公开(公告)号：US09778575B2

公开(公告)日：2017-10-03

申请号：US14988944

申请日：2016-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle Mulder ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Paul Van Der Veen ,  Patricius Aloysius Jacobus Tinnemans ,  Wilfred Edward Endendijk

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

公开(公告)号：US09645510B2

公开(公告)日：2017-05-09

申请号：US14787738

申请日：2014-04-16

Applicant: ASML Netherlands B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root ,  Adrianus Leonardus Gertrudus Bommer ,  Robert De Jong ,  Frank Everts ,  Herman Philip Godfried ,  Roland Pieter Stolk ,  Paul Van Der Veen

IPC: G03B27/42 ,  G03F7/20 ,  H01S3/104 ,  H01S3/0975 ,  H01S3/225

CPC classification number: G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

公开(公告)号：US10222703B2

公开(公告)日：2019-03-05

申请号：US15653380

申请日：2017-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle Mulder ,  Johannes Jacobus Matheus Baselmans ,  Adrianus Franciscus Petrus Engelen ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Paul Van Der Veen ,  Patricius Aloysius Jacobus Tinnemans ,  Wilfred Edward Endendijk

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.