公开(公告)号：US4769291A

公开(公告)日：1988-09-06

申请号：US10023

申请日：1987-02-02

申请人： Abraham I. Belkind ,  Erik Bjornard ,  James J. Hofmann ,  Donald V. Jacobson ,  Steven J. Nadel

发明人： Abraham I. Belkind ,  Erik Bjornard ,  James J. Hofmann ,  Donald V. Jacobson ,  Steven J. Nadel

IPC分类号： C23C14/14 ,  C03C17/22 ,  C03C17/245 ,  C03C17/34 ,  C03C17/36 ,  C23C14/08 ,  C23C14/10 ,  C23C14/34 ,  C23C14/18

CPC分类号： C03C17/3644 ,  C03C17/22 ,  C03C17/225 ,  C03C17/245 ,  C03C17/3417 ,  C03C17/3435 ,  C03C17/36 ,  C23C14/08 ,  C23C14/10 ,  C03C2217/23 ,  C03C2217/281 ,  C03C2217/29 ,  C03C2217/78 ,  C03C2218/155 ,  Y10T428/12597 ,  Y10T428/12611 ,  Y10T428/12674 ,  Y10T428/12736 ,  Y10T428/12792 ,  Y10T428/12896

摘要： A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

公开(公告)号：US4866235A

公开(公告)日：1989-09-12

申请号：US301516

申请日：1989-01-24

申请人： Don Griffin ,  Steven J. Nadel ,  Tamzen L. Van Skike

发明人： Don Griffin ,  Steven J. Nadel ,  Tamzen L. Van Skike

IPC分类号： F24C7/02 ,  A47J27/08 ,  A47J36/02 ,  B65D81/34

CPC分类号： B65D81/3453 ,  A47J36/027 ,  B65D2581/3475 ,  B65D2581/3494 ,  Y10S99/14

摘要： A container useful in microwave heating of foods comprises a substrate with a titanium nitride film on at least a portion of the substrate. The substrate is substantially microwave transparent except where coated with the titanium nitride film. The film is adapted to absorb microwave energy. The film thus becomes heated and transfers heat to foods when adjacent the film. This heat transfer provides crisp heating of foods, such as fried chicken, french fries and the like.

公开(公告)号：US20100300877A1

公开(公告)日：2010-12-02

申请号：US12476936

申请日：2009-06-02

申请人： Steven J. Nadel ,  James G. Rietzel

发明人： Steven J. Nadel ,  James G. Rietzel

IPC分类号： C23C14/06 ,  B29C65/48

CPC分类号： C23C14/3407 ,  H01J37/3405 ,  H01J37/342 ,  H01J37/3429 ,  H01J37/3435

摘要： A sputtering target assembly and its manufacturing method are provided for sputtering ceramic material on a substrate. The sputtering target assembly comprises a backing tube having a central portion, a first end and a second end; at least one cylindrical sputtering target member comprising a first ceramic material; and at least one collar comprising a second ceramic material different than the first ceramic material. The cylindrical sputtering target member is coupled to the backing tube at the central portion, and the collar is coupled to the backing tube at an area between one of the first and second ends and the cylindrical sputtering target member. In one embodiment, the sputtering rate of the collar is less than or equal to the sputtering rate of the cylindrical sputtering target member.

摘要翻译： 溅射靶组件及其制造方法用于在衬底上溅射陶瓷材料。 溅射靶组件包括具有中心部分，第一端和第二端的背衬管; 至少一个圆柱形溅射靶构件，包括第一陶瓷材料; 以及包括不同于第一陶瓷材料的第二陶瓷材料的至少一个轴环。 圆柱形溅射靶构件在中心部分处连接到背衬管，并且套环在第一和第二端之一与圆柱形溅射靶构件之间的区域处联接到背衬管。 在一个实施例中，套环的溅射速率小于或等于圆柱形溅射靶构件的溅射速率。