-
公开(公告)号：US20150116675A1
公开(公告)日：2015-04-30
申请号：US14584826
申请日：2014-12-29
发明人： Hans JANSEN , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Marco Koert STAVENGA , Bob STREEFKERK , Jan Cornelis VAN DER HOEVEN , Cedric Desire GROUWSTRA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。
-
公开(公告)号：US20190170657A1
公开(公告)日：2019-06-06
申请号：US16270155
申请日：2019-02-07
发明人： Arie Jeffrey Maria DEN BOEF , Arno Jan BLEEKER , Youri Johannes Laurentiu VAN DOMMELEN , Mircea DUSA , Antoine Gaston Marie KIERS , Paul Frank LUEHRMANN , Henricus Petrus Maria PELLEMANS , Maurits VAN DER SCHAAR , Cedric Desire GROUWSTRA , Markus Gerardus Martinus VAN KRAAIJ
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
-
3.发明申请Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization 审中-公开用于角度分辨光谱光刻特征的方法和装置公开(公告)号：US20140233025A1
公开(公告)日：2014-08-21
申请号：US14264547
申请日：2014-04-29
发明人： Arie Jeffrey Maria DEN BOEF , Arno Jan BLEEKER , Youri Johannes Laurentius Maria VAN DOMMELEN , Mircea DUSA , Antoine Gaston Marie KIERS , Paul Frank LUEHRMANN , Henricus Petrus Maria PELLEMANS , Maurits VAN DER SCHAAR , Cedric Desire GROUWSTRA , Markus Gerardus Martinus VAN KRAAIJ
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译： 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。
-
公开(公告)号：US20200019067A1
公开(公告)日：2020-01-16
申请号：US16335277
申请日：2017-09-28
发明人： Weitian KOU , Alexander YPMA , Marc HAUPTMANN , Michiel KUPERS , Lydia Marianna VERGAIJ-HUIZER , Erik Johannes Maria WALLERBOS , Erik Henri Adriaan DELVIGNE , Willem Seine Christian ROELOFS , Hakki Ergün CEKLI , Stefan Cornelis Theodorus VAN DER SANDEN , Cedric Desire GROUWSTRA , David Frans Simon DECKERS , Manuel GIOLLO , Iryna DOVBUSH
IPC分类号： G03F7/20
摘要： A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.
-
-
-
搜索结果
4 条记录 (耗时 0.012 秒)
