  G03F7/70508 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G05B19/41875 ,  G06K9/6296 ,  G06T7/001 ,  G06T2207/30148 ,  H01L22/20 ,  Y02P90/86

Abstract: A diagnostic system implements a network including two or more sub-domains. Each sub-domain has diagnostic information extracted by analysis of object data, the object data representing one or more parameters measured in relation to a set of product units that have been subjected nominally to the same industrial process as one another. The network further has at least one probabilistic connection from a first variable in a first diagnostic sub-domain to a second variable in a second diagnostic sub-domain. Part of the second diagnostic information is thereby influenced probabilistically by knowledge within the first diagnostic information. Diagnostic information may include, for example, a spatial fingerprint observed in the object data, or inferred. The network may include connections within sub-domains. The network may form a directed acyclic graph, and used for Bayesian inference operations.

公开(公告)号：US20230252347A1

公开(公告)日：2023-08-10

申请号：US18015162

申请日：2021-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios KOULIERAKIS ,  Carlo LANCIA ,  Juan Manuel GONZALEZ HUESCA ,  Alexander YPMA

IPC: G06N20/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G06N20/00 ,  G03F7/706841 ,  G03F7/70516 ,  G03F7/705

Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method may include obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.

公开(公告)号：US20230138469A1

公开(公告)日：2023-05-04

申请号：US17801980

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Carlo LANCIA ,  Anjan Prasad Gantapara ,  Dirk-Jan KERNKAMP ,  Seyed Iman MOSSAVAT ,  Alexander YPMA

IPC: G05B13/04

Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

公开(公告)号：US20230076185A1

公开(公告)日：2023-03-09

申请号：US17799806

申请日：2021-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Maialen LARRANAGA ,  Dimira GKOROU ,  Alexander YPMA

IPC: G05B19/418

Abstract: A method including: determining a sequence of states of an object, the states determined based on processing information associated with the object, wherein the sequence of states includes one or more future states of the object; determining, based on at least one of the states within the sequence of states and the one or more future states, a process metric associated with the object, the process metric including an indication of whether processing requirements for the object are satisfied for individual states in the sequence of states; and initiating an adjustment to processing based on (1) at least one of the states and the one or more future states and (2) the process metric, the adjustment configured to enhance the process metric for the individual states in the sequence of states such that final processing requirements for the object are satisfied.

公开(公告)号：US20210080836A1

公开(公告)日：2021-03-18

申请号：US17102850

申请日：2020-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Weitian KOU ,  Alexander YPMA ,  Marc HAUPTMANN ,  Michiel KUPERS ,  Lydia Marianna VERGAIJ-HUIZER ,  Erik Johannes Maria WALLERBOS ,  Erik Henri Adriaan DELVIGNE ,  Willem Seine Christian ROELOFS ,  Hakki Ergün CEKLI ,  Stefan Cornelis Theodorus VAN DER SANDEN ,  Cédric Désiré GROUWSTRA ,  David Frans Simon DECKERS ,  Manuel GIOLLO ,  Iryna DOVBUSH

IPC: G03F7/20

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

公开(公告)号：US20180307216A1

公开(公告)日：2018-10-25

申请号：US15763834

申请日：2016-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander YPMA ,  David Frans Simon DECKERS

IPC: G05B19/418 ,  G03F7/20 ,  G03F9/00

CPC classification number: G05B19/41875 ,  G03F7/70325 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F9/7092 ,  G05B2219/45031 ,  Y02P90/22

Abstract: In a lithographic process in which a series of substrates are processed in different contexts, object data (such as performance data representing overlay measured on a set of substrates that have been processed previously) is received. Context data represents one or more parameters of the lithographic process that vary between substrates within the set. By principal component analysis or other statistical analysis of the performance data, the set of substrates are partitioned into two or more subsets. The first partitioning of the substrates and the context data are used to identify one or more relevant context parameters, being parameters of the lithographic process that are observed to correlate most strongly with the first partitioning. The lithographic apparatus is controlled for new substrates by reference to the identified relevant context parameters. Embodiments with feedback control and feedforward control are described.

公开(公告)号：US20220229373A1

公开(公告)日：2022-07-21

申请号：US17715112

申请日：2022-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Weitian KOU ,  Alexander YPMA ,  Marc HAUPTMANN ,  Michiel KUPERS ,  Lydia Marianna VERGAIJ-HUIZER ,  Erik Johannes Maria WALLERBOS ,  Erik Henri Adriaan DELVIGNE ,  Willem Seine Christian ROELOFS ,  Hakki Ergün CEKLI ,  Stefan Cornelis Theodorus VAN DER SANDEN ,  Cédric Désiré GROUWSTRA ,  David Frans Simon DECKERS ,  Manuel GIOLLO ,  Iryna DOVBUSH

IPC: G03F7/20

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.