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公开(公告)号：US09455172B2
公开(公告)日：2016-09-27
申请号：US14380622
申请日：2013-01-29
Applicant: ASML Netherlands B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel
IPC: H01L21/683 , G03F7/20
CPC classification number: H01L21/6833 , G03F7/70708
Abstract: An electrostatic clamp configured to, in use, hold an article, such as a reticle or a wafer in a lithographic apparatus. The clamp includes a lower portion; an upper portion formed of a dielectric material, and a plurality of electrodes disposed between the lower portion and the upper portion. The electrodes include a first electrode configured in use to be held at a first voltage, at least one intermediate electrode configured in use to be held at a second voltage, and a ground electrode. The at least one intermediate electrode is located between the first electrode and the ground electrode and the second voltage is between the first voltage and ground to reduce the voltage across a barrier between the electrodes and so reduce the risk of high-voltage breakdown.
Abstract translation: 构造成在使用中的静电夹持器将光学设备中的物品（例如光罩或晶片）保持在其中。 夹具包括下部; 由介电材料形成的上部，以及设置在下部与上部之间的多个电极。 电极包括被配置为保持在第一电压的第一电极，至少一个中间电极被配置为保持在第二电压，以及接地电极。 所述至少一个中间电极位于第一电极和接地电极之间，并且第二电压在第一电压和地之间，以降低电极之间的屏障上的电压，并因此降低高压击穿的风险。
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公开(公告)号：US20150036258A1
公开(公告)日：2015-02-05
申请号：US14380622
申请日：2013-01-29
Applicant: ASML Netherlands B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel
IPC: H01L21/683
CPC classification number: H01L21/6833 , G03F7/70708
Abstract: An electrostatic clamp configured to, in use, hold an article, such as a reticle or a wafer in a lithographic apparatus. The clamp includes a lower portion; an upper portion formed of a dielectric material, and a plurality of electrodes disposed between the lower portion and the upper portion. The electrodes include a first electrode configured in use to be held at a first voltage, at least one intermediate electrode configured in use to be held at a second voltage, and a ground electrode. The at least one intermediate electrode is located between the first electrode and the ground electrode and the second voltage is between the first voltage and ground to reduce the voltage across a barrier between the electrodes and so reduce the risk of high-voltage breakdown.
Abstract translation: 构造成在使用中的静电夹持器将光学设备中的物品（例如光罩或晶片）保持在其中。 夹具包括下部; 由介电材料形成的上部，以及设置在下部与上部之间的多个电极。 电极包括被配置为保持在第一电压的第一电极，至少一个中间电极被配置为保持在第二电压，以及接地电极。 所述至少一个中间电极位于第一电极和接地电极之间，并且第二电压在第一电压和地之间，以降低电极之间的屏障上的电压，并因此降低高压击穿的风险。
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公开(公告)号：US09363879B2
公开(公告)日：2016-06-07
申请号：US14532897
申请日：2014-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van de Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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