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    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
    4.
    发明申请
    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开
    化学敏感性或辐射敏感性树脂组合物，耐腐蚀性膜和使用其的图案形成方法

    公开(公告)号：US20120164573A1

    公开(公告)日：2012-06-28

    申请号：US13323179

    申请日：2011-12-12

    申请人： Naohiro Tango ,  Yusuke Iizuka ,  Akinori Shibuya ,  Shuhei Yamaguchi ,  Shohei Kataoka

    发明人： Naohiro Tango ,  Yusuke Iizuka ,  Akinori Shibuya ,  Shuhei Yamaguchi ,  Shohei Kataoka

    IPC分类号： G03F7/20 ,  G03F7/027

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041

    摘要： An actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent critical dimension uniformity (CDU) in the line width, and a pattern forming method using the same are provided.The actinic-ray-sensitive or radiation-sensitive resin composition of the present invention includes (A) a resin containing a repeating unit having a specific lactone structure and a repeating unit having a specific monocyclic alicyclic structure, which increases a solubility in an alkaline developer by the action of an acid, and (B) a compound having a specific structure, which generates an acid upon irradiation with an actinic-ray or a radiation.

    摘要翻译： 提供能够形成在线宽度上具有优异临界尺寸均匀性（CDU）的图案的光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法。 本发明的光化射线敏感性或辐射敏感性树脂组合物包括（A）含有具有特定内酯结构的重复单元的树脂和具有特定单环脂肪结构的重复单元，其增加了在碱性显影剂中的溶解度 通过酸的作用，和（B）具有特定结构的化合物，其在用光化射线或辐射照射时产生酸。

    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
    6.
    发明授权
    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film 有权
    图案形成方法，光化射线敏感或辐射敏感树脂组合物和抗蚀剂膜

    公开(公告)号：US09316910B2

    公开(公告)日：2016-04-19

    申请号：US13406306

    申请日：2012-02-27

    申请人： Shohei Kataoka ,  Hidenori Takahashi ,  Shuhei Yamaguchi ,  Shoichi Saitoh ,  Michihiro Shirakawa ,  Fumihiro Yoshino

    发明人： Shohei Kataoka ,  Hidenori Takahashi ,  Shuhei Yamaguchi ,  Shoichi Saitoh ,  Michihiro Shirakawa ,  Fumihiro Yoshino

    IPC分类号： G03F7/20 ,  G03F7/039

    CPC分类号： G03F7/0397

    摘要： Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.

    摘要翻译： 提供了一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度和曝光宽容度，以及用于图案形成方法的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。 图案形成方法包括：（1）使用含有树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，所述树脂组合物包含65摩尔％以上的具有通过降解产生极性基团的基团的重复单元 基于树脂中所有重复单元的酸的作用和由以下通式（I）或（II）表示的至少一种重复单元，（2）使膜曝光，和（3）显影曝光膜 使用含有机溶剂的显影剂。