公开(公告)号：US09599912B2

公开(公告)日：2017-03-21

申请号：US14401797

申请日：2013-05-08

Applicant: ASML Netherlands B.V.

Inventor： Edgar Alberto Osorio Oliveros

IPC: G03F1/24 ,  G03F7/20 ,  G21K1/06 ,  B82Y10/00 ,  G03F1/62 ,  G02B5/08 ,  G02B27/00 ,  B82Y30/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  B82Y30/00 ,  G02B5/085 ,  G02B5/0891 ,  G02B27/0006 ,  G03F1/24 ,  G03F1/62 ,  G03F7/7015 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10S977/734

Abstract: A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.

公开(公告)号：US09986628B2

公开(公告)日：2018-05-29

申请号：US14440934

申请日：2013-10-10

Applicant: ASML Netherlands B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00 ,  G03F7/20 ,  H01S3/08 ,  G21K1/06 ,  H01S3/23 ,  H01S3/07 ,  H01S3/081 ,  H01S3/13 ,  H01S3/223

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

公开(公告)号：US20150160569A1

公开(公告)日：2015-06-11

申请号：US14401797

申请日：2013-05-08

Applicant: ASML Netherlands B.V.

Inventor： Edgar Alberto Osorio Oliveros

IPC: G03F7/20 ,  G02B27/00 ,  G03F1/24 ,  G02B5/08

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  B82Y30/00 ,  G02B5/085 ,  G02B5/0891 ,  G02B27/0006 ,  G03F1/24 ,  G03F1/62 ,  G03F7/7015 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10S977/734

Abstract: A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.

Abstract translation: 反射器包括设置有由硅或硅烷衍生物形成的盖层的反射表面或结构。 反射器可以设置在光刻设备中。

公开(公告)号：US20150296602A1

公开(公告)日：2015-10-15

申请号：US14440934

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。