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公开(公告)号:US10249593B2
公开(公告)日:2019-04-02
申请号:US15310684
申请日:2015-06-22
Applicant: Agency for Science, Technology and Research
Inventor: Sunil Wickramanayaka , Ling Xie , Jerry Jie Li Aw
IPC: H01L23/00 , H01L25/00 , H01L25/065
Abstract: A method for chip on wafer bonding is provided. The method includes the formation of a plurality of posts on at least one of a chip and a wafer, and a like plurality of contacts on the other of the chip and the wafer. After formation, a contact surface of each post is planarized, the respective planarized contact surface having a surface roughness height. A bonding material is then applied to at least one of the chip in a thickness no greater than the surface roughness height of the contact surface. The posts are then temporarily bonded to the contacts using the bonding material to stabilize a position of the chip relative to the wafer for permanent diffusion bonding of the chip to the wafer.
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公开(公告)号:US20170084570A1
公开(公告)日:2017-03-23
申请号:US15310684
申请日:2015-06-22
Applicant: Agency for Science, Technology and Research
Inventor: Sunil Wickramanayaka , Ling Xie , Jerry Jie Li Aw
IPC: H01L23/00 , H01L25/065 , H01L25/00
CPC classification number: H01L24/81 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L25/0657 , H01L25/50 , H01L2224/0345 , H01L2224/0361 , H01L2224/03622 , H01L2224/0401 , H01L2224/05147 , H01L2224/05573 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/11462 , H01L2224/11464 , H01L2224/1147 , H01L2224/11825 , H01L2224/1184 , H01L2224/11845 , H01L2224/119 , H01L2224/13023 , H01L2224/13026 , H01L2224/13147 , H01L2224/13562 , H01L2224/13611 , H01L2224/16225 , H01L2224/81022 , H01L2224/8109 , H01L2224/81097 , H01L2224/81099 , H01L2224/81192 , H01L2224/81193 , H01L2224/81203 , H01L2224/8181 , H01L2224/8182 , H01L2224/8183 , H01L2224/81986 , H01L2224/94 , H01L2224/97 , H01L2225/06513 , H01L2924/3841 , H01L2924/00014 , H01L2224/11 , H01L2224/03 , H01L2924/014 , H01L2224/81 , H01L2224/9205
Abstract: A method for chip on wafer bonding is provided. The method includes the formation of a plurality of posts on at least one of a chip and a wafer, and a like plurality of contacts on the other of the chip and the wafer. After formation, a contact surface of each post is planarized, the respective planarized contact surface having a surface roughness height. A bonding material is then applied to at least one of the chip in a thickness no greater than the surface roughness height of the contact surface. The posts are then temporarily bonded to the contacts using the bonding material to stabilize a position of the chip relative to the wafer for permanent diffusion bonding of the chip to the wafer.
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